The present invention is generally related to various types of compositions that comprise a polyindane resin. In particular, the polyindane resins may be utilized in various polymer-based and elastomer-based formulations in order to enhance several properties and characteristics of those formulations. More specifically, elastomeric compositions are provided that comprise at least one polyindane resin, which may be used to replace or enhance the functionality of existing hydrocarbon resins used in elastomeric formulations. The elastomeric compositions may be used to produce various tire components.

The present invention relates to polymers and to the use thereof in the form of active electrode material or in an electrode slurry as electrical charge storage means, the electrical charge storage means especially being secondary batteries. These secondary batteries are especially notable for high cell voltages, and simple and scalable processing and production methods (for example by means of screen printing).

The present invention relates to polymers and to the use thereof in the form of active electrode material or in an electrode slurry as electrical charge storage means, the electrical charge storage means especially being secondary batteries. These secondary batteries are especially notable for high cell voltages, and simple and scalable processing and production methods (for example by means of screen printing).

A method for manufacturing a semiconductor device includes forming a photoresist layer including a photoresist composition over a substrate. The photoresist layer is selectively exposed to actinic radiation to form a latent pattern and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a patterned photoresist. The photoresist composition includes a photoactive compound and a resin comprising a radical-active functional group and an acid labile group.

A method for manufacturing a semiconductor device includes forming a photoresist layer including a photoresist composition over a substrate. The photoresist layer is selectively exposed to actinic radiation to form a latent pattern and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a patterned photoresist. The photoresist composition includes a photoactive compound and a resin comprising a radical-active functional group and an acid labile group.

Sulfonyl-containing polymeric materials and methods of making these materials are provided. More specifically, the sulfonyl-containing polymeric materials are prepared by treating a precursor polymeric material with a sulfonyl-containing compound. The precursor polymeric material is formed from a polymerizable composition that contains a free-radically polymerizable spirobisindane monomer. The sulfonyl-containing polymeric material is porous. The size of the pores can be in the microporous region, mesoporous region, or both depending on the particular monomers and reaction conditions used to form the precursor polymeric material.

Sulfonyl-containing polymeric materials and methods of making these materials are provided. More specifically, the sulfonyl-containing polymeric materials are prepared by treating a precursor polymeric material with a sulfonyl-containing compound. The precursor polymeric material is formed from a polymerizable composition that contains a free-radically polymerizable spirobisindane monomer. The sulfonyl-containing polymeric material is porous. The size of the pores can be in the microporous region, mesoporous region, or both depending on the particular monomers and reaction conditions used to form the precursor polymeric material.

Sulfonyl-containing polymeric materials and methods of making these materials are provided. More specifically, the sulfonyl-containing polymeric materials are prepared by treating a precursor polymeric material with a sulfonyl-containing compound. The precursor polymeric material is formed from a polymerizable composition that contains a free-radically polymerizable spirobisindane monomer. The sulfonyl-containing polymeric material is porous. The size of the pores can be in the microporous region, mesoporous region, or both depending on the particular monomers and reaction conditions used to form the precursor polymeric material.

The present disclosure is directed to resins and to polymers, copolymers, and blends formed therefrom.

The present disclosure is directed to resins and to polymers, copolymers, and blends formed therefrom.