A compound represented by formula (I), a resin including a structural unit derived from the compound and a resist composition including the resin: ##STR00001##
wherein R.sup.1 represents a hydrogen atom, a halogen atom or a C.sub.1 to C.sub.6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R.sup.2 represents a C.sub.1 to C.sub.6 perfluoroalkyl group or *CHR.sup.f1R.sup.f2, * represents a binding site to a carbonyl group, R.sup.f1 and R.sup.f2 each independently represent a C.sub.1 to C.sub.4 perfluoroalkyl group or R.sup.f1 and R.sup.f2 may be bonded together with a carbon atom bonded thereto to form a ring, A.sup.1 represents a single bond, a C.sub.1 to C.sub.6 alkanediyl group or **-A.sup.3-X.sup.1-(A.sup.4-X.sup.2).sub.a-(A.sup.5).sub.b-, ** represents a binding site to an oxygen atom, A.sup.2, A.sup.3, A.sup.4 and A.sup.5 each independently represent a C.sub.1 to C.sub.6 alkanediyl group, X.sup.1 and X.sup.2 each independently represent O, COO or OCO, a and b each represent 0 or 1, and W.sup.1 represents a C.sub.5 to C.sub.18 divalent alicyclic hydrocarbon group.

A compound represented by formula (I), a resin including a structural unit derived from the compound and a resist composition including the resin: ##STR00001##
wherein R.sup.1 represents a hydrogen atom, a halogen atom or a C.sub.1 to C.sub.6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R.sup.2 represents a C.sub.1 to C.sub.6 perfluoroalkyl group or *CHR.sup.f1R.sup.f2, * represents a binding site to a carbonyl group, R.sup.f1 and R.sup.f2 each independently represent a C.sub.1 to C.sub.4 perfluoroalkyl group or R.sup.f1 and R.sup.f2 may be bonded together with a carbon atom bonded thereto to form a ring, A.sup.1 represents a single bond, a C.sub.1 to C.sub.6 alkanediyl group or **-A.sup.3-X.sup.1-(A.sup.4-X.sup.2).sub.a-(A.sup.5).sub.b-, ** represents a binding site to an oxygen atom, A.sup.2, A.sup.3, A.sup.4 and A.sup.5 each independently represent a C.sub.1 to C.sub.6 alkanediyl group, X.sup.1 and X.sup.2 each independently represent O, COO or OCO, a and b each represent 0 or 1, and W.sup.1 represents a C.sub.5 to C.sub.18 divalent alicyclic hydrocarbon group.

Copolymers useful as components of polymer electrolytes are provided in which the copolymer comprises at least one block sequence represented by formula (I):
A(T)B (I)
wherein A is a vinyl aromatic block, T is a tapered copolymer region copolymerized from a vinyl aromatic monomer and an oligo(oxyalkylene) acrylate monomer and B is an oligo(oxyalkylene) acrylate block.

Disclosed herein are compositions and methods for preventing or treating acute or chronic oral mucositis, esophagitis, enteritis, colitis, or gastrointestinal acute radiation syndrome (GI-ARS) caused by radiation exposure, using one or more enteron sorbent polymers administered gastrointestinally (e.g. orally, via feeding or gastric tube, via ostomy, or rectally).

Disclosed herein are compositions and methods for preventing or treating acute or chronic oral mucositis, esophagitis, enteritis, colitis, or gastrointestinal acute radiation syndrome (GI-ARS) caused by radiation exposure, using one or more enteron sorbent polymers administered gastrointestinally (e.g. orally, via feeding or gastric tube, via ostomy, or rectally).

A temozolomide compound according to formula (I)

##STR00001##

is described, wherein R.sup.1, L.sup.1, and X are defined herein. The temozolomide compound can be used to prepare polymers comprising temozolomide. Additionally, the polymers comprising temozolomide can be particularly useful in the treatment of certain diseases.

There is described a low number average molecular weight (M.sub.N<10 kD) and high glass transition temperature (>75 C.) copolymer (optionally a solid grade oligomer (SGO)) that comprises (a) at least 20 wt-% of itaconate functional monomer(s), (b) not more than 40% of a hydrophilic monomer, preferably an acid functional monomer(s) in an amount sufficient to achieve an acid value from 65 to 325 mg KOH per g of solid polymer; (c) optionally not more than 70% of other monomers not being either (a) or (b), having a max content of vinyl aromatic monomer(s) of 40 wt-% and/or max content of methacrylate(s) of 40 wt-%; where the weight percentages of monomers (a), (b) and (c) are calculated as a proportion of the total amount of monomers in the copolymer being 100%.

There is described a low number average molecular weight (M.sub.N<10 kD) and high glass transition temperature (>75 C.) copolymer (optionally a solid grade oligomer (SGO)) that comprises (a) at least 20 wt-% of itaconate functional monomer(s), (b) not more than 40% of a hydrophilic monomer, preferably an acid functional monomer(s) in an amount sufficient to achieve an acid value from 65 to 325 mg KOH per g of solid polymer; (c) optionally not more than 70% of other monomers not being either (a) or (b), having a max content of vinyl aromatic monomer(s) of 40 wt-% and/or max content of methacrylate(s) of 40 wt-%; where the weight percentages of monomers (a), (b) and (c) are calculated as a proportion of the total amount of monomers in the copolymer being 100%.

Provided are an active energy ray-curable composition that has good antistatic properties, scratch resistance, and transparency after curing, and an antistatic film using the same. The active energy ray-curable composition of the present invention is an active energy ray-curable composition, including a photopolymerization initiator A represented by the following Formula (I) and an antistatic compound B, ##STR00001## in Formula (I), V.sup.1, V.sup.2, V.sup.3, and V.sup.4 each independently represent a hydrogen atom or a substituent, and n represents an integer of 1 to 5.

The present invention generally relates to processes for converting an ester group to an acid group for polymers having a pendant ester of an acid group. This process is generally performed using an aqueous strong base.