The optical fibers disclosed is a single mode optical fiber comprising a core region and a cladding region surrounding and directly adjacent to the core region. The core region can have a radius r.sub.1 in a range from 3 μm to 7 μm and a relative refractive index profile Δ.sub.1 having a maximum relative refractive index Δ.sub.1max in the range from 0.25% to 0.50%. The cladding region can include a first outer cladding region and a second outer cladding region surrounding and directly adjacent to the first outer cladding region. The first outer cladding region can have a radius r.sub.4a. The second outer cladding region can have a radius rob less than or equal to 45 μm and comprising silica based glass doped with titania.

A disclosed multimode optical fiber comprises a core and a cladding surrounding the core. The core has an outer radius r.sub.1 in between 20 μm and 30 μm. The cladding includes a first outer cladding region having an outer radius r.sub.4a and a second outer cladding region having an outer radius r.sub.4b less than or equal to 45 μm. The second outer cladding region comprises silica-based glass doped with titania. The optical fiber further includes a primary coating with an outer radius r.sub.5 less than or equal to 80 μm, and a thickness (r.sub.5−r.sub.4) less than or equal to 30 μm. The optical fiber further includes a secondary coating with an outer radius r.sub.6 less than or equal to 100 μm. The secondary coating has a thickness (r.sub.6−r.sub.5) less than or equal to 30 μm, and a normalized puncture load greater than 3.6×10.sup.−3 g/micron.sup.2.

A photocurable composition for stereolithographic three-dimensional printing, wherein the photocurable composition comprises a photoreactive oligomer component comprising a hydrophobic oligomer comprising a photoreactive end group, a photoreactive monomer component comprising a photoreactive monomer having a photoreactive end group, and a photoinitiation composition comprising a photoinitiator; the photocurable composition has a viscosity of 250 to 10,000 centipoise at 22° C., determined using a Brookfield viscometer; and the photocured composition has a dielectric loss of less than 0.010, preferably less than 0.008, more preferably less than 0.006, most preferably less than 0.004, each determined by split-post dielectric resonator testing at 10 gigahertz at 23° C.

The present invention relates to a composition for encapsulating an organic light-emitting device and an organic light-emitting display device including the composition. The composition effectively blocks moisture or oxygen flowing into the display device, thereby securing the performance and lifespan of the organic light emitting device. The composition has a low dielectric constant to improve the touch sensitivity of a touch panel.

Described herein are methods and compositions relating to tunable nanoporous coatings. In certain aspects, described herein are methods and compositions wherein a tunable nanoporous coating comprises a tunable nanoporous membrane which transitions from opaque to transparent upon the application of force, and from transparent to opaque after washing with a solvent.

The present invention relates to a homopolymer, copolymer, block copolymer, and statistical copolymer comprising plural polyol monomeric units. The polyol monomeric units being acrylated and acylated or acetalized. The acrylated and acylated or acetalized polyol monomeric units have an average degree of acrylation which is 1 or more, but less than the number of the hydroxyl groups of the polyol and have an average degree of acylation or acetalization which is 1 or more, but less than the number of the hydroxyl groups of the polyol. The present invention also relates to a method of making the homopolymers, copolymers, block copolymers, and statistical copolymers, and using them in various applications, such as asphalt rubber modifiers, adhesives, or an additive in a fracking fluid for oil fracking.

Additive manufacturing compositions include low-absorbing particles or non-absorbing particles that have an absorbance for wavelengths of 300 nm to 700 nm that is equal to or greater than 0 Au and is less 1.0 Au, such as 0.001 Au≤absorbance≤0.7 Au. Slurries including such particles and an uranium-containing particle and that are used in additive manufacturing processes have an increased penetration depth for curative radiation. Removal of low-absorbing particles or non-absorbing particles during post-processing of as-manufactured products results in pores that create porosity in the as-manufactured product that provide a volume accommodating fission gases and/or can enhance wicking of certain heat pipe coolant liquids. Low-absorbing particles or non-absorbing particles can be functionalized for improved properties, for example, with fissionable material for improved ceramic yields, with burnable poisons or stabilizers for increased homogeneity, with stabilizers for localized delivery of the stabilizer, or with combinations thereof.

Disclosed are a solvent-free curable composition including quantum dots; and a curable monomer represented by Chemical Formula 1, a cured layer manufactured using the composition, a color filter including the cured layer, and a display device including the color filter.

##STR00001##

In Chemical Formula 1, each substituent is as defined in the specification.

Compounds of formula (I) are photoinitiators or photosensitizers in a photopolymerizable composition: ##STR00001## R.sub.1 represents a monovalent, linear, branched or cyclic, aliphatic hydrocarbon group having 1 to 20 carbon atoms, optionally substituted with substituent(s) selected from —Cl, —Br, —OH, ═O, —NH—CO— OR.sub.2, —NH—CO—R.sub.2 or free-radically or ionically polymerizable groups. Each R.sub.2 is independently —H or C.sub.1-6 alkyl; n is ≥1. If n=1, Z and Y are absent and X represents —OR.sub.3; if n is >1, Z represents —OR.sub.4—, Y represents —ORs— and X represents —H or —OH. R.sub.3 represents —H or R.sub.1; and R.sub.4 and R.sub.5 each independently represent a bivalent hydrocarbon group. The polymerizable moieties as optional substituents of R.sub.1 are polymerizable double or triple bonds, lactam, lactone and epoxide moieties, which are subjectable to ring-opening polymerization; and two of R.sub.1 to R.sub.5 may be linked to one another to form a ring or a dimer.

A photocurable composition for stereolithographic three-dimensional printing, wherein the photocurable composition comprises a photoreactive oligomer component comprising a hydrophobic oligomer comprising a photoreactive end group, a photoreactive monomer component comprising a photoreactive monomer having a photoreactive end group, and a photoinitiation composition comprising a photoinitiator; the photocurable composition has a viscosity of 250 to 10,000 centipoise at 22° C., determined using a Brookfield viscometer; and the photocured composition has a dielectric loss of less than 0.010, preferably less than 0.008, more preferably less than 0.006, most preferably less than 0.004, each determined by split-post dielectric resonator testing at 10 gigahertz at 23° C.