The invention provides novel polymer nanofiber or microfiber mats or membranes and methods for their preparation via an aqueous, one-step polyelectrolyte complexation and electrospinning of complex coacervates.

Provided are a naphthalenedithiol or a derivative thereof that can achieve both high refractive index and high dissolubility (compatibility), and a process for producing the same and a use therefor. A naphthalene compound of the present invention is represented by the formula (1):

##STR00001## wherein R.sup.1 and R.sup.2 independently represent a hydrogen atom or a substituent, R.sup.3 represents a substituent, and n denotes an integer of 0 to 6.

At least one of R.sup.1 and R.sup.2 may represent the substituent. The naphthalene compound of the formula (1) may be dissolved in or mixed with an organic solvent to prepare a mixture (or blend); a curable composition containing the naphthalene compound of the formula (1) may be prepared; a resin of the present invention at least contains a constituent unit represented by the formula (1P):

##STR00002## wherein R.sup.3 represents a substituent, and n denotes an integer of 0 to 6.

The present invention provides a resist composition containing a base resin composed of a polymer compound that contains a repeating unit a shown by formula (1) and a repeating unit b having either or both of a carboxyl group in which a hydrogen atom is substituted with an acid-labile group and a phenolic hydroxyl group in which a hydrogen atom is substituted with an acid-labile group, with a weight average molecular weight of 1,000 to 500,000. There can be provided a resist composition that has high sensitivity and high resolution, and can give a pattern with low dimensional variation and good pattern profile after exposure.

##STR00001##

wherein R.sup.1 represents a hydrogen atom or a methyl group; Z represents a hydroxybenzoquinone group, or a hydroxynaphthoquinone group optionally containing a substituent; and a fraction a of the repeating unit a satisfies 0<a<1.0, and a fraction b of the repeating unit b satisfies 0<b<1.0.

The present invention provides a composition for a semiconductor device, where the composition is such that the removability of residues is excellent and the dissolution of tungsten is further suppressed. The composition for a semiconductor device contains a resin having a repeating unit A derived from a polymerizable compound containing a nitrogen atom and water, where a ClogP of the polymerizable compound is 0.5 or more and a solubility of the resin in water at 25 C. is 0.01% by mass or more.

The present invention provides a composition for a semiconductor device, where the composition is such that the removability of residues is excellent and the dissolution of tungsten is further suppressed. The composition for a semiconductor device contains a resin having a repeating unit A derived from a polymerizable compound containing a nitrogen atom and water, where a ClogP of the polymerizable compound is 0.5 or more and a solubility of the resin in water at 25 C. is 0.01% by mass or more.

A polymer compound for a conductive polymer including one or more repeating units a shown by the following general formula (1), and having a weight-average molecular weight in the range of 1,000 to 500,000, ##STR00001##
wherein R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents any of a single bond, an ester group, and a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms and optionally containing either or both of an ether group and an ester group; R.sup.3 represents a linear or branched alkyl group having 1 to 4 carbon atoms with one or more hydrogen atoms in R.sup.3 being substituted by a fluorine atom(s); Z represents any of a single bond, a phenylene group, a naphthylene group, an ether group, and an ester group; and a is a number satisfying 0<a1.0.

A polymer compound for a conductive polymer including one or more repeating units a shown by the following general formula (1), and having a weight-average molecular weight in the range of 1,000 to 500,000, ##STR00001##
wherein R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents any of a single bond, an ester group, and a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms and optionally containing either or both of an ether group and an ester group; R.sup.3 represents a linear or branched alkyl group having 1 to 4 carbon atoms with one or more hydrogen atoms in R.sup.3 being substituted by a fluorine atom(s); Z represents any of a single bond, a phenylene group, a naphthylene group, an ether group, and an ester group; and a is a number satisfying 0<a1.0.

A medical adhesive with good biodegradable performance capable of undergoing crosslinking copolymerization, comprising a mono-alpha-cyanoacrylate and a bis-alpha-cyanoacrylic acid diol ester monomer molecule. The olefinic bonds in the mono-alpha-cyanoacrylate structure are polymerized in the presence of infinitesimal anions to form a solid 3D high polymer; the 3D high polymer is provided with degradation sites on the web-like backbone chain, with clear degradation path and absorbable degradation products. The medical adhesive can be used for wound adhesive, large area wound hemostasia, and visceral and soft tissue wound closure.

The present invention relates to an ampholytic polymeric system obtainable by a process comprising the copolymerization of (i) a monomer according to Formula (1), (ii) an ethylenically unsaturated cationic monomer and (iii) a (co)polymer comprising an ethylenically unsaturated anionic monomer which comprises a sulfonate group: (1) wherein X is O or NR.sup.2, R.sup.1 and R.sup.2 are independently selected from the group consisting of hydrogen and C1-C6 alkyl groups or wherein R.sup.1 and R.sup.2 form together a (CR.sup.1R.sup.2)n- chain, wherein n is 3 to 12, and wherein R.sup.3 is independently selected from the group consisting of hydrogen and CH.sub.3. The present invention further relates to the use of ampholytic polymeric system in separation processes. ##STR00001##

The present invention relates to an ampholytic polymeric system obtainable by a process comprising the copolymerization of (i) a monomer according to Formula (1), (ii) an ethylenically unsaturated cationic monomer and (iii) a (co)polymer comprising an ethylenically unsaturated anionic monomer which comprises a sulfonate group: (1) wherein X is O or NR.sup.2, R.sup.1 and R.sup.2 are independently selected from the group consisting of hydrogen and C1-C6 alkyl groups or wherein R.sup.1 and R.sup.2 form together a (CR.sup.1R.sup.2)n- chain, wherein n is 3 to 12, and wherein R.sup.3 is independently selected from the group consisting of hydrogen and CH.sub.3. The present invention further relates to the use of ampholytic polymeric system in separation processes. ##STR00001##