C08F32/08

RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE
20190031803 · 2019-01-31 · ·

A resin composition comprising a cyclic olefin polymer (A) having a protonic polar group, a cross-linking agent (B), and an organic solvent (C), wherein the organic solvent (C) contains diethylene glycol ethyl methyl ether, and a content of diethylene glycol dimethyl ether contained in the organic solvent (C) is 10 ppm by weight or less when a content of the diethylene glycol ethyl methyl ether is 100 wt %, is provided.

Oligomer, composition and composite material employing the same

An oligomer, composition, and composite material employing the same are provided. The oligomer can be a reaction product of a reactant (a) and a reactant (b). The reactant (a) is a reaction product of a reactant (c) and a reactant (d). The reactant (b) can be ##STR00001##
or a combination thereof, wherein a is 0 or 1, and R.sup.1 is independently hydrogen or ##STR00002##
and wherein b is 0-6; c is 0 or 1; and, d is 0-6. The reactant (c) is ##STR00003##
wherein R.sup.2 is C.sub.5-10 alkyl group. The reactant (d) is ##STR00004##
wherein e is 0-10.

Oligomer, composition and composite material employing the same

An oligomer, composition, and composite material employing the same are provided. The oligomer can be a reaction product of a reactant (a) and a reactant (b). The reactant (a) is a reaction product of a reactant (c) and a reactant (d). The reactant (b) can be ##STR00001##
or a combination thereof, wherein a is 0 or 1, and R.sup.1 is independently hydrogen or ##STR00002##
and wherein b is 0-6; c is 0 or 1; and, d is 0-6. The reactant (c) is ##STR00003##
wherein R.sup.2 is C.sub.5-10 alkyl group. The reactant (d) is ##STR00004##
wherein e is 0-10.

METHOD FOR POLYMER REMOVAL FROM SINGLE-WALLED CARBON NANOTUBES
20180354799 · 2018-12-13 ·

Processes for selectively dispersing semi-conducting single-walled carbon nanotubes (sc-SWCNTs) in a solvent. One process comprises adding an amine either: to a conjugated polymer extraction process (CPE) of the sc-SWCNTs; or after the CPE of the sc-SWCNTs, in which the amine partially displaces the conjugate polymer associated with the sc-SWNTs dispersed in the solvent. Another process comprises adding an amine either: to a conjugated polymer extraction process (CPE) of the sc-SWCNTs; or after the CPE of the sc-SWCNTs, with the proviso that the amine excludes EDTA. Also, a process for displacement of a conjugated polymer from the surface of semi-conducting single-walled carbon nanotubes (sc-SWCNTs) dispersed in a solvent, which comprises adding an amine either: to a conjugated polymer extraction process (CPE) of the sc-SWCNTs; or after the CPE of the sc-SWCNTs.

METHOD FOR POLYMER REMOVAL FROM SINGLE-WALLED CARBON NANOTUBES
20180354799 · 2018-12-13 ·

Processes for selectively dispersing semi-conducting single-walled carbon nanotubes (sc-SWCNTs) in a solvent. One process comprises adding an amine either: to a conjugated polymer extraction process (CPE) of the sc-SWCNTs; or after the CPE of the sc-SWCNTs, in which the amine partially displaces the conjugate polymer associated with the sc-SWNTs dispersed in the solvent. Another process comprises adding an amine either: to a conjugated polymer extraction process (CPE) of the sc-SWCNTs; or after the CPE of the sc-SWCNTs, with the proviso that the amine excludes EDTA. Also, a process for displacement of a conjugated polymer from the surface of semi-conducting single-walled carbon nanotubes (sc-SWCNTs) dispersed in a solvent, which comprises adding an amine either: to a conjugated polymer extraction process (CPE) of the sc-SWCNTs; or after the CPE of the sc-SWCNTs.

Polymer and method for preparing the same

A polymer and a method for preparing the same are provided. The polymer includes a first repeat unit and a second repeat unit. In particular, the first repeat unit is ##STR00001##
and, the second repeat unit is ##STR00002##
wherein R.sup.+ is ##STR00003##
A.sup.? is F.sup.?, Cl.sup.?, Br.sup.?, I.sup.?, OH.sup.?, HCO.sub.3.sup.?, HSO.sub.4.sup.?, SbF.sub.6.sup.?, BF.sub.4.sup.?, H.sub.2PO.sub.4.sup.?, H.sub.2PO.sub.3.sup.?, or H.sub.2PO.sub.2.sup.?; X is ##STR00004##
i and j are independently 0, or an integer from 1 to 4; Y is O, S, CH.sub.2, or NH; R.sup.1 is independently C.sub.1-8 alkyl group; and, R.sup.2 and R.sup.3 are hydrogen, or independently C.sub.1-8 alkyl group.

Vertical alignment layer comprising cyclic olefin copolymer

The present invention relates to a vertical alignment layer including a cyclic olefin copolymer, and more specifically, the present invention relates to a vertical alignment layer capable of having alignment even in a low temperature process, and exhibiting excellent liquid crystal vertical alignment by including a cyclic olefin copolymer having a specific substituent.

Vertical alignment layer comprising cyclic olefin copolymer

The present invention relates to a vertical alignment layer including a cyclic olefin copolymer, and more specifically, the present invention relates to a vertical alignment layer capable of having alignment even in a low temperature process, and exhibiting excellent liquid crystal vertical alignment by including a cyclic olefin copolymer having a specific substituent.

FLUORINE FREE PHOTOPATTERNABLE PHENOL FUNCTIONAL GROUP CONTAINING POLYMER COMPOSITIONS
20180329299 · 2018-11-15 ·

Various polycycloolefinic polymers containing phenolic pendent groups and compositions thereof useful for forming self-imageable films encompassing such polymers are disclosed. Such polymers encompass norbornene-type repeating units containing phenolic pendent groups which contain very low levels of fluorine containing monomers. The films formed from such polymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.

FLUORINE FREE PHOTOPATTERNABLE PHENOL FUNCTIONAL GROUP CONTAINING POLYMER COMPOSITIONS
20180329299 · 2018-11-15 ·

Various polycycloolefinic polymers containing phenolic pendent groups and compositions thereof useful for forming self-imageable films encompassing such polymers are disclosed. Such polymers encompass norbornene-type repeating units containing phenolic pendent groups which contain very low levels of fluorine containing monomers. The films formed from such polymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.