Patent classifications
C08F32/08
RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE
A resin composition comprising a cyclic olefin polymer (A) having a protonic polar group, a cross-linking agent (B), and an organic solvent (C), wherein the organic solvent (C) contains diethylene glycol ethyl methyl ether, and a content of diethylene glycol dimethyl ether contained in the organic solvent (C) is 10 ppm by weight or less when a content of the diethylene glycol ethyl methyl ether is 100 wt %, is provided.
Oligomer, composition and composite material employing the same
An oligomer, composition, and composite material employing the same are provided. The oligomer can be a reaction product of a reactant (a) and a reactant (b). The reactant (a) is a reaction product of a reactant (c) and a reactant (d). The reactant (b) can be ##STR00001##
or a combination thereof, wherein a is 0 or 1, and R.sup.1 is independently hydrogen or ##STR00002##
and wherein b is 0-6; c is 0 or 1; and, d is 0-6. The reactant (c) is ##STR00003##
wherein R.sup.2 is C.sub.5-10 alkyl group. The reactant (d) is ##STR00004##
wherein e is 0-10.
Oligomer, composition and composite material employing the same
An oligomer, composition, and composite material employing the same are provided. The oligomer can be a reaction product of a reactant (a) and a reactant (b). The reactant (a) is a reaction product of a reactant (c) and a reactant (d). The reactant (b) can be ##STR00001##
or a combination thereof, wherein a is 0 or 1, and R.sup.1 is independently hydrogen or ##STR00002##
and wherein b is 0-6; c is 0 or 1; and, d is 0-6. The reactant (c) is ##STR00003##
wherein R.sup.2 is C.sub.5-10 alkyl group. The reactant (d) is ##STR00004##
wherein e is 0-10.
METHOD FOR POLYMER REMOVAL FROM SINGLE-WALLED CARBON NANOTUBES
Processes for selectively dispersing semi-conducting single-walled carbon nanotubes (sc-SWCNTs) in a solvent. One process comprises adding an amine either: to a conjugated polymer extraction process (CPE) of the sc-SWCNTs; or after the CPE of the sc-SWCNTs, in which the amine partially displaces the conjugate polymer associated with the sc-SWNTs dispersed in the solvent. Another process comprises adding an amine either: to a conjugated polymer extraction process (CPE) of the sc-SWCNTs; or after the CPE of the sc-SWCNTs, with the proviso that the amine excludes EDTA. Also, a process for displacement of a conjugated polymer from the surface of semi-conducting single-walled carbon nanotubes (sc-SWCNTs) dispersed in a solvent, which comprises adding an amine either: to a conjugated polymer extraction process (CPE) of the sc-SWCNTs; or after the CPE of the sc-SWCNTs.
METHOD FOR POLYMER REMOVAL FROM SINGLE-WALLED CARBON NANOTUBES
Processes for selectively dispersing semi-conducting single-walled carbon nanotubes (sc-SWCNTs) in a solvent. One process comprises adding an amine either: to a conjugated polymer extraction process (CPE) of the sc-SWCNTs; or after the CPE of the sc-SWCNTs, in which the amine partially displaces the conjugate polymer associated with the sc-SWNTs dispersed in the solvent. Another process comprises adding an amine either: to a conjugated polymer extraction process (CPE) of the sc-SWCNTs; or after the CPE of the sc-SWCNTs, with the proviso that the amine excludes EDTA. Also, a process for displacement of a conjugated polymer from the surface of semi-conducting single-walled carbon nanotubes (sc-SWCNTs) dispersed in a solvent, which comprises adding an amine either: to a conjugated polymer extraction process (CPE) of the sc-SWCNTs; or after the CPE of the sc-SWCNTs.
Polymer and method for preparing the same
A polymer and a method for preparing the same are provided. The polymer includes a first repeat unit and a second repeat unit. In particular, the first repeat unit is ##STR00001##
and, the second repeat unit is ##STR00002##
wherein R.sup.+ is ##STR00003##
A.sup.? is F.sup.?, Cl.sup.?, Br.sup.?, I.sup.?, OH.sup.?, HCO.sub.3.sup.?, HSO.sub.4.sup.?, SbF.sub.6.sup.?, BF.sub.4.sup.?, H.sub.2PO.sub.4.sup.?, H.sub.2PO.sub.3.sup.?, or H.sub.2PO.sub.2.sup.?; X is ##STR00004##
i and j are independently 0, or an integer from 1 to 4; Y is O, S, CH.sub.2, or NH; R.sup.1 is independently C.sub.1-8 alkyl group; and, R.sup.2 and R.sup.3 are hydrogen, or independently C.sub.1-8 alkyl group.
Vertical alignment layer comprising cyclic olefin copolymer
The present invention relates to a vertical alignment layer including a cyclic olefin copolymer, and more specifically, the present invention relates to a vertical alignment layer capable of having alignment even in a low temperature process, and exhibiting excellent liquid crystal vertical alignment by including a cyclic olefin copolymer having a specific substituent.
Vertical alignment layer comprising cyclic olefin copolymer
The present invention relates to a vertical alignment layer including a cyclic olefin copolymer, and more specifically, the present invention relates to a vertical alignment layer capable of having alignment even in a low temperature process, and exhibiting excellent liquid crystal vertical alignment by including a cyclic olefin copolymer having a specific substituent.
FLUORINE FREE PHOTOPATTERNABLE PHENOL FUNCTIONAL GROUP CONTAINING POLYMER COMPOSITIONS
Various polycycloolefinic polymers containing phenolic pendent groups and compositions thereof useful for forming self-imageable films encompassing such polymers are disclosed. Such polymers encompass norbornene-type repeating units containing phenolic pendent groups which contain very low levels of fluorine containing monomers. The films formed from such polymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.
FLUORINE FREE PHOTOPATTERNABLE PHENOL FUNCTIONAL GROUP CONTAINING POLYMER COMPOSITIONS
Various polycycloolefinic polymers containing phenolic pendent groups and compositions thereof useful for forming self-imageable films encompassing such polymers are disclosed. Such polymers encompass norbornene-type repeating units containing phenolic pendent groups which contain very low levels of fluorine containing monomers. The films formed from such polymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.