Patent classifications
C08F32/08
Azide-modified polynorbornene as polymeric coupling agent
This invention relates to a process for forming a long-chain branched polymer and a long-chain branched polymer resulting from the process. The process comprises reacting (a) a polyolefin base polymer with (b) a coupling agent comprising a polymeric coupling agent, optionally blended with a molecular coupling agent, the polymeric coupling agent being a modified polyolefin having a reactive coupling group at one or more terminal ends of the modified polyolefin chain, to couple the polyolefin base polymer (a) with the coupling agent (b) to form a long-chain branched polymer having a long-chain branching and/or higher surface energy relative to the polyolefin base polymer.
Azide-modified polynorbornene as polymeric coupling agent
This invention relates to a process for forming a long-chain branched polymer and a long-chain branched polymer resulting from the process. The process comprises reacting (a) a polyolefin base polymer with (b) a coupling agent comprising a polymeric coupling agent, optionally blended with a molecular coupling agent, the polymeric coupling agent being a modified polyolefin having a reactive coupling group at one or more terminal ends of the modified polyolefin chain, to couple the polyolefin base polymer (a) with the coupling agent (b) to form a long-chain branched polymer having a long-chain branching and/or higher surface energy relative to the polyolefin base polymer.
Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method
The present invention provides a compound represented by following formula (1), ##STR00001##
wherein R.sup.1 represents a 2n-valent group having 1 to 30 carbon atoms, each of R.sup.2 to R.sup.5 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a halogen atom, a thiol group or a hydroxyl group, provided that at least one selected from R.sup.1 to R.sup.5 represents a group including an iodine atom and at least one R.sup.4 and/or at least one R.sup.5 represent/represents one or more selected from the group consisting of a hydroxyl group and a thiol group, each of m.sup.2 and m.sup.3 independently represents an integer of 0 to 8, each of m.sup.4 and m.sup.5 independently represents an integer of 0 to 9, provided that m.sup.4 and m.sup.5 do not represent 0 at the same time, n represents an integer of 1 to 4, and each of p.sup.2 to p.sup.5 independently represents an integer of 0 to 2.
Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method
The present invention provides a compound represented by following formula (1), ##STR00001##
wherein R.sup.1 represents a 2n-valent group having 1 to 30 carbon atoms, each of R.sup.2 to R.sup.5 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a halogen atom, a thiol group or a hydroxyl group, provided that at least one selected from R.sup.1 to R.sup.5 represents a group including an iodine atom and at least one R.sup.4 and/or at least one R.sup.5 represent/represents one or more selected from the group consisting of a hydroxyl group and a thiol group, each of m.sup.2 and m.sup.3 independently represents an integer of 0 to 8, each of m.sup.4 and m.sup.5 independently represents an integer of 0 to 9, provided that m.sup.4 and m.sup.5 do not represent 0 at the same time, n represents an integer of 1 to 4, and each of p.sup.2 to p.sup.5 independently represents an integer of 0 to 2.
LIQUID FORMULATION FOR REACTION INJECTION MOLDING AND MANUFACTURING METHOD THEREOF
A method for manufacturing a liquid formulation for reaction injection molding for polymerizing a norbornene-based monomer in the presence of a metathesis polymerization catalyst comprising tungsten as a center metal, the liquid formulation comprising a norbornene-based monomer, provided that in case where the norbornene-based monomer includes exo-dicyclopentadiene, a content of exo-dicyclopentadiene is from 0 to 2% by mass of the norbornene-based monomer, an activator of the catalyst, and a specific ether compound.
LIQUID FORMULATION FOR REACTION INJECTION MOLDING AND MANUFACTURING METHOD THEREOF
A method for manufacturing a liquid formulation for reaction injection molding for polymerizing a norbornene-based monomer in the presence of a metathesis polymerization catalyst comprising tungsten as a center metal, the liquid formulation comprising a norbornene-based monomer, provided that in case where the norbornene-based monomer includes exo-dicyclopentadiene, a content of exo-dicyclopentadiene is from 0 to 2% by mass of the norbornene-based monomer, an activator of the catalyst, and a specific ether compound.
Polycycloolefin polymer compositions as optical materials
Embodiments in accordance with the present invention encompass compositions encompassing a procatalyst and a thermal or photoactivator along with one or more monomers which undergo vinyl addition polymerization when said composition is heated to a temperature from 50 C. to 100 C. to form a substantially transparent film. The monomers employed therein have a range of refractive index from 1.4 to 1.6 and thus these compositions can be tailored to form transparent films of varied refractive indices. Accordingly, compositions of this invention are useful in various opto-electronic applications, including as coatings, encapsulants, fillers, leveling agents, among others.
Polycycloolefin polymer compositions as optical materials
Embodiments in accordance with the present invention encompass compositions encompassing a procatalyst and a thermal or photoactivator along with one or more monomers which undergo vinyl addition polymerization when said composition is heated to a temperature from 50 C. to 100 C. to form a substantially transparent film. The monomers employed therein have a range of refractive index from 1.4 to 1.6 and thus these compositions can be tailored to form transparent films of varied refractive indices. Accordingly, compositions of this invention are useful in various opto-electronic applications, including as coatings, encapsulants, fillers, leveling agents, among others.
Earpieces employing viscoelastic materials
The disclosure is related to compositions including viscoelastic materials. The compositions are suitable for use in earpieces such as in-ear earpieces.
Earpieces employing viscoelastic materials
The disclosure is related to compositions including viscoelastic materials. The compositions are suitable for use in earpieces such as in-ear earpieces.