A material for forming organic film contains (A) compound shown by general formula (1) and/or polymer having repeating unit shown by general formula (4), and (B) organic solvent. In formula (1), AR1, AR2, AR3, AR4, AR5, and AR6 each represent benzene ring or naphthalene ring; R1 represents any group shown in following formula (2); “n” represents integer of 1 or 2; and W represents divalent organic group having 2-50 carbon atoms. In formula (4), AR1, AR2, AR3, AR4, AR5, AR6, R1, “n”, and W are as defined above; and R2 and R3 each represent hydrogen atom or organic group having 1-20 carbon atoms, and optionally bond to each other within molecule to form cyclic organic group. An object provides a material for forming organic film to enable high etching resistance and excellent twisting resistance without impairing resin-derived carbon content; and compound and polymer suitable for material for forming organic film.

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A material for forming organic film contains (A) compound shown by general formula (1) and/or polymer having repeating unit shown by general formula (4), and (B) organic solvent. In formula (1), AR1, AR2, AR3, AR4, AR5, and AR6 each represent benzene ring or naphthalene ring; R1 represents any group shown in following formula (2); “n” represents integer of 1 or 2; and W represents divalent organic group having 2-50 carbon atoms. In formula (4), AR1, AR2, AR3, AR4, AR5, AR6, R1, “n”, and W are as defined above; and R2 and R3 each represent hydrogen atom or organic group having 1-20 carbon atoms, and optionally bond to each other within molecule to form cyclic organic group. An object provides a material for forming organic film to enable high etching resistance and excellent twisting resistance without impairing resin-derived carbon content; and compound and polymer suitable for material for forming organic film.

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To provide a monomer composition in which the solubility of the polymerization inhibitor in the cyclic monomer is good, the stability of the cyclic monomer during storage is good, and the cyclic monomer and the polymerization inhibitor are easily separated by distillation; and a method for producing a high molecular weight fluorinated polymer from the monomer composition. A monomer composition which comprises a specific cyclic monomer and a polymerization inhibitor, wherein the polymerization inhibitor is a polymerization inhibitor which satisfies (a) it is a 6-membered unsaturated cyclic hydrocarbon having from 1 to 4 substituents, (b) it has, as the substituent, at least one type selected from the group consisting of a t-butyl group, a methyl group, an isopropenyl group, an oxo group and a hydroxy group, (c) in a case where it has an oxo group as one type of the substituent, it has, as the substituent other than the oxo group, either one or both of a t-butyl group and a methyl group, and (d) in a case where it has a hydroxy group as the substituent, the number of the hydroxy group is only one.

To provide a monomer composition in which the solubility of the polymerization inhibitor in the cyclic monomer is good, the stability of the cyclic monomer during storage is good, and the cyclic monomer and the polymerization inhibitor are easily separated by distillation; and a method for producing a high molecular weight fluorinated polymer from the monomer composition. A monomer composition which comprises a specific cyclic monomer and a polymerization inhibitor, wherein the polymerization inhibitor is a polymerization inhibitor which satisfies (a) it is a 6-membered unsaturated cyclic hydrocarbon having from 1 to 4 substituents, (b) it has, as the substituent, at least one type selected from the group consisting of a t-butyl group, a methyl group, an isopropenyl group, an oxo group and a hydroxy group, (c) in a case where it has an oxo group as one type of the substituent, it has, as the substituent other than the oxo group, either one or both of a t-butyl group and a methyl group, and (d) in a case where it has a hydroxy group as the substituent, the number of the hydroxy group is only one.

A method for producing a sand mold includes mixing artificial sand with a furan resin composition including a furan resin precursor, preparing molding sand having the artificial sand and a surface-modified layer containing a resin cured product covering the artificial sand and including a curing agent attached to the surface-modified layer by mixing the curing agent including xylene sulfonic acid with the artificial sand with which the furan resin composition is mixed, and curing the furan resin composition, after mixing the artificial sand with the furan resin composition, and curing an added portion of the binder in the molding sand by adding the binder to the molding sand. In the step of curing the added portion of the binder, the curing agent for curing the furan resin composition is used also as a curing agent for curing the binder.

A method for producing a sand mold includes mixing artificial sand with a furan resin composition including a furan resin precursor, preparing molding sand having the artificial sand and a surface-modified layer containing a resin cured product covering the artificial sand and including a curing agent attached to the surface-modified layer by mixing the curing agent including xylene sulfonic acid with the artificial sand with which the furan resin composition is mixed, and curing the furan resin composition, after mixing the artificial sand with the furan resin composition, and curing an added portion of the binder in the molding sand by adding the binder to the molding sand. In the step of curing the added portion of the binder, the curing agent for curing the furan resin composition is used also as a curing agent for curing the binder.

Chemical compositions are provided having the structure of Formula (I): ##STR00001##
where R includes at least one aromatic moiety, and X and X′ may both or independently include an aromatic moiety, an aliphatic moiety, or a hydrogen. Additionally, chemical formulations are provided which include the chemical composition having the structure of Formula (I) and at least one solvent.

Chemical compositions are provided having the structure of Formula (I): ##STR00001##
where R includes at least one aromatic moiety, and X and X′ may both or independently include an aromatic moiety, an aliphatic moiety, or a hydrogen. Additionally, chemical formulations are provided which include the chemical composition having the structure of Formula (I) and at least one solvent.

A process for recovering sulfur from a sour gas is provided. The process includes the steps of: providing the sour gas to a membrane separation unit having a carbon dioxide-selective membrane that comprises a perfluoropolymer, wherein the sour gas comprises carbon dioxide and at least 1 mol % hydrogen sulfide; separating the sour gas using the carbon dioxide-selective membrane in the membrane separation stage to obtain hydrogen sulfide-enriched gas and hydrogen sulfide-stripped gas, wherein the hydrogen sulfide-enriched gas has a hydrogen sulfide concentration of at least 20 mol %, and wherein the hydrogen sulfide-stripped gas comprises carbon dioxide; and processing the hydrogen sulfide-enriched gas in a sulfur recovery unit to obtain sulfur.

A process for recovering sulfur from a sour gas is provided. The process includes the steps of: providing the sour gas to a membrane separation unit having a carbon dioxide-selective membrane that comprises a perfluoropolymer, wherein the sour gas comprises carbon dioxide and at least 1 mol % hydrogen sulfide; separating the sour gas using the carbon dioxide-selective membrane in the membrane separation stage to obtain hydrogen sulfide-enriched gas and hydrogen sulfide-stripped gas, wherein the hydrogen sulfide-enriched gas has a hydrogen sulfide concentration of at least 20 mol %, and wherein the hydrogen sulfide-stripped gas comprises carbon dioxide; and processing the hydrogen sulfide-enriched gas in a sulfur recovery unit to obtain sulfur.