C08F34/02

METHOD FOR PRODUCING HOLLOW FINE PARTICLES, HOLLOW FINE PARTICLES, PHASE SEPARATED FINE PARTICLES, AQUEOUS DISPERSION, AND COMPOSITION

The disclosure provides a production method capable of producing a hollow fine particulate containing a fluorine-containing resin and having a large average particle size. The production method includes a step A of dispersing a solution containing a fluorinated monomer and a non-polymerizable solvent into water to provide a dispersion; a step B of polymerizing the fluorinated monomer to provide a phase-separated fine particulate containing a fluorine-containing resin; and a step C of removing the non-polymerizable solvent in the phase-separated fine particulate to provide a hollow fine particulate.

METHOD FOR PRODUCING HOLLOW FINE PARTICLES, HOLLOW FINE PARTICLES, PHASE SEPARATED FINE PARTICLES, AQUEOUS DISPERSION, AND COMPOSITION

The disclosure provides a production method capable of producing a hollow fine particulate containing a fluorine-containing resin and having a large average particle size. The production method includes a step A of dispersing a solution containing a fluorinated monomer and a non-polymerizable solvent into water to provide a dispersion; a step B of polymerizing the fluorinated monomer to provide a phase-separated fine particulate containing a fluorine-containing resin; and a step C of removing the non-polymerizable solvent in the phase-separated fine particulate to provide a hollow fine particulate.

FLUORINE-CONTAINING COMPOSITION AND PRODUCTION METHOD THEREFOR

A primary object of the present disclosure is to provide: a fluoropolymer composition that has a low refraction index and that comprises a structural unit having a fluorine-containing aliphatic ring, the fluorine-containing aliphatic ring having one, two, or three ethereal oxygen atoms as ring-constituting atoms; a production method therefor; and the like. The present disclosure relates to a fluorine-containing composition comprising two or more fluorine-containing polymers (A), each containing as a main component a structural unit having a fluorine-containing aliphatic ring, the fluorine-containing aliphatic ring having one, two, or three ethereal oxygen atoms as ring-constituting atoms; and the like.

Large molecule and polymer flame retardants

Disclosed herein are flame retardant compounds and polymer compositions containing these flame retardant compounds. The flame retardant compounds can be derived from biological sources and can include coordinated metal ions.

PROCESS FOR PRODUCING FLUORINATED POLYMER

To provide a process for producing a fluorinated polymer having a cyclic structure at a relatively low cost, by efficiently recovering, from a mixture containing a fluorinated polymer obtained by polymerizing a perfluoromonomer having a cyclic structure and an unreacted perfluoromonomer having a cyclic structure, the unreacted perfluoromonomer having a cyclic structure. A monomer component containing a perfluoromonomer having a specific cyclic structure is polymerized in the presence of a polymerization initiator at a predetermined polymerization temperature to obtain a mixture containing a fluorinated polymer and an unreacted cyclic structure monomer, and the perfluoromonomer having a cyclic structure is recovered from the mixture at a temperature of at most the maximum ultimate temperature of the polymerization temperature+12 C. and at most the 10 hour half-life temperature of the polymerization initiator+12 C. under a pressure of less than the atmospheric pressure.

SUBSTITUTED CYCLIC ETHER POLYMERS AND CONJUGATES AND USES THEREOF
20180066081 · 2018-03-08 ·

Disclosed herein are substituted cyclic ether monomers, polymers, and drug conjugates thereof, which are useful for the treatment of diseases and conditions of the oral cavity. In particular, disclosed herein are monomers of Formula (I), polymers of Formula (II), drug conjugates of the monomers and polymers, and pharmaceutically acceptable salts and solvates of each:

##STR00001##

wherein the substituents are as described.

SUBSTITUTED CYCLIC ETHER POLYMERS AND CONJUGATES AND USES THEREOF
20180066081 · 2018-03-08 ·

Disclosed herein are substituted cyclic ether monomers, polymers, and drug conjugates thereof, which are useful for the treatment of diseases and conditions of the oral cavity. In particular, disclosed herein are monomers of Formula (I), polymers of Formula (II), drug conjugates of the monomers and polymers, and pharmaceutically acceptable salts and solvates of each:

##STR00001##

wherein the substituents are as described.

Monomers and polymers derived from natural phenols

Monomers, polymers and copolymers are provided that incorporate at least one naturally occurring phenolic compound, such as a plant phenol.

Material for forming organic film, patterning process, compound, and polymer

A material for forming organic film contains (A) compound shown by general formula (1) and/or polymer having repeating unit shown by general formula (4), and (B) organic solvent. In formula (1), AR1, AR2, AR3, AR4, AR5, and AR6 each represent benzene ring or naphthalene ring; R1 represents any group shown in following formula (2); n represents integer of 1 or 2; and W represents divalent organic group having 2-50 carbon atoms. In formula (4), AR1, AR2, AR3, AR4, AR5, AR6, R1, n, and W are as defined above; and R2 and R3 each represent hydrogen atom or organic group having 1-20 carbon atoms, and optionally bond to each other within molecule to form cyclic organic group. An object provides a material for forming organic film to enable high etching resistance and excellent twisting resistance without impairing resin-derived carbon content; and compound and polymer suitable for material for forming organic film. ##STR00001##

Material for forming organic film, patterning process, compound, and polymer

A material for forming organic film contains (A) compound shown by general formula (1) and/or polymer having repeating unit shown by general formula (4), and (B) organic solvent. In formula (1), AR1, AR2, AR3, AR4, AR5, and AR6 each represent benzene ring or naphthalene ring; R1 represents any group shown in following formula (2); n represents integer of 1 or 2; and W represents divalent organic group having 2-50 carbon atoms. In formula (4), AR1, AR2, AR3, AR4, AR5, AR6, R1, n, and W are as defined above; and R2 and R3 each represent hydrogen atom or organic group having 1-20 carbon atoms, and optionally bond to each other within molecule to form cyclic organic group. An object provides a material for forming organic film to enable high etching resistance and excellent twisting resistance without impairing resin-derived carbon content; and compound and polymer suitable for material for forming organic film. ##STR00001##