A photobase generator includes a compound including a first skeleton represented by the following formula (a), and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group, wherein the compound generates a base, in which a hydrogen atom is bonding with the nitrogen atom of the second skeleton, by light irradiation, and the pKa of a conjugate acid of the base in water is 12 or more. In formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.

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Disclosed are a surface-modified quantum dot, a curable composition including the quantum dot, a cured layer, and a color filter.

The present disclosure relates to a preparation method of a super absorbent polymer composition. More specifically, it relates to a preparation method of a super absorbent polymer composition capable of pulverizing the hydrogel polymer to a normal particle size without agglomeration between particles by adding an additive having a specific structure, reducing manufacturing cost by simultaneously performing a drying process and a surface cross-linking process, and significantly reducing the amount of fine powder generated during the process.

A method forming a blocked 1,1-dicarbonyl substituted comprises reacting an alkene of a 1,1-dicarbonyl substituted alkene with a blocking Michael addition donor compound such as an alcohol or thiol. The blocked 1,1-dicarbonyl substituted alkene may be polymerized by providing sufficient thermal energy whereby at least portion of the blocked alkenes revert to alkenes and may be addition polymerized or Michael added with a multifunctional Michael addition donor compound (e.g., polyol or polythiol).

A method forming a blocked 1,1-dicarbonyl substituted comprises reacting an alkene of a 1,1-dicarbonyl substituted alkene with a blocking Michael addition donor compound such as an alcohol or thiol. The blocked 1,1-dicarbonyl substituted alkene may be polymerized by providing sufficient thermal energy whereby at least portion of the blocked alkenes revert to alkenes and may be addition polymerized or Michael added with a multifunctional Michael addition donor compound (e.g., polyol or polythiol).

To provide a photopolymerizable composition which can be quickly cured by light of from 300 nm to 450 nm, and a cured product of which is less colored. A photopolymerization sensitizer composition containing a compound represented by the following formula (1) and a compound, of which the maximum value of an absorption coefficient in a wavelength region ranging from at least 400 nm to at most 500 nm is higher than the maximum value of an absorption coefficient in a wavelength region ranging from at least 400 nm to at most 500 nm of said compound; and a photopolymerizable composition containing the photopolymerization sensitizer composition. In the formula (1), R.sup.1 is a C.sub.1-20 alkyl group, a C.sub.6-20 aryl group, a C.sub.1-20 alkoxy group or a C.sub.6-20 aryloxy group, and each of X.sup.1 and Y.sup.1 which may be the same or different, is a hydrogen atom or a C.sub.1-8 alkyl group ##STR00001##

A colloidal structure includes a plurality of types of colloidal particles, and a matrix that fixes the colloidal particles. The plurality of types of the colloidal particles include at least first colloidal particles and second colloidal particles, which are different in average particle size from each other. Then, the plurality of types of the colloidal particles form a regular array in a matrix. A multi-colloidal structure includes a plurality of the colloidal structures. A method for producing a colloidal structure includes: a dispersion liquid preparation step of preparing a colloidal dispersion liquid by dispersing a plurality of types of colloidal particles together with a monomer; a coating film generation step of coating the colloidal dispersion liquid on a substrate, and generating a coating film; and a polymerization step of polymerizing the monomer in the coating film.

An electrochromic compound represented by the following formula (1) is provided: ##STR00001## where each of R.sub.1 to R.sub.9 and Ar.sub.1 to Ar.sub.6 independently represents one of a hydrogen atom, a halogen atom, a monovalent organic group, a group in which two or more aryl and/or heteroaryl groups are bound to each other via a covalent bond, a group in which two or more aryl and/or heteroaryl groups are condensed with each other to form a ring, and a polymerizable functional group; and at least one of Ar.sub.1 to Ar.sub.6 represents an aryl group, a heteroaryl group, a group in which two or more aryl and/or heteroaryl groups are bound to each other via a covalent bond, or a group in which at least two aryl or heteroaryl groups are condensed with each other to form a ring.

The present invention relates to a thermoplastic copolymer, block copolymer, and statistical copolymer comprising plural acrylated polyol monomeric units having different degrees of acrylation of hydroxyl groups. The acrylated polyol monomeric units have an average degree of acrylation greater than 1 and less than the number of the hydroxyl groups of the polyol. The present invention also relates to a method of making the thermoplastic copolymer, block copolymer, and statistical copolymer, and using them in various applications, such as asphalt rubber modifiers, adhesives, or an additive in a fracking fluid for oil fracking.

The present invention relates to a thermoplastic copolymer, block copolymer, and statistical copolymer comprising plural acrylated polyol monomeric units having different degrees of acrylation of hydroxyl groups. The acrylated polyol monomeric units have an average degree of acrylation greater than 1 and less than the number of the hydroxyl groups of the polyol. The present invention also relates to a method of making the thermoplastic copolymer, block copolymer, and statistical copolymer, and using them in various applications, such as asphalt rubber modifiers, adhesives, or an additive in a fracking fluid for oil fracking.