Patent classifications
C08F128/06
Polycyclic dithiophenes
The present invention relates to novel compounds, corresponding oligomers and (co)polymers. The compounds according to the invention are useful as semiconductors and have excellent solubility in organic solvents and excellent film-forming properties. In addition, high efficiency of energy conversion, excellent field-effect mobility, good on/off current ratios and/or excellent stability can be observed, when the polymers according to the invention are used in organic field effect transistors, organic photovoltaics (solar cells) and photodiodes.
Polycyclic dithiophenes
The present invention relates to novel compounds, corresponding oligomers and (co)polymers. The compounds according to the invention are useful as semiconductors and have excellent solubility in organic solvents and excellent film-forming properties. In addition, high efficiency of energy conversion, excellent field-effect mobility, good on/off current ratios and/or excellent stability can be observed, when the polymers according to the invention are used in organic field effect transistors, organic photovoltaics (solar cells) and photodiodes.
POLYMERS INCLUDING A METHYLENE BETA-KETOESTER AND PRODUCTS FORMED THEREFROM
The present invention provides methylene beta-ketoester monomers, methods for producing the same, and compositions and products formed therefrom. In the method for producing the methylene beta-ketoesters of the invention, a beta-ketoester is reacted with a source of formaldehyde in a modified Knoevenagel reaction optionally in the presence of an acidic or basic catalyst, and optionally in the presence of an acidic or non-acidic solvent, to form reaction complex. The reaction complex may be an oligomeric complex. The reaction complex is subjected to further processing, which may be vaporization by contact with an energy transfer means in order to isolate the beta-ketoester monomer. The present invention further compositions and products formed from methylene beta-ketoester monomers of the invention, including monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).
MULTIFUNCTIONAL MONOMERS, METHODS FOR MAKING MULTIFUNCTIONAL MONOMERS, POLYMERIZABLE COMPOSITIONS AND PRODUCTS FORMED THEREFORM
The present invention provides multifunctional monomers, including, but not limited to include multifunctional methylene malonate and methylene beta-ketoester monomers; methods for producing the same; and compositions and products formed therefrom. The multifunctional monomers of the invention may be produced by transesterification or by direct synthesis from monofunctional methylene malonate monomers or methylene beta-ketoester monomers. The present invention further compositions and products formed from methylene beta-ketoester monomers of the invention, including monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).
MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.
MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.
ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES
A three-dimensional (3D) organic framework is provided. The 3D organic framework includes a plurality of nodes, A; a plurality of linkers, B; and a plurality of interstitial void spaces, C. The 3D organic framework has a structure wherein each node of the plurality of nodes A is connected to at least another node of the plurality of nodes A through one of the plurality of linkers B; each of the plurality of interstitial void spaces C, can contain one or more molecules E; at least one of A, B, or E is an electron donor; and at least one of A, B, or E is an electron acceptor. An organic photovoltaic (OPV) or an organic photodetector (OPD) device including the 3D organic framework is also provided.
ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES
A three-dimensional (3D) organic framework is provided. The 3D organic framework includes a plurality of nodes, A; a plurality of linkers, B; and a plurality of interstitial void spaces, C. The 3D organic framework has a structure wherein each node of the plurality of nodes A is connected to at least another node of the plurality of nodes A through one of the plurality of linkers B; each of the plurality of interstitial void spaces C, can contain one or more molecules E; at least one of A, B, or E is an electron donor; and at least one of A, B, or E is an electron acceptor. An organic photovoltaic (OPV) or an organic photodetector (OPD) device including the 3D organic framework is also provided.