Patent classifications
C08F210/16
Polyolefin composition with improved resistance to ESCR
Polyolefin composition comprising high density polyethylene, polyolefin elastomer and polypropylene, wherein the polypropylene is selected from homopolymer PP or impact PP and wherein the amount of high density polyethylene is more than 40% by weight of the total amount of high density polyethylene, polyolefin elastomer and impact or homopolymer polypropylene and wherein the total amount of high density polyethylene, polyolefin elastomer and polypropylene is 100% by weight and wherein the high density polyethylene has a density in the range from 940 to 960 kg/m3.
Polyolefin composition with improved resistance to ESCR
Polyolefin composition comprising high density polyethylene, polyolefin elastomer and polypropylene, wherein the polypropylene is selected from homopolymer PP or impact PP and wherein the amount of high density polyethylene is more than 40% by weight of the total amount of high density polyethylene, polyolefin elastomer and impact or homopolymer polypropylene and wherein the total amount of high density polyethylene, polyolefin elastomer and polypropylene is 100% by weight and wherein the high density polyethylene has a density in the range from 940 to 960 kg/m3.
Metal complex comprising amidine and indole fused cyclopentadienyl ligands
A metal complex of the formula (1) InCyLMZp (1), wherein M is a group 4 metal, Z is an anionic ligand, p is number of 1 to 2, InCy is an indole fused cyclopentadienyl-type ligand of the formula (2) wherein R.sup.1 independently is a C1-C4-alkyl, m is a number of 0 to 4, R.sup.2 is a C1-C10-alkyl, C5-C10-cycloalkyl, or a C6-C10-aryl unsubstituted or substituted with C1-C10-alkyl or C1-C4-dialkyl amino, R.sup.3, R.sup.4 and R.sup.5 each is independently selected from hydrogen, C1-C4-alkyl, C6-C10-aryl unsubstituted or substituted with C1-C4-alkyl, halide, or both of C1-C4-alkyl and halide and, L is an amidinate ligand of the formula (3a) wherein the amidine-containing ligand (3a) is bonded to the metal M via the imine nitrogen atom N2, wherein R.sup.7 is independently selected from C1-C4-alkyl and halide and q is a number of 0 to 4, Sub.sub.4 is a cyclic or linear aliphatic or aromatic substituent. ##STR00001##
Metal complex comprising amidine and indole fused cyclopentadienyl ligands
A metal complex of the formula (1) InCyLMZp (1), wherein M is a group 4 metal, Z is an anionic ligand, p is number of 1 to 2, InCy is an indole fused cyclopentadienyl-type ligand of the formula (2) wherein R.sup.1 independently is a C1-C4-alkyl, m is a number of 0 to 4, R.sup.2 is a C1-C10-alkyl, C5-C10-cycloalkyl, or a C6-C10-aryl unsubstituted or substituted with C1-C10-alkyl or C1-C4-dialkyl amino, R.sup.3, R.sup.4 and R.sup.5 each is independently selected from hydrogen, C1-C4-alkyl, C6-C10-aryl unsubstituted or substituted with C1-C4-alkyl, halide, or both of C1-C4-alkyl and halide and, L is an amidinate ligand of the formula (3a) wherein the amidine-containing ligand (3a) is bonded to the metal M via the imine nitrogen atom N2, wherein R.sup.7 is independently selected from C1-C4-alkyl and halide and q is a number of 0 to 4, Sub.sub.4 is a cyclic or linear aliphatic or aromatic substituent. ##STR00001##
Metal complex comprising amidine and indole fused cyclopentadienyl ligands
A metal complex of the formula (1) InCyLMZp (1), wherein M is a group 4 metal, Z is an anionic ligand, p is number of 1 to 2, InCy is an indole fused cyclopentadienyl-type ligand of the formula (2) wherein R.sup.1 independently is a C1-C4-alkyl, m is a number of 0 to 4, R.sup.2 is a C1-C10-alkyl, C5-C10-cycloalkyl, or a C6-C10-aryl unsubstituted or substituted with C1-C10-alkyl or C1-C4-dialkyl amino, R.sup.3, R.sup.4 and R.sup.5 each is independently selected from hydrogen, C1-C4-alkyl, C6-C10-aryl unsubstituted or substituted with C1-C4-alkyl, halide, or both of C1-C4-alkyl and halide and, L is an amidinate ligand of the formula (3a) wherein the amidine-containing ligand (3a) is bonded to the metal M via the imine nitrogen atom N2, wherein R.sup.7 is independently selected from C1-C4-alkyl and halide and q is a number of 0 to 4, Sub.sub.4 is a cyclic or linear aliphatic or aromatic substituent. ##STR00001##
HETEROPHASIC PROPYLENE POLYMERIZATION MATERIAL AND OLEFIN POLYMER
Provided are a heterophasic propylene polymerization material and an olefin polymer having a small high-boiling-point component amount index (FOG). The heterophasic propylene polymerization material satisfies the following formula (3): (X2×Y2)/Z2≤7.0 (3) wherein X2 represents a cold xylene soluble component amount (mass %) of the heterophasic propylene polymerization material; Y2 represents a percentage (%) of a component having a molecular weight of 104.0 or less in terms of polystyrene and contained in a cold xylene soluble component of the heterophasic propylene polymerization material based on all components of the cold xylene soluble component of the heterophasic propylene polymerization material as measured by gel permeation chromatography; and Z2 represents a content (mass %) of a propylene-based copolymer contained in the heterophasic propylene polymerization material and containing a propylene-derived monomer unit and a monomer unit derived from at least one compound selected from the group consisting of ethylene and C4-12 α-olefins.
HETEROPHASIC PROPYLENE POLYMERIZATION MATERIAL AND OLEFIN POLYMER
Provided are a heterophasic propylene polymerization material and an olefin polymer having a small high-boiling-point component amount index (FOG). The heterophasic propylene polymerization material satisfies the following formula (3): (X2×Y2)/Z2≤7.0 (3) wherein X2 represents a cold xylene soluble component amount (mass %) of the heterophasic propylene polymerization material; Y2 represents a percentage (%) of a component having a molecular weight of 104.0 or less in terms of polystyrene and contained in a cold xylene soluble component of the heterophasic propylene polymerization material based on all components of the cold xylene soluble component of the heterophasic propylene polymerization material as measured by gel permeation chromatography; and Z2 represents a content (mass %) of a propylene-based copolymer contained in the heterophasic propylene polymerization material and containing a propylene-derived monomer unit and a monomer unit derived from at least one compound selected from the group consisting of ethylene and C4-12 α-olefins.
DUAL METALLOCENE BIMODAL HDPE RESINS WITH IMPROVED STRESS CRACK RESISTANCE
Ethylene-based polymers having a density from 0.94 to 0.96 g/cm.sup.3, a Mn from 5,000 to 14,000 g/mol, a ratio of Mw/Mn from 18 to 40, and at least one of a PENT value at 2.4 MPa of at least 11,500 hr and/or a W90 from 7.5 to 15 wt. % are disclosed. Additional ethylene polymers can have the same density, Mn, and Mw/Mn values, as well as a relaxation time from 0.5 to 3.5 sec, a CY-a parameter from 0.48 to 0.68, a HLMI from 5 to 11 g/10 min, a viscosity at HLMI from 3,000 to 7,500 Pa-sec, and a higher molecular weight component (HMW) and a lower molecular weight (LMW) component, in which a ratio of the number of SCBs at Mp of the HMW component to the number of SCBs at Mp of the LMW component is from 3.5 to 8.
DUAL METALLOCENE BIMODAL HDPE RESINS WITH IMPROVED STRESS CRACK RESISTANCE
Ethylene-based polymers having a density from 0.94 to 0.96 g/cm.sup.3, a Mn from 5,000 to 14,000 g/mol, a ratio of Mw/Mn from 18 to 40, and at least one of a PENT value at 2.4 MPa of at least 11,500 hr and/or a W90 from 7.5 to 15 wt. % are disclosed. Additional ethylene polymers can have the same density, Mn, and Mw/Mn values, as well as a relaxation time from 0.5 to 3.5 sec, a CY-a parameter from 0.48 to 0.68, a HLMI from 5 to 11 g/10 min, a viscosity at HLMI from 3,000 to 7,500 Pa-sec, and a higher molecular weight component (HMW) and a lower molecular weight (LMW) component, in which a ratio of the number of SCBs at Mp of the HMW component to the number of SCBs at Mp of the LMW component is from 3.5 to 8.
DUAL METALLOCENE BIMODAL HDPE RESINS WITH IMPROVED STRESS CRACK RESISTANCE
Ethylene-based polymers having a density from 0.94 to 0.96 g/cm.sup.3, a Mn from 5,000 to 14,000 g/mol, a ratio of Mw/Mn from 18 to 40, and at least one of a PENT value at 2.4 MPa of at least 11,500 hr and/or a W90 from 7.5 to 15 wt. % are disclosed. Additional ethylene polymers can have the same density, Mn, and Mw/Mn values, as well as a relaxation time from 0.5 to 3.5 sec, a CY-a parameter from 0.48 to 0.68, a HLMI from 5 to 11 g/10 min, a viscosity at HLMI from 3,000 to 7,500 Pa-sec, and a higher molecular weight component (HMW) and a lower molecular weight (LMW) component, in which a ratio of the number of SCBs at Mp of the HMW component to the number of SCBs at Mp of the LMW component is from 3.5 to 8.