A resist composition comprising a 2,5,8,9-teraaza-1-phosphabicyclo[3.3.3]undocane, biguanide or phosphazene salt of an iodinated aromatic group-containing carboxylic acid exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.

A negative resist composition comprising (A) a sulfonium compound of betaine type and (B) a polymer is provided. The resist composition is effective for controlling acid diffusion during the exposure step, exhibits a very high resolution during pattern formation, and forms a pattern with minimal LER.

A resist composition comprising a base polymer and a sulfonium or iodonium salt of iodinated phenoxy or iodinated phenylalkoxy-containing fluorinated sulfonic acid offers a high sensitivity and minimal LWR or improved CDU independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and a sulfonium salt of amino-containing carboxylic acid offers dimensional stability on PPD and a satisfactory resolution.

Provided are an acrylic elastomer superior in adhesiveness to a fluorine-based elastomer, an acrylic elastomer composition containing the same, its laminate, and its crosslinked product and a molded article therefrom. Iodine groups are introduced as crosslinking groups into an acrylic elastomer to an iodine content of 0.1 to 2 mass % with respect to the total mass of the elastomer. In addition, 1 to 7 parts by mass of an organic peroxide and 1 to 5 parts by mass of an onium salt were blended with 100 parts by mass of the acrylic elastomer, to give an acrylic elastomer composition. Further, an acrylic elastomer layer of the acrylic elastomer composition is laminated with a fluorine-based elastomer layer of a fluorine-based elastomer composition mainly containing of a fluorine-based elastomer having iodine groups as crosslinking groups, to give a laminate. The laminate is then crosslinked to give a crosslinked product and a molded article.

Provided are an acrylic elastomer superior in adhesiveness to a fluorine-based elastomer, an acrylic elastomer composition containing the same, its laminate, and its crosslinked product and a molded article therefrom. Iodine groups are introduced as crosslinking groups into an acrylic elastomer to an iodine content of 0.1 to 2 mass % with respect to the total mass of the elastomer. In addition, 1 to 7 parts by mass of an organic peroxide and 1 to 5 parts by mass of an onium salt were blended with 100 parts by mass of the acrylic elastomer, to give an acrylic elastomer composition. Further, an acrylic elastomer layer of the acrylic elastomer composition is laminated with a fluorine-based elastomer layer of a fluorine-based elastomer composition mainly containing of a fluorine-based elastomer having iodine groups as crosslinking groups, to give a laminate. The laminate is then crosslinked to give a crosslinked product and a molded article.

Provided is a resin which is excellent in terms of solubility in common solvents, crosslinking temperature, time required for crosslinking, solvent resistance (cracking resistance), breakdown voltage, leakage current, solvent wettability, and planarity in cases where the resin is formed into a thin film. A resin which comprises repeating units represented by formula (1) and formula (2), and wherein the repeating unit represented by formula (2) is contained in an amount of 20% by mole or more relative to the total amount of the repeating units represented by formula (1) and formula (2). ##STR00001##

Provided is a resin which is excellent in terms of solubility in common solvents, crosslinking temperature, time required for crosslinking, solvent resistance (cracking resistance), breakdown voltage, leakage current, solvent wettability, and planarity in cases where the resin is formed into a thin film. A resin which comprises repeating units represented by formula (1) and formula (2), and wherein the repeating unit represented by formula (2) is contained in an amount of 20% by mole or more relative to the total amount of the repeating units represented by formula (1) and formula (2). ##STR00001##

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) including a repeating unit (i) represented by a specified formula (1) and a repeating unit (ii) represented by a specified formula (2), and an ionic compound (Y) having an anionic moiety represented by a specified formula (3) in which a structure represented by SO.sub.2N.sup. in the anionic moiety has a pKa of 3.00 or more; an actinic ray-sensitive or radiation-sensitive film formed from the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method and a method for producing an electronic device that use the actinic ray-sensitive or radiation-sensitive resin composition.