C08F212/34

Polymer functional film and method for producing same

The present invention provides a polymer functional film obtained by polymerizing and curing a composition including (A) a styrene-based monomer represented by Formula (HSM); (B) a crosslinking agent represented by Formula (CL); and (C) a polymerization initiator represented by Formula (PI-1) or (PI-2), and a method for producing the same: ##STR00001## in which R.sup.1 represents a halogen atom or N.sup.+(R.sup.2)(R.sup.3)(R.sup.4)(X.sub.1.sup.?); n1 represents an integer from 1 to 10; here, R.sup.2 to R.sup.4 each independently represent a particular substituent; X.sub.1.sup.? represents an organic or inorganic anion; L.sup.1 represents an alkylene group or an alkenylene group; Ra, Rb, Rc and Rd each independently represent a particular substituent; n2 and n4 each independently represent an integer from 1 to 10; X.sub.2.sup.? and X.sub.3.sup.? each independently represent an organic or inorganic anion; and R.sup.5 to R.sup.10 each represent a hydrogen atom or a particular substituent.

Polymer functional film and method for producing same

The present invention provides a polymer functional film obtained by polymerizing and curing a composition including (A) a styrene-based monomer represented by Formula (HSM); (B) a crosslinking agent represented by Formula (CL); and (C) a polymerization initiator represented by Formula (PI-1) or (PI-2), and a method for producing the same: ##STR00001## in which R.sup.1 represents a halogen atom or N.sup.+(R.sup.2)(R.sup.3)(R.sup.4)(X.sub.1.sup.?); n1 represents an integer from 1 to 10; here, R.sup.2 to R.sup.4 each independently represent a particular substituent; X.sub.1.sup.? represents an organic or inorganic anion; L.sup.1 represents an alkylene group or an alkenylene group; Ra, Rb, Rc and Rd each independently represent a particular substituent; n2 and n4 each independently represent an integer from 1 to 10; X.sub.2.sup.? and X.sub.3.sup.? each independently represent an organic or inorganic anion; and R.sup.5 to R.sup.10 each represent a hydrogen atom or a particular substituent.

Thermosetting composition with photo-alignment property, alignment layer, substrate with alignment layer, retardation plate, and device

A thermosetting composition with a photo-alignment property includes a copolymer containing a photo-alignment constitutional unit represented by the following formula (1) and a thermal cross-linking constitutional unit represented by the following formula (2). Here, in the formula (1), X represents a photo-alignment group, L.sup.1 represents a divalent linking group or a single bond, R.sup.1 represents a hydrogen atom or a monovalent organic group, and k represents 1 to 5; in the formula (2), Y represents a thermal cross-linking group, L.sup.2 represents a divalent linking group or a single bond, R.sup.2 represents a hydrogen atom or a monovalent organic group, and 1 represents 1 to 5. ##STR00001##

Thermosetting composition with photo-alignment property, alignment layer, substrate with alignment layer, retardation plate, and device

A thermosetting composition with a photo-alignment property includes a copolymer containing a photo-alignment constitutional unit represented by the following formula (1) and a thermal cross-linking constitutional unit represented by the following formula (2). Here, in the formula (1), X represents a photo-alignment group, L.sup.1 represents a divalent linking group or a single bond, R.sup.1 represents a hydrogen atom or a monovalent organic group, and k represents 1 to 5; in the formula (2), Y represents a thermal cross-linking group, L.sup.2 represents a divalent linking group or a single bond, R.sup.2 represents a hydrogen atom or a monovalent organic group, and 1 represents 1 to 5. ##STR00001##

Thermosetting composition with photo-alignment property, alignment layer, substrate with alignment layer, retardation plate, and device

An embodiment of the present invention provides a thermosetting composition with a photo-alignment property, including a copolymer containing a photo-alignment constitutional unit represented by the following formula (1) and a thermal cross-linking constitutional unit. In the formula (1), X represents a photo-alignment group causing a photo-isomerization reaction or a photo-dimerization reaction, L.sup.1 represents a single bond, O, S, COO, COS, CO, OCO, OCO(CH.sub.2).sub.nCOO, OCOCH.sub.2CH.sub.2OCH.sub.2CH.sub.2COO, OCOC.sub.6H.sub.4O, OCOC.sub.6H.sub.10O, COO(CH.sub.2).sub.nO, COOC.sub.6H.sub.4O, COOC.sub.6H.sub.10O, O(CH.sub.2).sub.nO, OC.sub.6H.sub.4O, OC.sub.6H.sub.10O, or (CH.sub.2).sub.nO, n represents 1 to 4, R.sup.1 represents a hydrogen atom or a monovalent organic group, and k represents 1 to 5. ##STR00001##

Thermosetting composition with photo-alignment property, alignment layer, substrate with alignment layer, retardation plate, and device

An embodiment of the present invention provides a thermosetting composition with a photo-alignment property, including a copolymer containing a photo-alignment constitutional unit represented by the following formula (1) and a thermal cross-linking constitutional unit. In the formula (1), X represents a photo-alignment group causing a photo-isomerization reaction or a photo-dimerization reaction, L.sup.1 represents a single bond, O, S, COO, COS, CO, OCO, OCO(CH.sub.2).sub.nCOO, OCOCH.sub.2CH.sub.2OCH.sub.2CH.sub.2COO, OCOC.sub.6H.sub.4O, OCOC.sub.6H.sub.10O, COO(CH.sub.2).sub.nO, COOC.sub.6H.sub.4O, COOC.sub.6H.sub.10O, O(CH.sub.2).sub.nO, OC.sub.6H.sub.4O, OC.sub.6H.sub.10O, or (CH.sub.2).sub.nO, n represents 1 to 4, R.sup.1 represents a hydrogen atom or a monovalent organic group, and k represents 1 to 5. ##STR00001##

TIRES COMPRISING POLYINDANE RESINS AND USES THEREOF

The present invention is generally related to various types of compositions that comprise a polyindane resin. In particular, the polyindane resins may be utilized in various polymer-based and elastomer-based formulations in order to enhance several properties and characteristics of those formulations. More specifically, elastomeric compositions are provided that comprise at least one polyindane resin, which may be used to replace or enhance the functionality of existing hydrocarbon resins used in elastomeric formulations. The elastomeric compositions may be used to produce various tire components.

TIRES COMPRISING POLYINDANE RESINS AND USES THEREOF

The present invention is generally related to various types of compositions that comprise a polyindane resin. In particular, the polyindane resins may be utilized in various polymer-based and elastomer-based formulations in order to enhance several properties and characteristics of those formulations. More specifically, elastomeric compositions are provided that comprise at least one polyindane resin, which may be used to replace or enhance the functionality of existing hydrocarbon resins used in elastomeric formulations. The elastomeric compositions may be used to produce various tire components.

TIRES COMPRISING POLYINDANE RESINS AND USES THEREOF

The present invention is generally related to various types of compositions that comprise a polyindane resin. In particular, the polyindane resins may be utilized in various polymer-based and elastomer-based formulations in order to enhance several properties and characteristics of those formulations. More specifically, elastomeric compositions are provided that comprise at least one polyindane resin, which may be used to replace or enhance the functionality of existing hydrocarbon resins used in elastomeric formulations. The elastomeric compositions may be used to produce various tire components.

HIGH-CHI BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY
20180163003 · 2018-06-14 ·

The present invention is broadly concerned with novel directed self-assembly compositions, processes utilizing those compositions, and the resulting structures that are formed. The composition comprises a block copolymer of polystyrene and a polymethylmethacrylate block with polylactic acid side chains (PS-b-P(MMA-LA)). The block copolymer is capable of crosslinking and micro-phase separating into lines and spaces measuring about 10-nm or smaller with sub-20 nm L.sub.0 capability. Additionally, PS-b-P(MMA-LA) can be thermally annealed without a top-coat for simpler processing than the prior art. The polylactic acid side chains also increase the etch rate of the poly(methylmethacrylate) block when exposed to oxygen plasma, as well as lower the T.sub.g.