The invention provides: imidazole and imidazolium compounds of formulas (I) and (II):

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polymers containing a plurality of imidazolium-containing repeating units of formula (III′):

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and membranes and devices comprising the polymers. Also provided are methods of making the inventive compounds and polymers.

Described herein are cationic polymers having a plurality of quaternary amino groups, methods of making such polymers, and uses of such polymers as ion exchange membranes in electrochemical devices.

Described herein are cationic polymers having a plurality of quaternary amino groups, methods of making such polymers, and uses of such polymers as ion exchange membranes in electrochemical devices.

Described herein is a millable fluorinated block copolymer having (a) at least one A block, wherein the A block is a semi-crystalline segment comprising repeating divalent monomeric units derived from at least TFE, HFP and VDF; (b) at least one B block, wherein the B block is a segment comprising repeating dilvalent monomeric units derived from at least HFP and VDF; and (c) a bisolefin monomer, wherein at least (i) the semi-crystalline segment of the A block comprises repeating divalent monomeric units derived from TFE, HFP, VDF, and the bisolefin monomer, (ii) the segment of the B block comprises repeating divalent monomeric units derived from HFP, VDF, and the bisolefin monomer, or (iii) a combination thereof; and wherein the millable fluorinated block copolymer has a modulus of 0.1 to 2.5 MPa at 100° C.

Described herein is a millable fluorinated block copolymer having (a) at least one A block, wherein the A block is a semi-crystalline segment comprising repeating divalent monomeric units derived from at least TFE, HFP and VDF; (b) at least one B block, wherein the B block is a segment comprising repeating dilvalent monomeric units derived from at least HFP and VDF; and (c) a bisolefin monomer, wherein at least (i) the semi-crystalline segment of the A block comprises repeating divalent monomeric units derived from TFE, HFP, VDF, and the bisolefin monomer, (ii) the segment of the B block comprises repeating divalent monomeric units derived from HFP, VDF, and the bisolefin monomer, or (iii) a combination thereof; and wherein the millable fluorinated block copolymer has a modulus of 0.1 to 2.5 MPa at 100° C.

The invention pertains to UV-curable compositions comprising a iodine-containing (per)fluoroelastomer, and well-defined amount of certain combinations of given photoinitiators and crosslinking which are particularly effective in delivering through low temperature UV curing crosslinked parts possessing outstanding mechanical properties.

The invention pertains to UV-curable compositions comprising a iodine-containing (per)fluoroelastomer, and well-defined amount of certain combinations of given photoinitiators and crosslinking which are particularly effective in delivering through low temperature UV curing crosslinked parts possessing outstanding mechanical properties.

To provide a fluorinated copolymer excellent in low temperature properties and crosslinking property as a fluororubber, and a method for producing it.

A fluorinated copolymer which has units based on tetrafluoroethylene, units based on propylene and units based on a compound represented by the following formula 1, and which has either one or both of iodine atoms and bromine atoms:

CF.sub.2═CFO(R.sup.f1O).sub.nR.sup.f2  formula 1

wherein R.sup.f1 is a C.sub.1-3 perfluoroalkylene group, R.sup.f2 is a C.sub.1-6 perfluoroalkyl group, n is an integer of from 1 to 4, and in a case where n is from 2 to 4, a plurality of R.sup.f1 may be the same or different.

To provide a fluorinated copolymer excellent in low temperature properties and crosslinking property as a fluororubber, and a method for producing it.

A fluorinated copolymer which has units based on tetrafluoroethylene, units based on propylene and units based on a compound represented by the following formula 1, and which has either one or both of iodine atoms and bromine atoms:

CF.sub.2═CFO(R.sup.f1O).sub.nR.sup.f2  formula 1

wherein R.sup.f1 is a C.sub.1-3 perfluoroalkylene group, R.sup.f2 is a C.sub.1-6 perfluoroalkyl group, n is an integer of from 1 to 4, and in a case where n is from 2 to 4, a plurality of R.sup.f1 may be the same or different.

A photoresist polymer is synthesized from a repeating unit that comprises a first leaving group including an ester group, and a second leaving group capable of being removed together with the first leaving group.