Fluoroelastomer compositions comprising fluoroelastomers having copolymerized units of a nitrile-containing cure site monomer are cured with certain hydrazone or oxime curatives.

Provided are a polymer composition that can suppress bubbling during membrane formation and peeling of a laminated membrane and an ion-exchange membrane. The polymer composition is a polymer composition including: a fluorine-containing copolymer including a unit (a) derived from a perfluorovinyl compound having a side chain having an ionic group and a unit (b) derived from a fluoroolefin; and a low molecular weight compound (a) having a functional group represented by —COOX (X is H, NH.sub.4, or a monovalent metal ion), wherein a content of the low molecular weight compound (a) is 600 ppm or less based on a mass of the polymer composition.

Disclosed are copolymers formed by copolymerization of: (1) haloolefin monomers consisting essentially of: (a) hydrofluorolefin selected from the group consisting of hydrofluoroethylenes, hydrofluoropropenes, hydrofluorobutenes, hydrofluoropentenes and combinations of these, and (b) one or more chlorofluoroethylene monomers wherein the mole ratio of said hydrofluoroolefin monomer to said chlorofluoroethylene monomers monomer is from about 0.5:1 to about 1.5:1; and (2) alkyl vinyl ether monomer(s) and/or alkyl vinyl ester monomers consisting essentially of: (a) one or more lower alkyl vinyl ether monomers that are not substituted with a reactive group; and (b) one or more reactive group substituted lower alkyl vinyl ether monomer(s) and/or one or more reactive group substituted, lower alkyl vinyl ester monomer(s), wherein the mole ratio of (2)(a) monomers to said (2)(b) monomers is from about 2:1 to about 6:1.

A fluororesin including a vinylidene fluoride unit and a tetrafluoroethylene unit. The fluororesin has a gas chromatography-mass spectrometry total ion chromatogram including a peak which is assigned to a component having a molecular weight of 202 to 903 and which has a peak intensity of 1000 or lower. Also disclosed is a molded article formed from the fluororesin.

Method of forming pattern in photoresist layer includes forming photoresist layer over substrate, selectively exposing photoresist layer to actinic radiation forming latent pattern. Latent pattern is developed by applying developer to form pattern. Photoresist layer includes photoresist composition including polymer:

##STR00001##

A.sub.1, A.sub.2, L are direct bond, C4-C30 aromatic, C4-C30 alkyl, C4-C30 cycloalkyl, C4-C30 hydroxylalkyl, C4-C30 alkoxy, C4-C30 alkoxyl alkyl, C4-C30 acetyl, C4-C30 acetylalkyl, C4-C30 alkyl carboxyl, C4-C30 cycloalkyl carboxyl, C4-C30 hydrocarbon ring, C4-C30 heterocyclic, —COO—, A1 and A2 are not both direct bonds, and are unsubstituted or substituted with a halogen, carbonyl, or hydroxyl; A.sub.3 is C6-C14 aromatic, wherein A.sub.3 is unsubstituted or substituted with halogen, carbonyl, or hydroxyl; R.sub.1 is acid labile group; R.sub.a, R.sub.b are H or C1-C3 alkyl; R.sub.f is direct bond or C1-C5 fluorocarbon; PAG is photoacid generator; 0<x/(x+y+z)<1, 0<y/(x+y+z)<1, and 0<z/(x+y+z)<1.

Method of forming pattern in photoresist layer includes forming photoresist layer over substrate, selectively exposing photoresist layer to actinic radiation forming latent pattern. Latent pattern is developed by applying developer to form pattern. Photoresist layer includes photoresist composition including polymer:

##STR00001##

A.sub.1, A.sub.2, L are direct bond, C4-C30 aromatic, C4-C30 alkyl, C4-C30 cycloalkyl, C4-C30 hydroxylalkyl, C4-C30 alkoxy, C4-C30 alkoxyl alkyl, C4-C30 acetyl, C4-C30 acetylalkyl, C4-C30 alkyl carboxyl, C4-C30 cycloalkyl carboxyl, C4-C30 hydrocarbon ring, C4-C30 heterocyclic, —COO—, A1 and A2 are not both direct bonds, and are unsubstituted or substituted with a halogen, carbonyl, or hydroxyl; A.sub.3 is C6-C14 aromatic, wherein A.sub.3 is unsubstituted or substituted with halogen, carbonyl, or hydroxyl; R.sub.1 is acid labile group; R.sub.a, R.sub.b are H or C1-C3 alkyl; R.sub.f is direct bond or C1-C5 fluorocarbon; PAG is photoacid generator; 0<x/(x+y+z)<1, 0<y/(x+y+z)<1, and 0<z/(x+y+z)<1.

Provided are: a tellurium-containing compound represented by Formula (M1); a polymer of a tellurium-containing compound represented by any one of Formulae (M1) to (M3); and a method for producing a polymer. Each of X.sup.1 to X.sup.3, Y.sup.1 to Y.sup.3 and Z.sup.1 to Z.sup.3 independently denotes a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, or an organic group having from 1 to 20 carbon atoms; at least one of X.sup.1, Y.sup.1, or Z.sup.1 is a fluorine atom; at least one of X.sup.2, Y.sup.2, or Z.sup.2 is a chlorine atom, a perfluoroalkyl group, a monovalent hydrocarbon group having an oxyperfluoroalkylene structure, or a phenyl group; and each of R.sup.1 to R.sup.3 denotes an organic group having from 1 to 20 carbon atoms.

##STR00001##

Provided are a polymer composition that can suppress bubbling during membrane formation and peeling of a laminated membrane and an ion-exchange membrane. The polymer composition is a polymer composition including: a fluorine-containing copolymer including a unit (a) derived from a perfluorovinyl compound having a side chain having an ionic group and a unit (b) derived from a fluoroolefin; and a low molecular weight compound (a) having a functional group represented by —COOX (X is H, NH.sub.4, or a monovalent metal ion), wherein a content of the low molecular weight compound (a) is 600 ppm or less based on a mass of the polymer composition.

A modified polytetrafluoroethylene which can be formed under a low extrusion pressure and with which changes of the extrusion pressure are suppressed, even in paste extrusion at a high RR ratio, and its production method. The modified polytetrafluoroethylene having units based on tetrafluoroethylene, 0.020 to 0.040 mass % of units based on a monomer represented by the following formula (1), and 0.003 to 0.080 mass % of units based on a monomer represented by the following formula (2), each based on all units of the modified polytetrafluoroethylene. The monomers of formulae (1) and (2) are represented by: CH.sub.2═CH—C.sub.nF.sub.2n+1 (1), wherein n is from 2 to 6; and CF.sub.2═CFO(LO).sub.mRf (2), wherein L is a perfluoroalkylene group, Rf is a perfluoroalkyl group, and m is an integer of from 0 to 4.

To provide an electrolyte material having a low hydrogen gas permeability and excellent hot water resistance. An electrolyte material comprising a polymer having units represented by the following formula u1 and units based on chlorotrifluoroethylene at the specific proportion: ##STR00001##
wherein Q.sup.11 is a perfluoroalkylene group which may have an etheric oxygen atom, Q.sup.12 is a single bond or a perfluoroalkylene group which may have an etheric oxygen atom, Y.sup.1 is a fluorine atom or the like, s is 0 or 1, R.sup.f1 is a perfluoroalkyl group which may have an etheric oxygen atom, X.sup.1 is an oxygen atom or the like, a is 0 when X.sup.1 is an oxygen, and Z.sup.+ is H.sup.+ or the like.