Patent classifications
C08F216/36
Method for producing modified polymer, and rubber composition
Acido-basic properties of a system containing a polymer obtained by decomposing by oxidative cleavage of a carbon-carbon double bond, and a trifunctional molecule having an alkoxysilyl group in the structure as represented by the formula (A) are changed such that the system is changed into a basic system when the system is acidic and the system is changed into an acidic system when the system is basic to combine the decomposed polymer and the trifunctional molecule, thereby introducing the alkoxysilyl group into the main chain. Furthermore, acido-basic properties of a system containing a polymer obtained by decomposing by oxidative cleavage of a carbon-carbon double bond to decrease the molecular weight, and a functional molecule having an alkoxysilyl group as represented by the formula (a) are changed in the same manner as above to combine the decomposed polymer and the functional molecule, thereby introducing the alkoxysilyl group in a molecular terminal. ##STR00001##
Polar group-containing olefin copolymer
To provide a novel polar group-containing olefin copolymer in which an enone structure is introduced into the main chain as a structural unit. A polar group-containing olefin copolymer comprising a structural unit (A) derived from one or more monomers selected from the group consisting of ethylene and an olefin containing 3 to 20 carbon atoms, and a structural unit (B) represented by the following general formula (I): ##STR00001##
(R.sup.x and R.sup.y in the general formula (I) are as described in the Description.)
Polar group-containing olefin copolymer
To provide a novel polar group-containing olefin copolymer in which an enone structure is introduced into the main chain as a structural unit. A polar group-containing olefin copolymer comprising a structural unit (A) derived from one or more monomers selected from the group consisting of ethylene and an olefin containing 3 to 20 carbon atoms, and a structural unit (B) represented by the following general formula (I): ##STR00001##
(R.sup.x and R.sup.y in the general formula (I) are as described in the Description.)
RESIST MATERIAL AND PATTERN FORMING METHOD USING SAME
In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization, The material further includes a photo-acid generator as a polymerization initiator.
RESIST MATERIAL AND PATTERN FORMING METHOD USING SAME
In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization, The material further includes a photo-acid generator as a polymerization initiator.
Superacid functional compounds
The invention relates to a novel synthesis method for forming superacid functional molecules that include monomers, as well as new polymers and copolymers formed from the monomers, and uses for these superacid molecules, polymers, and copolymers. The superacid molecules have an alpha, alpha-difluorosulfonic acid functionality that can be obtained by a reaction between various Grignard reagents and an alkyl(2-fluorosulfonyl)-1,1-difluoroacetate, such as methyl (2-fluorosulfonyl-1,1-difluoroacetate. The molecules, polymers and copolymers would be expected to have enhanced ion conductivity, and would be useful in a variety of applications, including as ion-conductive materials, surfactants, and ion exchange resins.
Superacid functional compounds
The invention relates to a novel synthesis method for forming superacid functional molecules that include monomers, as well as new polymers and copolymers formed from the monomers, and uses for these superacid molecules, polymers, and copolymers. The superacid molecules have an alpha, alpha-difluorosulfonic acid functionality that can be obtained by a reaction between various Grignard reagents and an alkyl(2-fluorosulfonyl)-1,1-difluoroacetate, such as methyl (2-fluorosulfonyl-1,1-difluoroacetate. The molecules, polymers and copolymers would be expected to have enhanced ion conductivity, and would be useful in a variety of applications, including as ion-conductive materials, surfactants, and ion exchange resins.
Antichlor and preparation method as well as application thereof
The present disclosure directs to the technical field of epoxy resins, and particularly relates to an antichlor and a preparation method as well as an application thereof, for solving problems in existing chlorine removal methods that separation efficiency of an epoxy resin containing hydrolyzable chlorine is low, lots of energy needs to be consumed in the separation process, molecular distillation equipment is expensive and requirements on vacuum degree and material tightness are high. The antichlor is a polymer containing keto-carbonyl groups. The preparation method includes: adding a mixed solution of styrene and ketene into a reactor containing an organic solvent; adding an initiator, a coupling agent and an anti-gelling agent into the reactor under an atmosphere of shielding gas; controlling the styrene and ketene to perform a polymerization reaction under first preset reaction conditions; and removing the organic solvent after completion of the polymerization reaction, thereby obtaining the antichlor.
Antichlor and preparation method as well as application thereof
The present disclosure directs to the technical field of epoxy resins, and particularly relates to an antichlor and a preparation method as well as an application thereof, for solving problems in existing chlorine removal methods that separation efficiency of an epoxy resin containing hydrolyzable chlorine is low, lots of energy needs to be consumed in the separation process, molecular distillation equipment is expensive and requirements on vacuum degree and material tightness are high. The antichlor is a polymer containing keto-carbonyl groups. The preparation method includes: adding a mixed solution of styrene and ketene into a reactor containing an organic solvent; adding an initiator, a coupling agent and an anti-gelling agent into the reactor under an atmosphere of shielding gas; controlling the styrene and ketene to perform a polymerization reaction under first preset reaction conditions; and removing the organic solvent after completion of the polymerization reaction, thereby obtaining the antichlor.