Patent classifications
C08F226/02
CLEANING COMPOSITIONS COMPRISING COPOLYMERS AND THEIR USE
Cleaning compositions e.g. containing one or more copolymers comprising structural units a) derived from one or more monomers comprising a sulfonic acid group or a sulfonate group, and structural units b) derived from one or more monomers comprising a carboxylic acid group or a carboxylate group and structural units c) derived from one or more cationic monomers are disclosed.
The cleaning compositions are e.g. suited to be used for the treatment of hard surfaces, for easier next time cleaning of hard surfaces and for preventing the build-up of limescale on hard surfaces.
CLEANING COMPOSITIONS COMPRISING COPOLYMERS AND THEIR USE
Cleaning compositions e.g. containing one or more copolymers comprising structural units a) derived from one or more monomers comprising a sulfonic acid group or a sulfonate group, and structural units b) derived from one or more monomers comprising a carboxylic acid group or a carboxylate group and structural units c) derived from one or more cationic monomers are disclosed.
The cleaning compositions are e.g. suited to be used for the treatment of hard surfaces, for easier next time cleaning of hard surfaces and for preventing the build-up of limescale on hard surfaces.
REACTIVE ADHESIVE FILM WITH GOOD HEAT-AND-HUMIDITY RESISTANCE, IN PARTICULAR FOR BONDING POLYAMIDE
Reactive adhesive film for bonding various materials, including plastic to metal, the adhesive film comprising (a) a polymeric film-forming matrix, (b) at least one epoxide-functionalized (meth)acrylate or vinyl monomer and (c) a reagent selected from an initiator, in particular a free-radical initiator, or an activator. Further disclosed are reactive adhesive film systems comprising two reactive adhesive films. Methods for producing reactive adhesive films, and methods are also disclosed.
REACTIVE ADHESIVE FILM WITH GOOD HEAT-AND-HUMIDITY RESISTANCE, IN PARTICULAR FOR BONDING POLYAMIDE
Reactive adhesive film for bonding various materials, including plastic to metal, the adhesive film comprising (a) a polymeric film-forming matrix, (b) at least one epoxide-functionalized (meth)acrylate or vinyl monomer and (c) a reagent selected from an initiator, in particular a free-radical initiator, or an activator. Further disclosed are reactive adhesive film systems comprising two reactive adhesive films. Methods for producing reactive adhesive films, and methods are also disclosed.
Crosslinked membrane for anion exchange applications
Crosslinked membranes for anion exchange applications, and methods of making and using the same, are described.
Crosslinked membrane for anion exchange applications
Crosslinked membranes for anion exchange applications, and methods of making and using the same, are described.
SELF-HEALING OLIGOMERS AND THE USE THEREOF
Disclosed herein are self-healing oligomers according to the structure [UPy-(D.sub.m-U-D.sub.m)(.sub.2+q)]-[A(G)(.sub.n−1)-D.sub.m].sub.k-Z; wherein UPy, D, m, U, q, A, G, n, k, and Z are defined and described further herein, and wherein the oligomer possesses at least 3 urethane linking groups and comprises a backbone derived from a polyether polyol, a polyester polyol, a poly(dimethylsiloxane), a disulfide polyol, or combinations thereof. Also described and claimed are various compositions containing such oligomers as part of a self-healing component, wherein such compositions also include an optional reactive monomer and/or oligomer component and a photoinitiator component. Yet further described and claimed are articles cured from the compositions elsewhere described using the oligomers elsewhere described.
SELF-HEALING OLIGOMERS AND THE USE THEREOF
Disclosed herein are self-healing oligomers according to the structure [UPy-(D.sub.m-U-D.sub.m)(.sub.2+q)]-[A(G)(.sub.n−1)-D.sub.m].sub.k-Z; wherein UPy, D, m, U, q, A, G, n, k, and Z are defined and described further herein, and wherein the oligomer possesses at least 3 urethane linking groups and comprises a backbone derived from a polyether polyol, a polyester polyol, a poly(dimethylsiloxane), a disulfide polyol, or combinations thereof. Also described and claimed are various compositions containing such oligomers as part of a self-healing component, wherein such compositions also include an optional reactive monomer and/or oligomer component and a photoinitiator component. Yet further described and claimed are articles cured from the compositions elsewhere described using the oligomers elsewhere described.
HIGH Tg ACRYLATE COPOLYMERS WITH NITROGEN-CONTAINING AROMATIC HETEROCYCLIC GROUP
The invention relates to a process for the radical polymerization for preparing a copolymer, using specific monomers A, which have a glass transition temperature Tg of at least 0° and specific monomers B, which contain an aromatic heterocyclic group that contain at least one nitrogen atom in the ring. The invention also relates to copolymers that are obtained by the radical polymerization, to the use of same as accelerators in a curing reagent for adhesive compounds, and to adhesive strips containing same.
HIGH Tg ACRYLATE COPOLYMERS WITH NITROGEN-CONTAINING AROMATIC HETEROCYCLIC GROUP
The invention relates to a process for the radical polymerization for preparing a copolymer, using specific monomers A, which have a glass transition temperature Tg of at least 0° and specific monomers B, which contain an aromatic heterocyclic group that contain at least one nitrogen atom in the ring. The invention also relates to copolymers that are obtained by the radical polymerization, to the use of same as accelerators in a curing reagent for adhesive compounds, and to adhesive strips containing same.