Patent classifications
C08F228/06
Photoacid generators and lithographic resists comprising the same
The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.
Photoacid generators and lithographic resists comprising the same
The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.
TEMPERATURE-SENSITIVE FLUORESCENT PROBE FOR INTRODUCTION INTO CELL
There is provided a method for introducing a temperature-sensitive probe comprising a copolymer, which comprises a thermoresponsive unit and a fluorescent unit, into a cell, and the method using the copolymer further comprising a cationic unit as the temperature-sensitive probe, and the method comprising the step of mixing the copolymer with the cell in a solvent. The copolymer can be preferably used as a fluorescence temperature sensor which measures intracellular temperature since the copolymer has a cationic group and thus enters into a cell without using a special method.
TEMPERATURE-SENSITIVE FLUORESCENT PROBE FOR INTRODUCTION INTO CELL
There is provided a method for introducing a temperature-sensitive probe comprising a copolymer, which comprises a thermoresponsive unit and a fluorescent unit, into a cell, and the method using the copolymer further comprising a cationic unit as the temperature-sensitive probe, and the method comprising the step of mixing the copolymer with the cell in a solvent. The copolymer can be preferably used as a fluorescence temperature sensor which measures intracellular temperature since the copolymer has a cationic group and thus enters into a cell without using a special method.
CONDUCTING POLYMERS
There is described a process for forming a conformal film of conducting polymer onto one or more surfaces of a substrate by polymerising onto the one or more surfaces in a single step one or more conducting polymer precursors including one or more monomers in the presence of conductivity enhancing additives comprising one or more ionic liquids and one or more optional ionic dopants.
Temperature-sensitive fluorescent probe for introduction into cell
There is provided a method for introducing a temperature-sensitive probe comprising a copolymer, which comprises a thermoresponsive unit and a fluorescent unit, into a cell, and the method using the copolymer further comprising a cationic unit as the temperature-sensitive probe, and the method comprising the step of mixing the copolymer with the cell in a solvent. The copolymer can be preferably used as a fluorescence temperature sensor which measures intracellular temperature since the copolymer has a cationic group and thus enters into a cell without using a special method.
Emitter having a condensed ring system
The present invention relates to organic electroluminescent devices which comprise aromatic ring systems with two or three condensed rings as emitter materials, and to their possible uses.
Emitter having a condensed ring system
The present invention relates to organic electroluminescent devices which comprise aromatic ring systems with two or three condensed rings as emitter materials, and to their possible uses.
Photoacid-generating compound and associated polymer, photoresist composition, and method of forming a photoresist relief image
A photoacid-generating compound has the structure ##STR00001##
wherein m, n, R.sup.1, R.sup.2, X, Y, and Z.sup. are defined herein. The photoacid-generating compound exhibits strong absorption and chemical sensitivity to extreme ultraviolet radiation, while also absorbing longer wavelengths with desirably reduced chemical sensitivity. Also described are a polymer incorporating the residue of a polymerizable version of the photoacid-generating compound, a photoresist composition that includes the photoacid-generating compound, the polymer, or a combination thereof, and a method of forming a photoresist relief image using the photoresist composition.
Photoacid-generating compound and associated polymer, photoresist composition, and method of forming a photoresist relief image
A photoacid-generating compound has the structure ##STR00001##
wherein m, n, R.sup.1, R.sup.2, X, Y, and Z.sup. are defined herein. The photoacid-generating compound exhibits strong absorption and chemical sensitivity to extreme ultraviolet radiation, while also absorbing longer wavelengths with desirably reduced chemical sensitivity. Also described are a polymer incorporating the residue of a polymerizable version of the photoacid-generating compound, a photoresist composition that includes the photoacid-generating compound, the polymer, or a combination thereof, and a method of forming a photoresist relief image using the photoresist composition.