Patent classifications
C08F261/06
METHOD OF MANUFACTURING PATTERNED SUBSTRATE
Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.
UV-ABSORBING POLYMERS AND FORMULATIONS THEREOF
UV-absorbing polymers are provided that have at least one anhydride repeating unit that is covalently attached to at least one UV-absorbing moiety selected from the group consisting of functionalized dibenzoylmethanes, benzophenone sulfonamides, triphenyl triazines, and combinations thereof. Also provided are formulations comprising the UV-absorbing polymers.
UV-ABSORBING POLYMERS AND FORMULATIONS THEREOF
UV-absorbing polymers are provided that have at least one anhydride repeating unit that is covalently attached to at least one UV-absorbing moiety selected from the group consisting of functionalized dibenzoylmethanes, benzophenone sulfonamides, triphenyl triazines, and combinations thereof. Also provided are formulations comprising the UV-absorbing polymers.
UV-absorbing polymers and formulations thereof
UV-absorbing polymers are provided that have at least one anhydride repeating unit that is covalently attached to at least one UV-absorbing moiety selected from the group consisting of functionalized dibenzoylmethanes, benzophenone sulfonamides, triphenyl triazines, and combinations thereof. Also provided are formulations comprising the UV-absorbing polymers.
UV-absorbing polymers and formulations thereof
UV-absorbing polymers are provided that have at least one anhydride repeating unit that is covalently attached to at least one UV-absorbing moiety selected from the group consisting of functionalized dibenzoylmethanes, benzophenone sulfonamides, triphenyl triazines, and combinations thereof. Also provided are formulations comprising the UV-absorbing polymers.
Method for manufacturing fluoropolymer
A method for producing a fluoropolymer, which includes polymerizing a fluoromonomer in an aqueous medium in the presence of a polymer (1), the polymer (1) including a polymerized unit derived from a monomer CX.sub.2CY(CZ.sub.2ORf-A), wherein X is the same or different and is H or F; Y is H, F, an alkyl group, or a fluorine-containing alkyl group; Z is the same or different and is H, F, an alkyl group, or a fluoroalkyl group; Rf is a C1-C40 fluorine-containing alkylene group or a C2-C100 fluorine-containing alkylene group and having an ether bond; and A is COOM, SO.sub.3M, or OSO.sub.3M, wherein M is H, a metal atom, NR.sup.7.sub.4, imidazolium optionally having a substituent, pyridinium optionally having a substituent, or phosphonium optionally having a substituent, wherein R is H or an organic group, providing that at least one of X, Y, and Z contains a fluorine atom.
Method for manufacturing fluoropolymer
A method for producing a fluoropolymer, which includes polymerizing a fluoromonomer in an aqueous medium in the presence of a polymer (1), the polymer (1) including a polymerized unit derived from a monomer CX.sub.2CY(CZ.sub.2ORf-A), wherein X is the same or different and is H or F; Y is H, F, an alkyl group, or a fluorine-containing alkyl group; Z is the same or different and is H, F, an alkyl group, or a fluoroalkyl group; Rf is a C1-C40 fluorine-containing alkylene group or a C2-C100 fluorine-containing alkylene group and having an ether bond; and A is COOM, SO.sub.3M, or OSO.sub.3M, wherein M is H, a metal atom, NR.sup.7.sub.4, imidazolium optionally having a substituent, pyridinium optionally having a substituent, or phosphonium optionally having a substituent, wherein R is H or an organic group, providing that at least one of X, Y, and Z contains a fluorine atom.
Core/shell type polymer microparticles, dispersion of particles, and method for producing said microparticles
Provided are core/shell type polymeric particles including a shell and a core, in which the particles can be produced by a method using neither a surfactant nor a high-molecular-weight azo initiator, exhibit satisfactory dispersibility in aqueous medium, and are useful as, for instance, a dispersant, a metal-protecting stabilizer, or a metal adsorbent. A core/shell type polymeric particle including a shell including a hydrophilic vinyl ether polymer (a) and a core including a hydrophobic polymer (b).
Core/shell type polymer microparticles, dispersion of particles, and method for producing said microparticles
Provided are core/shell type polymeric particles including a shell and a core, in which the particles can be produced by a method using neither a surfactant nor a high-molecular-weight azo initiator, exhibit satisfactory dispersibility in aqueous medium, and are useful as, for instance, a dispersant, a metal-protecting stabilizer, or a metal adsorbent. A core/shell type polymeric particle including a shell including a hydrophilic vinyl ether polymer (a) and a core including a hydrophobic polymer (b).
Core/shell type polymer microparticles, dispersion of particles, and method for producing said microparticles
Provided are core/shell type polymeric particles including a shell and a core, in which the particles can be produced by a method using neither a surfactant nor a high-molecular-weight azo initiator, exhibit satisfactory dispersibility in aqueous medium, and are useful as, for instance, a dispersant, a metal-protecting stabilizer, or a metal adsorbent. A core/shell type polymeric particle including a shell including a hydrophilic vinyl ether polymer (a) and a core including a hydrophobic polymer (b).