Patent classifications
C
CHEMISTRY; METALLURGY
Load children
C08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
Load children
C08F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
Load children
263/00
Macromolecular compounds obtained by polymerising monomers on to polymers of esters of unsaturated alcohols with saturated acids as defined in group C08F18/00
Load children Filter patents View analytics View as hierarchy Open in page
C08F263/06
on to polymers of esters with polycarboxylic acids
Load children Filter patents View analytics View as hierarchy Open in page

C08F263/06

PHOTOCURABLE RESIN COMPOSITION, INK AND COATING MATERIAL
20190085111 · 2019-03-21 ·

The present invention aims to provide a photocurable resin composition capable of constituting a composition having high printability. The present invention relates to a photocurable resin composition containing (A) an allylic polymer produced by polymerization of an allylic compound represented by the following formula (I), and (B) a gelling agent,

##STR00001##

wherein R.sup.1 and R.sup.2 each represent H or CH.sub.3; X represents an a-valent group having an unsubstituted saturated or partially unsaturated four- to eight-membered cyclic structure; and a represents 2 or 3.

PHOTOCURABLE RESIN COMPOSITION, INK AND COATING MATERIAL
20190085111 · 2019-03-21 ·

The present invention aims to provide a photocurable resin composition capable of constituting a composition having high printability. The present invention relates to a photocurable resin composition containing (A) an allylic polymer produced by polymerization of an allylic compound represented by the following formula (I), and (B) a gelling agent,

##STR00001##

wherein R.sup.1 and R.sup.2 each represent H or CH.sub.3; X represents an a-valent group having an unsubstituted saturated or partially unsaturated four- to eight-membered cyclic structure; and a represents 2 or 3.