According to the present disclosure, a plurality of aluminum oxide nanoparticles and a polymerizable monomer are dissolved in a polyimide solution to obtain a polyimide mixed solution. Next, the polyimide mixed solution is coated onto a glass substrate. Then, the surface of the glass substrate is irradiated with UV light to form a network polymer on the surface of the glass substrate, the network polymer enclosing the aluminum oxide nanoparticles. Finally, the glass substrate is heated to form the flexible material having the surface protecting layer. Abrasion resistance of the flexible material manufactured according to the present disclosure is excellent.

According to the present disclosure, a plurality of aluminum oxide nanoparticles and a polymerizable monomer are dissolved in a polyimide solution to obtain a polyimide mixed solution. Next, the polyimide mixed solution is coated onto a glass substrate. Then, the surface of the glass substrate is irradiated with UV light to form a network polymer on the surface of the glass substrate, the network polymer enclosing the aluminum oxide nanoparticles. Finally, the glass substrate is heated to form the flexible material having the surface protecting layer. Abrasion resistance of the flexible material manufactured according to the present disclosure is excellent.

Disclosed herein is a method for effecting atom or group transfer polymerization comprising polymerizing one or more radically-polymerizable monomers in the presence of a system comprising an electrically active micro-organism, a transition metal catalyst, one or more radically-polymerizable monomers, and a radical initiator. Micro-organism respiratory electron flux is harnessed to control the performance of a metal-catalyzed polymerization. The bacterial electron transport pathways of the electroactive micro-organisms can be engineered to tune and adapt various function of the electroactive micro-organism and its role in polymerization. Polymerization may be accomplished under aerobic or anaerobic conditions. Freshly cultured micro-organisms or lyophilized micro-organisms may be used to direct polymerization.

Disclosed herein is a method for effecting atom or group transfer polymerization comprising polymerizing one or more radically-polymerizable monomers in the presence of a system comprising an electrically active micro-organism, a transition metal catalyst, one or more radically-polymerizable monomers, and a radical initiator. Micro-organism respiratory electron flux is harnessed to control the performance of a metal-catalyzed polymerization. The bacterial electron transport pathways of the electroactive micro-organisms can be engineered to tune and adapt various function of the electroactive micro-organism and its role in polymerization. Polymerization may be accomplished under aerobic or anaerobic conditions. Freshly cultured micro-organisms or lyophilized micro-organisms may be used to direct polymerization.

To provide an alkaline developable negative-type photosensitive resin composition from which a cured film that has a high-resolution and low-taper pattern shape and that are excellent in heat resistance and light blocking property can be obtained. A negative-type photosensitive resin composition is characterized by containing an (A1) first resin, a (A2) second resin, a (C) photopolymerization initiator, and a (D) coloring agent, wherein the (A1) first resin is an (A1-1) polyimide and/or an (A1-2) polybenzo-oxazole, and wherein the (A2) second resin is one or more species selected from a (A2-1) polyimide precursor, a (A2-2) polybenzo-oxazole precursor, a (A2-3) polysiloxane, a (A2-4) cardo based resin, and an (A2-5) acrylic resin, and wherein a content ratio of the (A1) first resin in a total of 100 mass % of the (A1) first resin and the (A2) second resin is within the range of 25 to 90 mass %.

To provide an alkaline developable negative-type photosensitive resin composition from which a cured film that has a high-resolution and low-taper pattern shape and that are excellent in heat resistance and light blocking property can be obtained. A negative-type photosensitive resin composition is characterized by containing an (A1) first resin, a (A2) second resin, a (C) photopolymerization initiator, and a (D) coloring agent, wherein the (A1) first resin is an (A1-1) polyimide and/or an (A1-2) polybenzo-oxazole, and wherein the (A2) second resin is one or more species selected from a (A2-1) polyimide precursor, a (A2-2) polybenzo-oxazole precursor, a (A2-3) polysiloxane, a (A2-4) cardo based resin, and an (A2-5) acrylic resin, and wherein a content ratio of the (A1) first resin in a total of 100 mass % of the (A1) first resin and the (A2) second resin is within the range of 25 to 90 mass %.

To provide an alkaline developable negative-type photosensitive resin composition from which a cured film that has a high-resolution and low-taper pattern shape and that are excellent in heat resistance and light blocking property can be obtained. A negative-type photosensitive resin composition is characterized by containing an (A1) first resin, a (A2) second resin, a (C) photopolymerization initiator, and a (D) coloring agent, wherein the (A1) first resin is an (A1-1) polyimide and/or an (A1-2) polybenzo-oxazole, and wherein the (A2) second resin is one or more species selected from a (A2-1) polyimide precursor, a (A2-2) polybenzo-oxazole precursor, a (A2-3) polysiloxane, a (A2-4) cardo based resin, and an (A2-5) acrylic resin, and wherein a content ratio of the (A1) first resin in a total of 100 mass % of the (A1) first resin and the (A2) second resin is within the range of 25 to 90 mass %.

To provide an alkaline developable negative-type photosensitive resin composition from which a cured film that has a high-resolution and low-taper pattern shape and that are excellent in heat resistance and light blocking property can be obtained. A negative-type photosensitive resin composition is characterized by containing an (A1) first resin, a (A2) second resin, a (C) photopolymerization initiator, and a (D) coloring agent, wherein the (A1) first resin is an (A1-1) polyimide and/or an (A1-2) polybenzo-oxazole, and wherein the (A2) second resin is one or more species selected from a (A2-1) polyimide precursor, a (A2-2) polybenzo-oxazole precursor, a (A2-3) polysiloxane, a (A2-4) cardo based resin, and an (A2-5) acrylic resin, and wherein a content ratio of the (A1) first resin in a total of 100 mass % of the (A1) first resin and the (A2) second resin is within the range of 25 to 90 mass %.

A photosensitive resin composition contains (i) modified partially-saponified polyvinyl acetate having a functional group introduced into a side chain thereof, (ii) tertiary nitrogen atom-containing polyamide, (iii) a photopolymerizable unsaturated compound and (iv) a photopolymerization initiator, characterized in that the above (ii) tertiary nitrogen atom-containing polyamide contains 20 to 50% by mol of a structural unit obtained from cyclohexane-dicarboxylic acid and 50 to 95% by mol of an alicyclic structural unit in total, in relation to a total of an amount of an aminocarboxylic acid unit (including a case wherein lactam is a raw material), an amount of a dicarboxylic acid unit and an amount of a diamine unit in the polyamide molecule. There is also provided a relief printing original plate which is characterized in having, on a support, a photosensitive resin layer formed by using this photosensitive resin composition.

A photosensitive resin composition contains (i) modified partially-saponified polyvinyl acetate having a functional group introduced into a side chain thereof, (ii) tertiary nitrogen atom-containing polyamide, (iii) a photopolymerizable unsaturated compound and (iv) a photopolymerization initiator, characterized in that the above (ii) tertiary nitrogen atom-containing polyamide contains 20 to 50% by mol of a structural unit obtained from cyclohexane-dicarboxylic acid and 50 to 95% by mol of an alicyclic structural unit in total, in relation to a total of an amount of an aminocarboxylic acid unit (including a case wherein lactam is a raw material), an amount of a dicarboxylic acid unit and an amount of a diamine unit in the polyamide molecule. There is also provided a relief printing original plate which is characterized in having, on a support, a photosensitive resin layer formed by using this photosensitive resin composition.