A wellbore cement composition that includes a cross-linked polyamide. The polyamide is formed by reacting a di-functional amine with an aromatic tri-functional carboxylic acid. The wellbore cement composition is created by blending cement and water with the polyamide and then allowed to cure. Increases in compressive strength, Young's Modulus, and Poisson's Ratio of the cement were realized by adding the polyamide to the cement composition.

A wellbore cement composition that includes a cross-linked polyamide. The polyamide is formed by reacting a di-functional amine with an aromatic tri-functional carboxylic acid. The wellbore cement composition is created by blending cement and water with the polyamide and then allowed to cure. Increases in compressive strength, Young's Modulus, and Poisson's Ratio of the cement were realized by adding the polyamide to the cement composition.

A wellbore cement composition that includes a cross-linked polyamide. The polyamide is formed by reacting a di-functional amine with an aromatic tri-functional carboxylic acid. The wellbore cement composition is created by blending cement and water with the polyamide and then allowed to cure. Increases in compressive strength, Young's Modulus, and Poisson's Ratio of the cement were realized by adding the polyamide to the cement composition.

A wellbore cement composition that includes a cross-linked polyamide. The polyamide is formed by reacting a di-functional amine with an aromatic tri-functional carboxylic acid. The wellbore cement composition is created by blending cement and water with the polyamide and then allowed to cure. Increases in compressive strength, Young's Modulus, and Poisson's Ratio of the cement were realized by adding the polyamide to the cement composition.

A process for preparing a TPU alloy material through in-situ compatibilization includes: 1) adding a premixed TPU raw material to a feeding port of a twin-screw extruder; injecting a mixture of an alloy component and a dual-active substance into the twin-screw extruder through a lateral feeding port; adding an auxiliary reagent to the TPU raw material or the mixture of the alloy component and the dual-active substance, wherein the alloy component is a polyolefin or a thermoplastic polymer material having reactivity, wherein the dual-active substance is a substance containing a group reactive with the TPU raw material and a group reactive with the alloy component, and the auxiliary reagent includes an initiator; 2) controlling a temperature of a reaction zone of the twin-screw extruder at 50 C. to 250 C., and granulating an extruded material by underwater cutting; and 3) drying the granulated product to obtain the TPU alloy material.

A radiation curable composition for preparing a polymeric membrane includes a) a membrane polymer selected from the group consisting of a polysulfone (PSU), a polyether sulfone (PES), a polyether etherketone (PEEK), a polyvinylchloride (PVC), a polyacrylonitrile (PAN), a polyvinylidene fluoride (PVDF), a polyimide (PI), a polyamide (PA) and copolymers thereof; b) a hydrophobic monomer or oligomer having at least two free radical polymerizable groups independently selected from the group consisting of an acrylate group, a methacrylate group, an acrylamide group, a methacrylamide group, a styrene group, a vinyl ether group, a vinyl ester group, a maleate group, a fumarate group, an itaconate group, and a maleimide group; and c) an organic solvent for the membrane polymer and the hydrophobic monomer. A polymeric membrane and a method for manufacturing the membrane are also disclosed.

A radiation curable composition for preparing a polymeric membrane includes a) a membrane polymer selected from the group consisting of a polysulfone (PSU), a polyether sulfone (PES), a polyether etherketone (PEEK), a polyvinylchloride (PVC), a polyacrylonitrile (PAN), a polyvinylidene fluoride (PVDF), a polyimide (PI), a polyamide (PA) and copolymers thereof; b) a hydrophobic monomer or oligomer having at least two free radical polymerizable groups independently selected from the group consisting of an acrylate group, a methacrylate group, an acrylamide group, a methacrylamide group, a styrene group, a vinyl ether group, a vinyl ester group, a maleate group, a fumarate group, an itaconate group, and a maleimide group; and c) an organic solvent for the membrane polymer and the hydrophobic monomer. A polymeric membrane and a method for manufacturing the membrane are also disclosed.

An antimicrobial polymer or hydrogel is provided. The antimicrobial polymer or hydrogel comprises a branched polyethylenimine (PEI) grafted with poly(ethylene glycol) methacrylate (PEGMA) of formula (I) or a branched polyethylenimine (PEI) grafted with poly(ethylene glycol) methacrylate (PEGMA) and decane of formula (II),

##STR00001##

wherein: m is an integer ranging from 1 to 20; n is an integer ranging from 1 to 20; in formula (I), the grafting ratio of PEI-PEGMA ranges from 1:1 to 1:20; and in formula (II), the grafting ratio of PEI-decane-PEGMA ranges from 1:1:1 to 1:20:20.

An antimicrobial polymer or hydrogel is provided. The antimicrobial polymer or hydrogel comprises a branched polyethylenimine (PEI) grafted with poly(ethylene glycol) methacrylate (PEGMA) of formula (I) or a branched polyethylenimine (PEI) grafted with poly(ethylene glycol) methacrylate (PEGMA) and decane of formula (II),

##STR00001##

wherein: m is an integer ranging from 1 to 20; n is an integer ranging from 1 to 20; in formula (I), the grafting ratio of PEI-PEGMA ranges from 1:1 to 1:20; and in formula (II), the grafting ratio of PEI-decane-PEGMA ranges from 1:1:1 to 1:20:20.

A photosensitive resin composition is also provided that includes a polymer precursor selected from a polyimide precursor and a polybenzoxazole precursor; a photo-radical polymerization initiator; and a solvent, in which an acid value of an acid group contained in the polymer precursor and having a neutralization point in a pH range of 7.0 to 12.0 is in a range of 2.5 to 34.0 mgKOH/g, and either the polymer precursor contains a radically polymerizable group or the photosensitive resin composition includes a radically polymerizable compound other than the polymer precursor.