C08F283/14

Surface modification method

Provided are methods for surface-modifying a thermoplastic resin which produce surfaces that show not only low adsorption of proteins and cells but also selective adsorption or adhesion of specific cells such as cancer cells, and further have excellent durability. A method for surface-modifying an object made of a thermoplastic resin, the method including: step 1 of forming polymerization initiation points on the surface of the object; and step 2 of radically polymerizing at least a hydrophilic monomer starting from the polymerization initiation points by irradiation with UV light having a wavelength of 300 to 400 nm to form a graft layer having a thickness of 2 to 100 nm on the surface of the object.

Surface modification method

Provided are methods for surface-modifying a thermoplastic resin which produce surfaces that show not only low adsorption of proteins and cells but also selective adsorption or adhesion of specific cells such as cancer cells, and further have excellent durability. A method for surface-modifying an object made of a thermoplastic resin, the method including: step 1 of forming polymerization initiation points on the surface of the object; and step 2 of radically polymerizing at least a hydrophilic monomer starting from the polymerization initiation points by irradiation with UV light having a wavelength of 300 to 400 nm to form a graft layer having a thickness of 2 to 100 nm on the surface of the object.

FILM COMPOSITION AND A FILM PREPARED THEREBY

The disclosure provides a film composition, wherein the film composition includes an oligomer and a crosslinking agent. The oligomer can have a structure represented by Formula (I)

##STR00001##

, wherein R.sup.1 and R.sup.2 are independently hydrogen, C.sub.1-20 alkyl group, C.sub.2-20 alkenyl group, C.sub.6-12 aryl group, C.sub.6-12 alkylaryl group, C.sub.5-12 cycloalkyl group, C.sub.6-20 cycloalkylalkyl group, alkoxycarbonyl group, or alkylcarbonyloxy group; R.sup.1 is not hydrogen when R.sup.2 is hydrogen; a is 0 or 1; 100n1; 100m1; and when n is not 0, the ratio of n to m is from 3:1 to 1:4. The weight ratio of the oligomer and the crosslinking agent can be from 9:1 to 3:7. The oligomer has a number average molecular weight (Mn) from 1,000 to 8,000.

FILM COMPOSITION AND A FILM PREPARED THEREBY

The disclosure provides a film composition, wherein the film composition includes an oligomer and a crosslinking agent. The oligomer can have a structure represented by Formula (I)

##STR00001##

, wherein R.sup.1 and R.sup.2 are independently hydrogen, C.sub.1-20 alkyl group, C.sub.2-20 alkenyl group, C.sub.6-12 aryl group, C.sub.6-12 alkylaryl group, C.sub.5-12 cycloalkyl group, C.sub.6-20 cycloalkylalkyl group, alkoxycarbonyl group, or alkylcarbonyloxy group; R.sup.1 is not hydrogen when R.sup.2 is hydrogen; a is 0 or 1; 100n1; 100m1; and when n is not 0, the ratio of n to m is from 3:1 to 1:4. The weight ratio of the oligomer and the crosslinking agent can be from 9:1 to 3:7. The oligomer has a number average molecular weight (Mn) from 1,000 to 8,000.

Method of production of semiconductor device

A method of production of a semiconductor device comprising a semiconductor layer forming step of forming a semiconductor layer including an inorganic oxide semiconductor on a board, a passivation film forming step of forming a passivation film comprising an organic material so as to cover the semiconductor layer, a baking step of baking the passivation film, and a cooling step of cooling the passivation film after baking, herein, in the cooling step, a cooling speed from a baking temperature at the time of baking in the baking step to a temperature 50 C. lower than the baking temperature is substantially controlled to 0.5 to 5 C./min in range is provided.

Method of production of semiconductor device

A method of production of a semiconductor device comprising a semiconductor layer forming step of forming a semiconductor layer including an inorganic oxide semiconductor on a board, a passivation film forming step of forming a passivation film comprising an organic material so as to cover the semiconductor layer, a baking step of baking the passivation film, and a cooling step of cooling the passivation film after baking, herein, in the cooling step, a cooling speed from a baking temperature at the time of baking in the baking step to a temperature 50 C. lower than the baking temperature is substantially controlled to 0.5 to 5 C./min in range is provided.

Graft copolymers based on polyolefin backbone and methacrylate side chains

A graft copolymer can include, in its backbone, at least one segment having repeating units obtainable by ring-opening metathesis polymerization (ROMP) of an optionally substituted cycloalkene, and at least one segment comprising repeating units obtainable by atom transfer radical polymerization (ATRP) of a (meth)acrylate. The corresponding graft copolymer is highly suitable for use as an oil additive in internal combustion engines, in particular, in combustion engines which are operated for longer periods of time at substantially constant operating temperatures.

Graft copolymers based on polyolefin backbone and methacrylate side chains

A graft copolymer can include, in its backbone, at least one segment having repeating units obtainable by ring-opening metathesis polymerization (ROMP) of an optionally substituted cycloalkene, and at least one segment comprising repeating units obtainable by atom transfer radical polymerization (ATRP) of a (meth)acrylate. The corresponding graft copolymer is highly suitable for use as an oil additive in internal combustion engines, in particular, in combustion engines which are operated for longer periods of time at substantially constant operating temperatures.

GRAFT COPOLYMERS BASED ON POLYOLEFIN BACKBONE AND METHACRYLATE SIDE CHAINS

A graft copolymer can include, in its backbone, at least one segment having repeating units obtainable by ring-opening metathesis polymerization (ROMP) of an optionally substituted cycloalkene, and at least one segment comprising repeating units obtainable by atom transfer radical polymerization (ATRP) of a (meth)acrylate. The corresponding graft copolymer is highly suitable for use as an oil additive in internal combustion engines, in particular, in combustion engines which are operated for longer periods of time at substantially constant operating temperatures.

GRAFT COPOLYMERS BASED ON POLYOLEFIN BACKBONE AND METHACRYLATE SIDE CHAINS

A graft copolymer can include, in its backbone, at least one segment having repeating units obtainable by ring-opening metathesis polymerization (ROMP) of an optionally substituted cycloalkene, and at least one segment comprising repeating units obtainable by atom transfer radical polymerization (ATRP) of a (meth)acrylate. The corresponding graft copolymer is highly suitable for use as an oil additive in internal combustion engines, in particular, in combustion engines which are operated for longer periods of time at substantially constant operating temperatures.