The present application relates to a method for preparing a patterned substrate. The method may be applied to a process of manufacturing devices such as, for example, electronic devices and integrated circuits, or other applications, such as manufacture of integrated optical systems, guidance and detection patterns of magnetic domain memories, flat panel displays, liquid crystal displays (LCDs), thin film magnetic heads or organic light emitting diodes, and the like, and may also be used to build a pattern on a surface used in manufacture of discrete track media, such as integrated circuits, bit-patterned media and/or magnetic storage devices such as hard drives.

A method of preparing PNVCL block polymers as the substrate for thermo-sensitive cultureware is provided. A hydrophobic polymer of poly n-butyl mathacrylate (PBMA) is obtained by atom transfer radical polymerization (ATRP) with typical haloalkane as an initiator. Further a thermo-sensitive block copolymer of poly n-vinyl caprolactam (PNVCL) is obtained by polymerization of N-vinyl caprolactam (NVCL) monomers using the hydrophobic PBMA polymer as a macroinitiator.

The present disclosure provides an article. In an embodiment, the article includes a substrate and a coating on the substrate. The coating includes a composition. The composition includes a plurality of nanoparticles, each nanoparticle having a ligand linked to a surface of each nanoparticle. The composition includes a plurality of block copolymers. Each block copolymer includes a linking block and a nonlinking block. The linking block is a random copolymer composed of at least two different monomers. At least one of the monomers is a linking comonomer. The linking comonomer is directly linked to the ligand to form a first microdomain consisting of the linking block, the nanoparticles, and the ligand. The composition further includes a second microdomain consisting of the nonlinking block.

A chloroprene-based block copolymer, a latex, a latex composition, and a rubber composition that can produce a product with excellent flexibility and tensile properties without the use of a vulcanizing agent or a vulcanizing accelerator. A chloroprene-based block copolymer, includes 5 to 30% by mass of a polymer block (A) and 70 to 95% by mass of a chloroprene-based polymer block (B), wherein: the polymer block (A) is derived from a monomer; when the monomer is polymerized alone, a polymer with a glass transition temperature of 80° C. or higher can be obtained; the chloroprene-based polymer block (B) includes a chloroprene monomer; and the chloroprene-based block copolymer has a toluene insoluble content of 20 to 100% by mass with respect to 100% by mass of the chloroprene-based block copolymer.

A block copolymer is provided that includes a first block having pendant phosphate and/or phosphonate groups and a second block that contains pendant poly(dialkylsiloxane) groups. Compositions containing the block copolymer as well as articles that include the block copolymer are also provided. The block copolymer can be used to provide a surface that is easy to clean and/or that is resistant to oil and grease without the use of fluorinated materials.

Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, and telechelic block polymers and methods of using such polymers in curable compositions to produce medical devices such as orthodontic appliances comprising the polymeric compositions comprising the telechelic block polymers.

Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, and telechelic block polymers and methods of using such polymers in curable compositions to produce medical devices such as orthodontic appliances comprising the polymeric compositions comprising the telechelic block polymers.

A method of forming persistent micelles is described. Particularly, methods disclosed herein include dissolving a block copolymer in a first solvent to form a dispersion containing unimers or dynamic micelles. Further, a method includes contacting the dispersion with a second solvent forming the persistent micelles. The persistent micelles formed by the method of the present disclosure can be used for controlled delivery of dispersions in organic electronic coatings, paint, or drug delivery applications and can also be used to control the pore size of films that include an oxide, a nitride, a carbide, a metal, or a carbon material.

Provided is a block copolymer composition which contains a block copolymer having a specific molecular structure and has a molecular weight distribution within an appropriate range. A polymerizable composition containing a macromonomer (A) which has a group having a radical-reactive unsaturated double bond at one terminal of a poly(meth)acrylate segment, a vinyl monomer (B), and an organic iodine compound (C), or a polymerizable composition containing a macromonomer (A), a vinyl monomer (B), an azo-based radical polymerization initiator (E), and iodine is polymerized to obtain a block copolymer composition containing a block copolymer in which constitutional units of all blocks are derived from vinyl monomers and at least one block has a branched structure.

A binder includes a copolymer including a building block (I) and a building block (II)

##STR00001##

The building block (I) is formed by copolymerizing a building block (i)

##STR00002##

and a building block (ii)

##STR00003##