C08F297/02

COMPOSITION FOR DEVELOPING AND METHOD OF FORMING PATTERN USING THE SAME

A developing composition and a method of forming a pattern using the same are provided. According to embodiments of inventive concepts, the developing composition may include at least one repeating unit selected from a first repeating unit represented by Chemical Formula A1 a second repeating unit represented by Chemical Formula A2, or both the first repeating unit represented by Chemical Formula A1 and second repeating unit represented by Chemical Formula A2. The developing composition may further include a copolymer including a third repeating unit represented by Chemical Formula A3.

COMPOSITION FOR DEVELOPING AND METHOD OF FORMING PATTERN USING THE SAME

A developing composition and a method of forming a pattern using the same are provided. According to embodiments of inventive concepts, the developing composition may include at least one repeating unit selected from a first repeating unit represented by Chemical Formula A1 a second repeating unit represented by Chemical Formula A2, or both the first repeating unit represented by Chemical Formula A1 and second repeating unit represented by Chemical Formula A2. The developing composition may further include a copolymer including a third repeating unit represented by Chemical Formula A3.

Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer

A resin composition for forming a phase-separated structure containing a block copolymer having a first block and a second block, in which the first block is formed of a constituent unit represented by Formula (b1), the second block is formed of a constituent unit represented by Formula (b2m) and a random copolymer having a constituent unit represented by Formula (b2g), and a ratio of a volume of the first block is 20% to 80% by volume. In the formulas, R.sup.1 is a hydrogen atom or an alkyl group, R.sup.b1 is a hydrogen atom or a methyl group, R.sup.2 is an alkyl group which may have a silicon atom, a fluorine atom, a carboxy group, an amino group, a hydroxy group, or a phosphoric acid group, R.sup.3 is a linear or branched alkylene group having 1 to 10 carbon atoms, which may have a hydroxy group, and R.sup.b2 is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms ##STR00001##

Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer

A resin composition for forming a phase-separated structure containing a block copolymer having a first block and a second block, in which the first block is formed of a constituent unit represented by Formula (b1), the second block is formed of a constituent unit represented by Formula (b2m) and a random copolymer having a constituent unit represented by Formula (b2g), and a ratio of a volume of the first block is 20% to 80% by volume. In the formulas, R.sup.1 is a hydrogen atom or an alkyl group, R.sup.b1 is a hydrogen atom or a methyl group, R.sup.2 is an alkyl group which may have a silicon atom, a fluorine atom, a carboxy group, an amino group, a hydroxy group, or a phosphoric acid group, R.sup.3 is a linear or branched alkylene group having 1 to 10 carbon atoms, which may have a hydroxy group, and R.sup.b2 is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms ##STR00001##

Pattern-forming method and patterned substrate

A pattern-forming method includes forming a prepattern and including a first polymer is formed on a silicon-containing film on a substrate. An underlayer film including a second polymer is formed in recessed portions of the prepattern. A composition for directed self-assembled film formation including a third polymer is applied on the underlayer film and the prepattern. The first polymer includes a first structural unit. The second polymer includes: a molecular chain including the first structural unit and a second structural unit that differs from the first structural unit; and an end structure that bonds to one end of the molecular chain and includes at least one selected from the group consisting of an amino group, a hydroxy group and a carboxy group. The third polymer is a block copolymer including a block of the first structural unit and a block of the second structural unit.

Block copolymer composition

A block copolymer composition is disclosed herein. In some embodiments, the block copolymer composition includes a diblock copolymer and a triblock copolymer each including a polyolefin-based block and a polystyrene-based block. The diblock copolymer is present at less than or equal to 19% , based on total weight of the block copolymer composition, the polyolefin-based block includes a repeating unit represented by Formula 1, and the polystyrene-based block includes one or more of Formulas 2 and 3: ##STR00001## wherein R.sub.1 is hydrogen, C3 to C20 alkyl, or C3 to C20 alkyl substituted with silyl, R.sub.2 and R.sub.3 are each independently C6 to C20 aryl, or C6 to C20 aryl substituted with halogen, C1 to C12 alkyl, or C3 to C12 cycloalkyl, n is an integer from 1 to 10,000, and l and m are each independently an integer from 10 to 1,000.

Block copolymer composition

A block copolymer composition is disclosed herein. In some embodiments, the block copolymer composition includes a diblock copolymer and a triblock copolymer each including a polyolefin-based block and a polystyrene-based block. The diblock copolymer is present at less than or equal to 19% , based on total weight of the block copolymer composition, the polyolefin-based block includes a repeating unit represented by Formula 1, and the polystyrene-based block includes one or more of Formulas 2 and 3: ##STR00001## wherein R.sub.1 is hydrogen, C3 to C20 alkyl, or C3 to C20 alkyl substituted with silyl, R.sub.2 and R.sub.3 are each independently C6 to C20 aryl, or C6 to C20 aryl substituted with halogen, C1 to C12 alkyl, or C3 to C12 cycloalkyl, n is an integer from 1 to 10,000, and l and m are each independently an integer from 10 to 1,000.

Block copolymer compositions, prepregs, and laminates made therefrom

A resin composition that allows production of laminated sheets excellent in heat resistance and processability is disclosed. The resin composition comprises: a) a block copolymer, where the block copolymer comprises at least one polymer block comprising polymerized acyclic conjugated diene units, such as butadiene units, and at least one polymer block containing units like a conjugated cyclic diene such as 1,3-cyclohexadiene or monomer units characterized by unit Tg above 100° C., b) a curing initiator, and c) optionally diene-based polymer selected from a polybutadiene polymer and the copolymer of butadiene with styrene or other styrenic monomers, c) optional additives comprising but not limited to a multi-functional co-curable additive, a diene based rubber, a halogenated or non halogenated flame retardant, an inorganic or organic filler or fiber, an antioxidant, a adhesion promotor, a film forming.

Modified polyvinyl acetate and preparation method and use thereof and oil-based drilling fluid

A method of preparing a modified polyvinyl acetate includes subjecting a mixed liquor L1 containing a functional monomer to a first reaction with a first vinyl acetate monomer, followed by adding a first initiator to carry out a second reaction to obtain a mixed liquor L2; subjecting an acrylate monomer, a second vinyl acetate monomer, a second initiator and the mixed liquor L2 to carry out a third reaction to obtain a mixed liquor L3; and subjecting a third initiator and the mixed liquor L3 to carry out a fourth reaction under the air-tight and ultrasonic conditions. The functional monomer is selected from acrylic acid, oleic acid or butenedioic acid. Uses of modified polyvinyl acetate obtained by the method and oil-based drilling fluid containing the modified polyvinyl acetate are also disclosed.

Laminating acrylic thermoplastic polymer compositions

The invention provides a laminating acrylic thermoplastic polymer composition which is favorably laminated together with a layer including a plasticizer-containing polymer composition while ensuring that the migration of the plasticizer into the acrylic thermoplastic polymer composition layer is small and the resultant laminate attains excellent durability, and also provides a laminate obtained by laminating a layer including the laminating acrylic thermoplastic polymer composition onto one or both sides of a layer including the plasticizer-containing polymer composition. Further, the invention provides a polymer composition which, when the plasticizer-containing polymer described above is a vinyl chloride-based polymer, can keep sufficient adhesive force after being adhered to a layer including such a vinyl chloride-based polymer, and also provides an adhesive product using the composition. The laminating acrylic thermoplastic polymer composition is a composition for lamination with a layer including a plasticizer-containing polymer composition. The acrylic thermoplastic polymer composition includes an acrylic block copolymer (I) including at least one polymer block (A) containing methacrylic acid ester units and at least one polymer block (B) containing acrylic acid ester units; and the acrylic acid ester units constituting the polymer block (B) in the acrylic block copolymer (I) include an acrylic acid ester (1) unit represented by the general formula CH.sub.2═CH—COOR.sup.1 (1) (wherein R.sup.1 is an organic group having 1 to 3 carbon atoms).