Patent classifications
C08F2438/02
Polymer, Coating Composition Comprising Same, and Organic Light Emitting Device Using Same
The present specification relates to a polymer including: a unit of the following Formula 1; and a unit of the following Formula 2, a coating composition including the same, and an organic light emitting device formed by using the same:
##STR00001## wherein L1 to L6, a1 to a3, Ar1 to Ar4, R1 to R11, r1 to r5, p, and q are described herein.
Hydrophobic block—random block copolymer emulsion polymer stabilizers
A copolymer includes a hydrophobic head segment and a random copolymer tail segment comprising hydrophobic blocks and ionizable blocks. Emulsion polymerization systems incorporate the copolymer as a surfactant.
WATER-SOLUBLE COPOLYMER COMPOSITION
The present invention relates to the field of water-soluble or water-dispersible copolymers comprising at least one random copolymer comprising styrene, methacrylic acid, acrylic acid and butyl acrylate.
POLYMERIC COMPOSITION FOR WATERCRAFTS, ITS USE AND WATERCRAFT COMPRISING IT
The present invention relates to a polymeric composition suitable for watercrafts or nautical applications. The present invention relates also the use of a transparent polymeric composition for watercrafts. More particularly the present invention relates to a transparent (meth)acrylic polymer composition and relates also to a process for preparing such a (meth)acrylic polymer composition, its use in watercrafts and watercraft comprising it.
AQUEOUS DISPERSION COMPRISING A MULTISTAGE POLYMER AND PROCESS OF MAKING THE SAME
An aqueous dispersion of multistage polymer particles comprising at least three polymers with low minimum film formation temperature and also providing aqueous coating compositions with balanced properties.
Aqueous dispersion of polymeric composite microspheres
The present invention relates to a composition comprising an aqueous dispersion of polymeric composite microspheres comprising an aqueous dispersion of polymeric composite microspheres that comprise a polysiloxane and a polymer, as defined herein, and a suspension polymerization process for making the composition. The composition is useful for making defect free coatings with a relatively low coefficient of friction.
DRAG REDUCING AGENT AND PROCESS OF MANUFACTURE THEREOF
A process of manufacturing a composition comprises a particulate drag reducing agent is disclosed. The process comprising: continuously forming a temporary container; introducing an unsaturated monomer component and a radical polymerization component into the temporary container; sealing the temporary container to form a sealed temporary container; allowing the unsaturated monomer component to polymerize in the sealed temporary container to form the drag reducing agent via a radical polymerization reaction, the drag reducing agent having a molecular weight of about 1 million gram/mol to about 50 million gram/mol; and grinding the drag reducing agent to form a composition comprising a particulate drag reducing agent, the particulate drag reducing agent having a particle size of about 1 to about 1,500 microns.
Modified Heterophasic Polyolefin Composition
A method of creating a modified heterophasic polyolefin composition is provided, whereby a polyolefin composition having at least two phases is melt mixed with a free radical generator, such as a peroxide, and a compatibilizing agent characterized by at least one nitrone group and at least one unsaturated bond capable of undergoing a radical addition reaction. Modified heterophasic polyolefin compositions with increased melt flow rates, impact strength, and clarity, which incorporate the compatibilizing agent, are also included within the scope of the invention.
REDUCING AGENT MONOMER FOR PREPARING STYRENE-ACRYLIC EMULSION BY OXIDATION-REDUCTION REACTION AT ROOM TEMPERATURE, AND SYNTHESIS METHOD THEREOF
A reducing agent monomer for preparing a styrene-acrylic emulsion by an oxidation-reduction reaction at room temperature and a synthesis method thereof are disclosed. Maleic anhydride (MAH) and dimethylethanolamine (DMEA) are used as raw materials to synthesize the reducing agent monomer: 4-(2-(dimethylamino)ethoxy)-4-oxobut-2-enoic acid, and the synthesis method involves inexpensive easily-available raw materials, simple synthesis conditions, and easy purification. With the synthesized reducing agent monomer as a reducing agent, potassium persulfate (KPS) as an oxidizing agent, water as a dispersion medium, sodium dodecyl sulfate (SDS) as an emulsifier, and styrene, butyl acrylate (BA), and methylmethacrylate (MMA) as comonomers, free-radical microemulsion polymerization is conducted at room temperature to obtain a styrene-acrylic emulsion. In the synthesis of the styrene-acrylic emulsion, a monomer conversion rate is high, and a styrene-acrylic emulsion with a high molecular weight and a branched structure can be obtained at room temperature.
Radiation-sensitive resin composition, production method thereof, and resist pattern-forming method
A radiation-sensitive resin composition contains: a polymer having a first structural unit represented by formula (1), and a second structural unit represented by formula (2) and having an acid-labile group. A first acid, to be generated from the first acid generating agent, disassociates the acid labile group in the polymer upon heating under a condition involving a temperature of no less than 80° C. and no greater than 140° C. for a time period of 1 minute, and the second acid, to be generated from the second acid generating agent, does not substantially disassociate the acid-labile group under the condition. The polymer is synthesized by RAFT, ATRP, or NMP, and a RAFT agent is at least one selected from the group consisting of a mercaptocarboxylic acid ester, a disulfide, a dithioester, a xanthate, a dithiocarbamate, and a trithiocarbonate. ##STR00001##