Disclosed herein are compositions and methods for reducing the antigenicity of molecules, wherein the molecule comprises a uricase. The antigenicity of a molecule may be reduced or eliminated by conjugating at least one branched polymer to the molecule to form a molecule-polymer conjugate. The branched polymer may include a backbone and a plurality of side chains, each side chain covalently attached to the backbone.

A method of polymerizing monomer to form polymer at the surface of particulate material, said method comprising: providing a dispersion of said particulate material in a continuous liquid phase, said dispersion comprising a RAFT agent as a stabilizer for said particulate material, and said continuous liquid phase comprising one or more ethylenically unsaturated monomers; and polymerizing said one or more ethylenically unsaturated monomers under the control of said RAFT agent to thereby form polymer at the surface of said particulate material.

The present invention is directed to methods of making an electrophoretic dispersion comprising pigment particles dispersed in a solvent or solvent mixture, wherein said pigment particles comprises at least one polymer chain comprising a terminal thiocarbonylthio group, attached to the particle surface. The invention also relates to pigment particles suitable for use in an electrophoretic dispersion and methods for their preparation through a RAFT polymerization technique.

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, and can be provided with a variety of required functions without constraint.

The present application relates to a monomer, a method for preparing a block copolymer, a block copolymer, and uses thereof. Each monomer of the present application exhibits an excellent self-assembling property and is capable of forming a block copolymer to which a variety of required functions are granted as necessary without constraint.

The invention relates to a novel polyphosphorus-based chain-end thiol-functionalized polymer, the polymer chain of which comprises units bearing at least one pendant phosphonate function and/or at least one pendant phosphonic function along the chain. This novel polymer is quite particularly suited to participating in a thiol-ene coupling reaction, which affords the possibility of grafting the polyphosphorus-based polymers onto diene polymers, for example.

The present invention relates to the field of copolymers which are water-soluble or water-dispersible at neutral pH or near-neutral pH, that is to say between 5.5 and 9.5, comprising at least one random copolymer comprising methacrylic acid, butyl acrylate, styrene and a monomer chosen from styrenesulfonic acid or salts thereof, vinylbenzoic acid or salts thereof, 2-acrylamido-2-methanesulfonic acid or salts thereof, N-vinylpyrrolidone, alone or in combination.

Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.