An object of the present invention is to provide a resin which can be used as an aqueous binder and has sufficient binding properties.

The present invention is a resin composition containing: (a) a resin comprising a polymer having a structure represented by any one of the following general formulae (1) to (3) and/or a copolymer having the structure; and

(b) a basic compound

##STR00001##

(in the above general formula (1), R.sup.1 represents a C.sub.4-C.sub.30 organic group having a valence of two to six, R.sup.2 represents a divalent C.sub.4-C.sub.30 organic group, X represents a sulfonic group, hydroxy group, or carboxy group, p represents an integer of 1 to 4, and n is within the range from 2 to 100,000);

##STR00002##

(in the above general formula (2), R.sup.3 represents a C.sub.4-C.sub.30 organic group having a valence of two to six, R.sup.4 represents a divalent C.sub.4-C.sub.30 organic group, Y represents a sulfonic group, hydroxy group, or carboxy group, q represents an integer of 1 to 4, and m is within the range from 2 to 100,000);

##STR00003##

(in the above general formula (3), R.sup.5 represents a C.sub.4-C.sub.30 organic group having a valence of two to six, R.sup.6 represents a divalent C.sub.4-C.sub.30 organic group, Z represents a sulfonic group, hydroxy group, or carboxy group, r represents an integer of 1 to 4, and l is within the range from 2 to 100,000).

Provided is a novolac resin having excellent developability, heat resistance, and dry etching resistance, and a resist film. A novolac resin includes a cyclic novolac resin (A) having a molecular structure represented by Structural Formula (1):

##STR00001##

(in the formula, is a structural moiety () represented by Structural Formula (2):

##STR00002##

n is an integer of 2 to 10),
in which at least one of X's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group, at least one of the structural moieties () present in the resin is a structural moiety (1) in which l is 1, and at least one thereof is a structural moiety (2) in which l is 2.

Provided is a novolac resin having excellent developability, heat resistance, and dry etching resistance, and a resist film. A novolac resin includes a cyclic novolac resin (A) having a molecular structure represented by Structural Formula (1):

##STR00001##

(in the formula, is a structural moiety () represented by Structural Formula (2):

##STR00002##

n is an integer of 2 to 10),
in which at least one of X's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group, at least one of the structural moieties () present in the resin is a structural moiety (1) in which l is 1, and at least one thereof is a structural moiety (2) in which l is 2.

Polyphenolic condensates and epoxidized products prepared from said condensates are prepared by a reaction utilizing multi catalysts to control the weight average molecular weight (Mw) and the number average molecular weight (Mn). Improved color and ultraviolet absorbance are possessed by the condensates described herein.

Polyphenolic condensates and epoxidized products prepared from said condensates are prepared by a reaction utilizing multi catalysts to control the weight average molecular weight (Mw) and the number average molecular weight (Mn). Improved color and ultraviolet absorbance are possessed by the condensates described herein.

Provided are a novolac resin having developability, heat resistance, and dry etching resistance, and a photosensitive composition, a curable composition, and a resist film. A novolac resin including, as a repeating unit, a structural moiety represented by Structural Formula (1) or (2):

##STR00001## (in the formula, Ar represents an arylene group, R.sup.1's each independently represent any one of a hydrogen atom, an alkyl group, an alkoxy group, and a halogen atom, m's each independently represent an integer of 1 to 3, and X is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group) in which at least one of X's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.

There is provided a new coating liquid for resist pattern coating. A coating liquid for resist pattern coating comprising a component A that is a polymer including at least one hydroxy group or carboxy group; a component B that is a sulfonic acid of A-SO.sub.3H (where A is a linear or branched alkyl group or fluorinated alkyl group having a carbon atom number of 1 to 16, an aromatic group having at least one of the alkyl group or the fluorinated alkyl group as a substituent, or a C.sub.4-16 alicyclic group optionally having a substituent); and a component C that is an organic solvent capable of dissolving the polymer and including ether or ketone compound of R.sup.1OR.sup.2 and/or R.sup.1C(O)R.sup.2 (where R.sup.1 is a linear, branched, or cyclic alkyl group or fluorinated alkyl group having a carbon atom number of 3 to 16; and R.sup.2 is a linear, branched, or cyclic alkyl group or fluorinated alkyl group having a carbon atom number of 1 to 16), a method of forming a resist pattern using the coating liquid, and a method for forming a reverse pattern using the coating liquid.

There is provided a new coating liquid for resist pattern coating. A coating liquid for resist pattern coating comprising a component A that is a polymer including at least one hydroxy group or carboxy group; a component B that is a sulfonic acid of A-SO.sub.3H (where A is a linear or branched alkyl group or fluorinated alkyl group having a carbon atom number of 1 to 16, an aromatic group having at least one of the alkyl group or the fluorinated alkyl group as a substituent, or a C.sub.4-16 alicyclic group optionally having a substituent); and a component C that is an organic solvent capable of dissolving the polymer and including ether or ketone compound of R.sup.1OR.sup.2 and/or R.sup.1C(O)R.sup.2 (where R.sup.1 is a linear, branched, or cyclic alkyl group or fluorinated alkyl group having a carbon atom number of 3 to 16; and R.sup.2 is a linear, branched, or cyclic alkyl group or fluorinated alkyl group having a carbon atom number of 1 to 16), a method of forming a resist pattern using the coating liquid, and a method for forming a reverse pattern using the coating liquid.

Provided are a resin containing phenolic hydroxyl groups having excellent developability, heat resistance, and substrate followability, a photosensitive composition, a curable composition, and a resist film which contain the resin containing phenolic hydroxyl group. The resin containing phenolic hydroxyl groups obtained by reacting a novolac resin intermediate obtained by reacting a triarylmethane compound (A) with an aldehyde compound (B) as essential components, with an alkene compound (C) having 9 to 24 carbon atoms, a photosensitive composition, a curable composition, and a resist film which contain the resin containing phenolic hydroxyl groups.

The present invention provides a radiation-sensitive composition containing (A) a resist base material, (B) an optically active diazonaphthoquinone compound, and (C) a solvent, wherein the content of a solid component in the composition is within the range of 1 to 80% by mass, the content of the solvent is within the range of 20 to 99% by mass, and the resist base material (A) is a compound represented by a specific formula.