This disclosure provides for synthetic routes of acrylic acid and other ?,?-unsaturated carboxylic acids and their salts, including catalytic methods. For example, there is provided a process for producing an ?,?-unsaturated carboxylic acid or its salt, comprising: (1) contacting in any order, a group 8-11 transition metal precursor, an olefin, carbon dioxide, a diluent, and a porous crosslinked polyphenoxide resin comprising associated metal cations to provide a mixture; and (2) applying reaction conditions to the mixture suitable to produce the ?,?-unsaturated carboxylic acid or a salt thereof. Methods of regenerating the polyphenoxide resin comprising associated metal cations are described.

This disclosure provides for synthetic routes of acrylic acid and other ?,?-unsaturated carboxylic acids and their salts, including catalytic methods. For example, there is provided a process for producing an ?,?-unsaturated carboxylic acid or its salt, comprising: (1) contacting in any order, a group 8-11 transition metal precursor, an olefin, carbon dioxide, a diluent, and a porous crosslinked polyphenoxide resin comprising associated metal cations to provide a mixture; and (2) applying reaction conditions to the mixture suitable to produce the ?,?-unsaturated carboxylic acid or a salt thereof. Methods of regenerating the polyphenoxide resin comprising associated metal cations are described.

Provided is a novolac resin having excellent developability, heat resistance, and dry etching resistance, and a resist film. A novolac resin includes a cyclic novolac resin (A) having a molecular structure represented by Structural Formula (1):

##STR00001##

(in the formula, is a structural moiety () represented by Structural Formula (2):

##STR00002##

n is an integer of 2 to 10),
in which at least one of X's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group, at least one of the structural moieties () present in the resin is a structural moiety (1) in which l is 1, and at least one thereof is a structural moiety (2) in which l is 2.

Provided are a novolac resin having developability, heat resistance, and dry etching resistance, and a photosensitive composition, a curable composition, and a resist film. A novolac resin including, as a repeating unit, a structural moiety represented by Structural Formula (1) or (2):

##STR00001## (in the formula, Ar represents an arylene group, R.sup.1's each independently represent any one of a hydrogen atom, an alkyl group, an alkoxy group, and a halogen atom, m's each independently represent an integer of 1 to 3, and X is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group) in which at least one of X's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.

Polymers including acidic monomers and ionic monomers connected to form a polymeric backbone are disclosed. The polymers may also include, e.g., acidic-ionic monomers within the polymeric backbone. Each acidic monomer may independently include at least one Bronsted-Lowry acid, and each ionic monomer may independently include at least one nitrogen-containing cationic group or phosphorous-containing cationic group. The acidic monomers and ionic monomers may make up, e.g., at least about 30% of the monomers of the polymer, based on the ratio of the number of acidic monomers and ionic monomers to the total number of monomers present in the polymer. The total number of ionic monomers may, e.g., exceed the total number of acidic monomers in the polymer. The polymer may be substantially insoluble in water.

Polymers including acidic monomers and ionic monomers connected to form a polymeric backbone are disclosed. The polymers may also include, e.g., acidic-ionic monomers within the polymeric backbone. Each acidic monomer may independently include at least one Bronsted-Lowry acid, and each ionic monomer may independently include at least one nitrogen-containing cationic group or phosphorous-containing cationic group. The acidic monomers and ionic monomers may make up, e.g., at least about 30% of the monomers of the polymer, based on the ratio of the number of acidic monomers and ionic monomers to the total number of monomers present in the polymer. The total number of ionic monomers may, e.g., exceed the total number of acidic monomers in the polymer. The polymer may be substantially insoluble in water.

Treated aldehyde-based resins containing one or more polyamines and methods for making and same. The treated aldehyde-based resin can be or include an aldehyde-based resin and a polyamine. The polyamine can be or include one or more aromatic polyamines, one or more poly(C.sub.2-C.sub.5 alkylene) polyamines, or a mixture thereof. The treated aldehyde-based resin can include about 0.05 wt % to about 10 wt % of the polyamine, based on a solids weight of the aldehyde-based resin.

Treated aldehyde-based resins containing one or more polyamines and methods for making and same. The treated aldehyde-based resin can be or include an aldehyde-based resin and a polyamine. The polyamine can be or include one or more aromatic polyamines, one or more poly(C.sub.2-C.sub.5 alkylene) polyamines, or a mixture thereof. The treated aldehyde-based resin can include about 0.05 wt % to about 10 wt % of the polyamine, based on a solids weight of the aldehyde-based resin.

A laminate comprising a thermoplastic film and a positive resist film is provided, the positive resist film comprising (A) a novolak resin-naphthoquinone diazide (NQD) base resin composition, (B) a polyester, and (C) 3-30 wt % of an organic solvent. The resist film may be transferred to a stepped support without forming voids.

A laminate comprising a thermoplastic film and a positive resist film is provided, the positive resist film comprising (A) a novolak resin-naphthoquinone diazide (NQD) base resin composition, (B) a polyester, and (C) 3-30 wt % of an organic solvent. The resist film may be transferred to a stepped support without forming voids.