Patent classifications
C08G8/28
ALKOXYLATED (HYDROXYALKYL)AMINOPHENOL POLYMERS AND METHODS OF USE
Disclosed herein are polymers formed by the condensation of bis(hydroxycarbyl)-aminophenolic compounds with aldehydes. The condensation polymers include one or more repeat units having bis(hydroxycarbyl)amino functionality. The hydroxyl groups of the bis(hydroxycarbyl)amino functionalities are available for further condensation with an epoxide, such as ethylene oxide, to yield a polyalkoxylated polymer. The polymers are useful as antipolymerants, polymerization retardants, surfactants, or a combination of these in one or more industrial systems.
Alkaline anion exchange membranes and methods of use thereof
An anion exchange membrane includes a porous structural framework and bismuth atoms bonded to pore surfaces of the porous structural framework. Each bismuth atom is bonded to a pore surface by way of one or two oxygen atoms.
Alkaline anion exchange membranes and methods of use thereof
An anion exchange membrane includes a porous structural framework and bismuth atoms bonded to pore surfaces of the porous structural framework. Each bismuth atom is bonded to a pore surface by way of one or two oxygen atoms.
(Hydroxyalkyl)aminophenol polymers and methods of use
Polymers are formed by the condensation of bis(hydroxycarbyl)-aminophenolic compounds with aldehydes. The condensation polymers include one or more repeat units having bis(hydroxycarbyl)amino functionality. The polymers are useful as antifoulants, antipolymerants, rheology modifiers, dehazers, polymerization retardants, surfactants, or a combination of these in one or more industrial process streams.
In situ exfoliation method to fabricate a graphene-reinforced polymer matrix composite
A method for forming a graphene-reinforced polymer matrix composite by distributing graphite microparticles into a molten thermoplastic polymer phase comprising one or more molten thermoplastic polymers; and applying a succession of shear strain events to the molten polymer phase so that the molten polymer phase exfoliates the graphene successively with each event, until tearing of exfoliated multilayer graphene sheets occurs and produces reactive edges on the multilayer sheets that react with and cross-link the one or more thermoplastic polymers; where the one or more thermoplastic polymers are selected from thermoplastic polymers subject to UV degradation.
In situ exfoliation method to fabricate a graphene-reinforced polymer matrix composite
A method for forming a graphene-reinforced polymer matrix composite by distributing graphite microparticles into a molten thermoplastic polymer phase comprising one or more molten thermoplastic polymers; and applying a succession of shear strain events to the molten polymer phase so that the molten polymer phase exfoliates the graphene successively with each event, until tearing of exfoliated multilayer graphene sheets occurs and produces reactive edges on the multilayer sheets that react with and cross-link the one or more thermoplastic polymers; where the one or more thermoplastic polymers are selected from thermoplastic polymers subject to UV degradation.
Phenol-based resin adhesive from lignin pyrolysis and its preparation method
The present invention relates to a phenol-based resin adhesive from lignin pyrolysis, comprising a polymer of phenol and formaldehyde from lignin pyrolysis, wherein the phenol from lignin pyrolysis comprises at least two phenols from lignin pyrolysis or at least two lignin-modified phenols from lignin pyrolysis. A repeat unit of the polymer of phenol and formaldehyde from lignin pyrolysis comprises at least two phenol units from lignin pyrolysis or at least two lignin-modified phenol units from lignin pyrolysis. According to the phenol-based resin adhesive from lignin pyrolysis in the present invention, by-products during the pyrolysis of lignin for power generation are used as raw materials, so it is environment-friendly and economical.
HIGH POROSITY AROMATIC RESINS AS PROMOTERS IN ACRYLATE PRODUCTION FROM COUPLING REACTIONS OF OLEFINS AND CARBON DIOXIDE
This disclosure provides for processes to form a porous crosslinked polyphenoxide resin, using a templating process which can increase the porosity, pore size, active sites, and the like of the resin, as compared with a non-templated crosslinked polyphenoxide resin. The process includes contacting a phenol or polyphenol compound with formaldehyde and an aqueous base in the presence of a basic particulate template to form a templated crosslinked polyphenol resin. The templated crosslinked polyphenol resin can then be contacted with an aqueous acid to remove the basic particulate template and form a porous crosslinked polyphenol resin. This porous crosslinked polyphenol resin can subsequently be contacted with a metal-containing base to form a promoter for acrylate and acrylic acid formation from CO.sub.2 and ethylene coupling.
HIGH POROSITY AROMATIC RESINS AS PROMOTERS IN ACRYLATE PRODUCTION FROM COUPLING REACTIONS OF OLEFINS AND CARBON DIOXIDE
This disclosure provides for processes to form a porous crosslinked polyphenoxide resin, using a templating process which can increase the porosity, pore size, active sites, and the like of the resin, as compared with a non-templated crosslinked polyphenoxide resin. The process includes contacting a phenol or polyphenol compound with formaldehyde and an aqueous base in the presence of a basic particulate template to form a templated crosslinked polyphenol resin. The templated crosslinked polyphenol resin can then be contacted with an aqueous acid to remove the basic particulate template and form a porous crosslinked polyphenol resin. This porous crosslinked polyphenol resin can subsequently be contacted with a metal-containing base to form a promoter for acrylate and acrylic acid formation from CO.sub.2 and ethylene coupling.
UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FILM, AND PATTERN FORMATION METHOD
An object of the present invention is to provide a resist underlayer film forming composition for lithography that has features of having excellent smoothing performance on an uneven substrate, good embedding performance into a fine hole pattern, and a smoothed wafer surface after film formation, and the like. The object can be achieved by an underlayer film forming composition for lithography containing a compound having a protecting group.