A resist underlayer film-forming composition has high solubility in a solvent used at a lithography process for exhibiting good coating film forming properties and able to decrease a sublime generated during formation of a film. A resist underlayer film-forming composition having a novolac resin having a structure group (C) obtained by a reaction of an aromatic ring structure of an aromatic ring-containing compound (A) with a vinyl group of an aromatic vinyl compound (B). The aromatic vinyl compound (B) is represented by Formula (1), and is specifically styrene, 2-vinylnaphthalene, 4-tert-butylstyrene, or 4-tert-butoxystyrene. ##STR00001##
The structure group (C) is represented by Formula (2). ##STR00002##
The aromatic ring-containing compound (A) is an aromatic amine compound or a phenolic hydroxy group-containing compound. The novolac resin is a resin produced by a reaction of the aromatic amine compound or the phenolic hydroxy group-containing compound with aldehyde or ketone.

A resist underlayer film-forming composition has high solubility in a solvent used at a lithography process for exhibiting good coating film forming properties and able to decrease a sublime generated during formation of a film. A resist underlayer film-forming composition having a novolac resin having a structure group (C) obtained by a reaction of an aromatic ring structure of an aromatic ring-containing compound (A) with a vinyl group of an aromatic vinyl compound (B). The aromatic vinyl compound (B) is represented by Formula (1), and is specifically styrene, 2-vinylnaphthalene, 4-tert-butylstyrene, or 4-tert-butoxystyrene. ##STR00001##
The structure group (C) is represented by Formula (2). ##STR00002##
The aromatic ring-containing compound (A) is an aromatic amine compound or a phenolic hydroxy group-containing compound. The novolac resin is a resin produced by a reaction of the aromatic amine compound or the phenolic hydroxy group-containing compound with aldehyde or ketone.

Disclosed are memory cells that include a mixture of an acrylic polyol, an alkylene urea-glyoxal resin, and an acid catalyst, and memory devices that contain a plurality of memory cells.

The present invention relates to a binder composition for making self-hardening foundry molds that is capable of improving the hardening speed of the molds and the strength of the molds, and is excellent in storage stability; and a method for producing a foundry mold, using this composition. The binder composition for making self-hardening foundry molds of the present invention is a binder composition for making self-hardening foundry molds, comprising a furan resin and an ion compound, wherein the ion compound contains at least one anion selected from the group consisting of a hydrogensulfite ion, a sulfite ion, a pyrosulfite ion, a thiosulfate ion, a thionate ion, and a dithionite ion; the content of the anion is from 0.006 to 0.60 parts by weight for 100 parts by weight of the furan resin; and the composition has a pH of 6 or less at 25 C.

The present invention relates to a binder composition for making self-hardening foundry molds that is capable of improving the hardening speed of the molds and the strength of the molds, and is excellent in storage stability; and a method for producing a foundry mold, using this composition. The binder composition for making self-hardening foundry molds of the present invention is a binder composition for making self-hardening foundry molds, comprising a furan resin and an ion compound, wherein the ion compound contains at least one anion selected from the group consisting of a hydrogensulfite ion, a sulfite ion, a pyrosulfite ion, a thiosulfate ion, a thionate ion, and a dithionite ion; the content of the anion is from 0.006 to 0.60 parts by weight for 100 parts by weight of the furan resin; and the composition has a pH of 6 or less at 25 C.

Giant p-(R)calixarenes, a process for the preparation of giant p-(R)calixarenes with high yields, and their use as the constitution of a material or in the context of the reinforcement of the material.

Disclosed herein are compositions and methods related to the hydroformylation of cyclododecatriene to form cyclododecatriene trialdehyde, and the conversion of the trialdehyde to the polyphenols of Formula 1: ##STR00001## where R, m p and Q are as defined herein. Curable compositions comprising compounds of Formula 1, including powder coating compositions, and methods of curing the compositions are also disclosed.

A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1:

##STR00001##

A resist underlayer film-forming composition has high solubility in a solvent used at a lithography process for exhibiting good coating film forming properties and able to decrease a sublime generated during formation of a film. A resist underlayer film-forming composition having a novolac resin having a structure group (C) obtained by a reaction of an aromatic ring structure of an aromatic ring-containing compound (A) with a vinyl group of an aromatic vinyl compound (B). The aromatic vinyl compound (B) is represented by Formula (1), and is specifically styrene, 2-vinylnaphthalene, 4-tert-butylstyrene, or 4-tert-butoxystyrene.

##STR00001##

The structure group (C) is represented by Formula (2).

##STR00002##

The aromatic ring-containing compound (A) is an aromatic amine compound or a phenolic hydroxy group-containing compound. The novolac resin is a resin produced by a reaction of the aromatic amine compound or the phenolic hydroxy group-containing compound with aldehyde or ketone.

Disclosed herein are compositions and methods related to the hydroformylation of cyclododecatriene to form cyclododecatriene trialdehyde, and the conversion of the trialdehyde to the polyphenols of Formula 1: ##STR00001##
where R, m p and Q are as defined herein. Curable compositions comprising compounds of Formula 1, including powder coating compositions, and methods of curing the compositions are also disclosed.