A polycarbonate resin composition which has excellent low-temperature impact resistance and flowability high enough to enable thin molding and provides a coated molded article having a good appearance and high impact resistance. The resin composition comprises 100 parts by weight of a resin component including a polycarbonate resin (component A) and a polycarbonate-polydiorganosiloxane copolymer resin (component B) and 0.5 to 2.5 parts by weight of a polyolefin resin (component C).

The present invention relates to a flame-retardant polycarbonate composition comprising the following components, relative to the total weight of the composition: A) 40-60 wt. % of at least one aromatic polycarbonate, B) 30-50 wt. % of at least one polysiloxane-polycarbonate condensate, C) 0.5-5 wt. % of at least one cyclic phosphazene, D) 1-5 wt. % of at least one silicone-acrylate rubber based impact modifier, E) 0.3-3 wt % of aluminium hydroxide oxide, F) 0.1-1 wt. % of at least one anti-dripping agent, and G) 0.1-1 wt. % of at least one UV absorber.

The present invention also relates to a shaped article produced from the composition. The polycarbonate composition according to the present invention has a good combination of low-temperature impact performance, flame-retardancy, hydrolytic stability, anti-UV performance, and heat resistance.

The present invention relates to a method for producing polyether carbonates containing alkoxysilyl groups in which (a) an unsaturated polyether carbonate polyol is reacted with (b) an alkoxysilane compound of formula (II) Si(X).sub.m(R1).sub.n(R2).sub.o (II), where X=H, Y—S—H and Y=C1-C22 alkylene, C6-C14 arylene, C7-C14 aralkylene, C7-C14 alkylarylene; R1=C1-C8 alkoxy, C7-C20-aralkoxy, C6-C14 aroxy, C7-C20 alkylaroxy; R2=C1-C22 alkyl, C6-C14 aryl, C7-C14 aralkyl, C7-C14 alkylaryl, and m and n represent, independently of one another, an integer ≧1, o is zero or an integer ≧1 and m+n+o=4. The invention further relates to the production of a polyurethane polymer using such a polyether carbonate, a cross-linked, siloxane group containing polymer and a molded part containing or consisting of said cross-linked polymer.

Provided is a method of producing a polycarbonate-polyorganosiloxane copolymer, including a step (a) of producing a polycarbonate oligomer with an alkaline aqueous solution of a dihydric phenol, phosgene, and an organic solvent, the method further including a step of setting a content of a polycarbonate-polyorganosiloxane copolymer in the organic solvent to be introduced into the step (a) to less than 850 ppm by mass.

Provided is a method of producing a polycarbonate-polyorganosiloxane copolymer, including: a first reaction zone into which a polycarbonate oligomer, a polyorganosiloxane, and a caustic alkali are introduced to provide a reaction liquid containing the polycarbonate oligomer that has reacted with the polyorganosiloxane; and a second reaction zone into which the reaction liquid obtained from the first reaction zone, an alkaline aqueous solution of a dihydric phenol, a specific end terminator, and the caustic alkali are introduced to provide a polycondensation reaction liquid, in which a total amount of the caustic alkali to be introduced into the second reaction zone is introduced from an introduction port of the second reaction zone to perform a reaction.

A polycarbonate-polyolefin block copolymer and a process to form a polycarbonate-polyolefin block copolymer by combining mono- or di-hydroxyaryl with vinyl/vinylidene terminated polyolefin to form a polyolefin hydroxyaryl moiety, and combining the polyolefin hydroxyaryl moiety with di-hydroxyaryl and di-substituted carbonyl monomers to form a polycarbonate-polyolefin block copolymer.

The present invention relates to a method for producing polyethercarbonate-polyoxymethylene block copolymers, comprising the step of polymerizing formaldehyde, wherein formaldehyde is polymerized in the presence of a polyethercarbonate having at least one Zerewitinoff-active H atom, obtaining an intermediate product. The obtained intermediate product can be further reacted with a cyclic carboxylic acid ester or carbonic acid ester, a cyclic anhydride, an epoxide, and/or an isocyanate, wherein a hydroxyl- or carboxy-functional or NCO-modified polyethercarbonate-polyoxymethylene block copolymer is obtained. The present invention further relates to polyethercarbonate-polyoxymethylene block copolymers that can be obtained by means of such a method and to the use of same to produce polyurethane polymers.

The present invention generally relates to the formation, chemistry and application of biologically active compositions. More particularly, the present invention relates to certain dyes, specifically porphyrin and chlorin derivatives, in combination with inventive polymers, i.e. light-cleavable polymers, that can be used as photosensitizer compositions for a wide range of light irradiation treatments such as photodynamic therapy of cancer, infections and other diseases. The dye derivatives may either be adsorbed on, or incorporated in, or attached to specific polymers, which as well form part of the invention.

The present disclosure provides a copolymer comprising monomer units represented by formulas (I) and/or (II) as disclosed and defined herein which are useful in antibacterial and/or antifouling coatings. The present disclosure further provides methods of synthesizing said copolymers.

A high-chi diblock copolymer (BCP) for self-assembly comprises a first block comprising repeat units of trimethylsilyl styrene (TMSS) and styrene, and a second block comprising an aliphatic carbonate repeat unit. The blocks are linked together by a fluorinated junction group L′ in which none of the fluorines of L′ are covalently bound to an atomic center of the polymer backbone. A top-coat free film layer comprising the BCP, which is disposed on an underlayer and in contact with an atmosphere, is capable of forming a perpendicularly oriented lamellar domain pattern on an underlayer that is preferential or non-preferential to the domains of the block copolymer. The domain pattern can be selectively etched to provide a relief pattern comprising a remaining domain. The relief pattern having good critical dimensional uniformity compared to an otherwise identical polymer lacking the silicon.