The present invention is a resin composition including (a) a resin, (b) an antioxidizing agent, and (d) a crosslinking agent, wherein the resin composition is characterized by the following: the resin (a) is formed of one or more kinds of resins selected from among polyimide precursor, polyamide, polyimide, polybenzoxazole, and copolymers thereof; and the crosslinking agent (d) includes a phenolic hydroxyl group in one molecule, and also includes a substituent group having a molecular weight of 40 or more at both ortho positions of the phenolic hydroxyl group. Provided is the resin composition by which obtained is a pattern-cured film that enables fine patterns to be obtained, that exhibits excellent in-plane pattern uniformity while being curable at a low temperature of 250° C. or less, and that retains high extensibility and high adhesion with metal wires even after a reliability evaluation which is an actual-use accelerated test.

The present invention is a resin composition including (a) a resin, (b) an antioxidizing agent, and (d) a crosslinking agent, wherein the resin composition is characterized by the following: the resin (a) is formed of one or more kinds of resins selected from among polyimide precursor, polyamide, polyimide, polybenzoxazole, and copolymers thereof; and the crosslinking agent (d) includes a phenolic hydroxyl group in one molecule, and also includes a substituent group having a molecular weight of 40 or more at both ortho positions of the phenolic hydroxyl group. Provided is the resin composition by which obtained is a pattern-cured film that enables fine patterns to be obtained, that exhibits excellent in-plane pattern uniformity while being curable at a low temperature of 250° C. or less, and that retains high extensibility and high adhesion with metal wires even after a reliability evaluation which is an actual-use accelerated test.

A cross-linkable composition along with processes for producing the same, uses for the same and articles made therefrom. The cross-linkable composition includes (A) at least one organic compound that is free of siloxane units having at least two reactive cyanate ester groups

(═“N≡C—O—”) and

(B) at least one cyclosiloxane having the general formula (I)

[R.sub.aR.sub.b.sup.1SiO.sub.2/2].sub.m   (I).

Where R may be identical or different and represents monovalent, SiC-bonded, saturated aliphatic hydrocarbon radicals; where R.sup.1 may be identical or different and represents monovalent, SiC-bonded, halogen- or phosphorus-substituted, aromatic hydrocarbon radicals; where a is 0, 1 or 2, preferably 0 or 1, particularly preferably 0; where b is 0, 1 or 2, preferably 1 or 2, particularly preferably 2; where m is 3, 4 or 5, preferably 3 or 4, particularly preferably 4; and where a+b is 2 and at least three radicals R.sup.1 are present per siloxane molecule (B).

Provided are phenazine copolymers and methods of making and using phenazine copolymers. The phenazine copolymers may be made from one or more phenazine precursors and one or more co-monomer precursors, one or more phenazine precursors and one or more cross-linking precursors, or one or more phenazine precursors and both one or more cross-linking precursors and one or more co-monomer precursors. The phenazine copolymers may be used in/on cathodes. The cathodes may be used in a variety of devices, such as, for example, batteries or supercapacitors.

The present invention provides fast fixturing two part adhesive compositions which include a first part containing a (meth)acrylic component and a cure system for an epoxy resin component of the second part and a second part containing an epoxy resin component and a cure accelerator for the (meth)acrylic component of the first part.

A polymer composition comprising a covalent triazine framework having the following structure:

##STR00001##

wherein: each asterisk (*) in A units denotes a point of covalent bonding with an asterisk in B units, and each asterisk (*) in B units denotes a point of covalent bonding with an asterisk in A units; r is an integer of 1-3; R is a fluorinated hydrocarbon containing at least two aromatic rings and at least one ether linkage between aromatic rings; the composition includes a multiplicity of A units and multiplicity of B units; and a portion of the connection points are terminated by endcapping nitrile groups. Also described are methods for producing the polymer and a microporous carbon material produced by pyrolysis of the porous polymer membrane. Also described are methods for using the polymer and microporous carbon material for gas or liquid separation, filtration, or purification.

A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses the resist underlayer film-forming composition. The resist underlayer film-forming composition comprises an organic solvent and the reaction product of (A) a hydantoin-containing compound that has two epoxy groups and (B) a hydantoin-containing compound different from (A). This reaction product is preferably the reaction product of a secondary amino group present in the hydantoin-containing compound (B) and the epoxy group present in the hydantoin-containing compound (A).

Techniques regarding polymers with antimicrobial functionality are provided. For example, one or more embodiments described herein can regard a polymer, which can comprise a repeating ionene unit. The repeating ionene unit can comprise a cation distributed along a degradable backbone. The degradable backbone can comprise a terephthalamide structure. Further, the repeating ionene unit can have antimicrobial functionality.

Method for the production of polyoxazolidinone compounds, comprising the reaction of at least one biscarbamate compound (A) with at least one bisepoxide compound (B) in the presence of at least one base (D), at least one Lewis acid catalyst (E), and optionally at least one compound (C), wherein the compound (C) comprising a mono-carbamate group, a mono-isocyanate group and/or a mono-epoxide group, and wherein the base (D) having a pKb-value of ≤9. The invention is also related to the resulting polyoxazolidinone compounds.

Method for the production of polyoxazolidinone compounds, comprising the reaction of at least one biscarbamate compound (A) with at least one bisepoxide compound (B) in the presence of at least one base (D), at least one Lewis acid catalyst (E), and optionally at least one compound (C), wherein the compound (C) comprising a mono-carbamate group, a mono-isocyanate group and/or a mono-epoxide group, and wherein the base (D) having a pKb-value of ≤9. The invention is also related to the resulting polyoxazolidinone compounds.