Patent classifications
C08G73/06
Microfluidic flow process for making monomers
The present invention relates to a microfluidic flow process for making monomers, monomers made by such processes, and methods of using such monomers. In such process, microfluidic reaction technology is used to synthesize cyanation reaction products orders of magnitude faster than is possible in batch and continuous syntheses. The aforementioned process does require strictly regulated, highly toxic cyanogen chloride. Thus the aforementioned process is more economically efficient and reduces the environmental impact of thermosetting resin monomer production, and produces thermosetting resin monomers in greater purity than obtained through typical processes.
Build materials for 3D printing
Polymerizable liquids are described herein which, in some embodiments, can produce 3D printed articles of high resolution and desirable mechanical properties. In one aspect, a polymerizable liquid comprises an acrylate component, a polymeric additive, and a monomeric curing agent, wherein the acrylate component and monomeric curing agent are copolymerizable upon exposure to light. In being copolymerizable, the acrylate component and monomeric curing agent can form a copolymer. As described father herein, the monomeric curing agent can enable further reaction of the copolymer with one or more crosslinking species to link the copolymer with one more polymeric networks.
BIOMASS BENZOXAZINE-BASED SHAPE MEMORY RESIN, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF
A biomass benzoxazine-based shape memory resin, a preparation method therefor, and an application thereof. The method includes: using biomass furfuryl amine, vanillic aldehyde, and paraformaldehyde as raw materials; obtaining an aldehyde group-containing biomass benzoxazine monomer by means of a heating reaction; mixing the aldehyde group-containing biomass benzoxazine monomer with polyether amine, and obtaining a Schiff base biomass benzoxazine monomer by means of a coupling reaction; and curing the Schiff base biomass benzoxazine monomer to obtain the biomass benzoxazine resin having a shape memory function. The benzoxazine-based shape memory resin has excellent thermal performance, high tensile modulus, high strength; an original shape can be permanently changed according to needs, the defect that traditional cross-linked polymers cannot be reprocessed after being formed is overcome, a recovery function under the condition of heating stimulation achieved, an application range of a shape memory polymer widened due to excellent thermal performance and mechanical performance.
Photomechanical Polymers, Compositions, and Methods
Photopolymers, monomers, compositions including photopolymers and a dopant, and methods, including methods for eliciting a photomechanical response. The dopant may be a triplet sensitizing dopant. The exposing of compositions to the one or more wavelengths of electromagnetic radiation may elicit a photomechanical response via a triplet excited state mechanism.
Manufacture of degradable polycyanurate bulk molding compositions
A process for the manufacture of a degradable polycyanurate bulk molding composition includes: contacting a liquid cyanate ester monomer with an additive material and a polymerization catalyst to form a reaction mixture; maintaining a temperature of the reaction mixture at about 80° C. to about 100° C. to form a polycyanurate product having a viscosity of about 120 to about 200 centipoise at 23° C.; heating a reinforcing filler at a temperature of about 50 to about 150° C. to form a pre-heated reinforcing filler; and blending the polycyanurate product with the pre-heated reinforcing filler to form the degradable polycyanurate bulk molding composition. The bulk molding composition can be used to form a degradable polycyanurate article.
Mechanochemical Based Synthesis of Perfluoropyridine Monomers for Polymerization
The present invention relates to a mechanochemical based synthesis of perfluoropyridine monomers, polymers made using such monomers and methods of making and using articles comprising such polymers. Such perfluoropyridine monomers are easily chemically tuned have the strength needed for high temperature applications and the flexibility needed for low temperature applications. In addition, to the aforementioned monomers, a mechanochemical based synthesis for such perfluoropyridine monomers is provided. All of the aforementioned performance application advantages are also found in polymers comprising Applicants' perfluoropyridine monomers.
Reversible aminal gel compositions, methods, and use
A well treatment composition for use in a hydrocarbon-bearing reservoir comprising a reversible aminal gel composition. The reversible aminal gel composition includes a liquid precursor composition. The liquid precursor composition is operable to remain in a liquid state at about room temperature. The liquid precursor composition comprises an organic amine composition; an aldehyde composition; and a polar aprotic organic solvent. The liquid precursor composition transitions from the liquid state to a gel state responsive to an increase in temperature in the hydrocarbon-bearing reservoir. The gel state is stable in the hydrocarbon-bearing reservoir at a temperature similar to a temperature of the hydrocarbon-bearing reservoir, and the gel state is operable to return to the liquid state responsive to a change in the hydrocarbon-bearing reservoir selected from the group consisting of: a decrease in pH in the hydrocarbon-bearing reservoir and an addition of excess metal salt composition in the hydrocarbon-bearing reservoir.
Composition of Phthalonitrile Resin Matrix for Polymer Composite Materials, Method for Fabrication Thereof, Method for Manufacturing of Polymer Composite Material, and Material Obtained by this Method
This invention is related to a resin matrix composition intended for production of a polymer composite material (PCM) or prepregs for PCM, to variants of methods for producing resin matrix compositions, to a method for curing the resin matrix composition, to a polymer composite material and method for its fabrication. The resin matrix composition includes: (1) polymerizable mixture containing one or more bis-phthalonitrile monomers with the general formula:
##STR00001## where X, Y, Z are each independently selected from the group consisting of H, F, Cl, Br and CH.sub.3, taken in the amount of 20-94 wt % of the polymerizable mixture weight; one or more reactive plasticizers-antipyrenes with the general formula:
##STR00002## where
##STR00003##
group can be in the meta- or para-position relative the oxygen atom bonded to the benzene ring, and R is selected from an aryl, oxyaryl, alkyl, or oxyalkyl group, or plasticizers-antipyrenes with the general formula:
##STR00004## where R is selected from an aryl, oxyaryl, alkyl, or oxyalkyl group, taken in the amount of 5-80 wt % of the total polymerizable mixture weight; one or more active diluents with the general formula:
##STR00005## where R can be in meta- or para-position relative to the oxygen bonded to the benzene ring, and stands for H, CN, NH.sub.2 or N(C.sub.3H.sub.3).sub.2, in the amount from 1 to 50% of the total polymerizable mixture weight. The resin matrix composition also includes (2) curing agent in the amount from 1 to 20% of the total polymerizable mixture weight selected from aromatic diamines or bisphenols that have boiling points of at least 180° C. under vacuum of 0.1 mm Hg. The total content of the polymerizable mixture and the curing agent is from 60 to 100 wt % of the total resin matrix weight. The invention allows to increase the thermal stability of the resin matrix and obtain composite material which after curing possesses increased thermal stability at temperatures up to 450° C., have melting points or glass transition temperatures of no more than 50° C., provide melt viscosities below 800 mPa.Math.s at temperatures from 100 to 180° C. and below 300 mPa.Math.s at temperatures from 120 to 180° C.
Composition of Phthalonitrile Resin Matrix for Polymer Composite Materials, Method for Fabrication Thereof, Method for Manufacturing of Polymer Composite Material, and Material Obtained by this Method
This invention is related to a resin matrix composition intended for production of a polymer composite material (PCM) or prepregs for PCM, to variants of methods for producing resin matrix compositions, to a method for curing the resin matrix composition, to a polymer composite material and method for its fabrication. The resin matrix composition includes: (1) polymerizable mixture containing one or more bis-phthalonitrile monomers with the general formula:
##STR00001## where X, Y, Z are each independently selected from the group consisting of H, F, Cl, Br and CH.sub.3, taken in the amount of 20-94 wt % of the polymerizable mixture weight; one or more reactive plasticizers-antipyrenes with the general formula:
##STR00002## where
##STR00003##
group can be in the meta- or para-position relative the oxygen atom bonded to the benzene ring, and R is selected from an aryl, oxyaryl, alkyl, or oxyalkyl group, or plasticizers-antipyrenes with the general formula:
##STR00004## where R is selected from an aryl, oxyaryl, alkyl, or oxyalkyl group, taken in the amount of 5-80 wt % of the total polymerizable mixture weight; one or more active diluents with the general formula:
##STR00005## where R can be in meta- or para-position relative to the oxygen bonded to the benzene ring, and stands for H, CN, NH.sub.2 or N(C.sub.3H.sub.3).sub.2, in the amount from 1 to 50% of the total polymerizable mixture weight. The resin matrix composition also includes (2) curing agent in the amount from 1 to 20% of the total polymerizable mixture weight selected from aromatic diamines or bisphenols that have boiling points of at least 180° C. under vacuum of 0.1 mm Hg. The total content of the polymerizable mixture and the curing agent is from 60 to 100 wt % of the total resin matrix weight. The invention allows to increase the thermal stability of the resin matrix and obtain composite material which after curing possesses increased thermal stability at temperatures up to 450° C., have melting points or glass transition temperatures of no more than 50° C., provide melt viscosities below 800 mPa.Math.s at temperatures from 100 to 180° C. and below 300 mPa.Math.s at temperatures from 120 to 180° C.
Composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, patterning process, and polymer
The invention provides a composition for forming an organic film, which generates no by-product even under such a film formation condition in an inert gas to prevent substrate corrosion, which is capable of forming an organic film not only excellent in properties of filling and planarizing a pattern formed on a substrate but also favorable for dry etching resistance during substrate processing, and further which causes no fluctuation in film thickness of the film due to thermal decomposition even when a CVD hard mask is formed on the organic film. The composition for forming an organic film includes (A) a polymer having a repeating unit shown by the following general formula (1) and (B) an organic solvent. ##STR00001##