A polysulfone has sulfone units that are separated by alkylene units in a polymer chain or a copolymer chain where the alkylene units have at least four carbons between sulfone units. The alkylene units can include an ethenylene unit separated from the sulfone units by at least one methylene units. The polysulfones can be crosslinked for enhanced thermal stability. Membranes can be formed from the polysulfones.

The present invention relates to a powdered material (M) containing at least one poly(arylene sulfide) (PAS) polymer, comprising recurring units p, q and r according of formula (I) wherein n.sub.p, n.sub.q and n.sub.r are respectively the mole % of each recurring units p, q and r; recurring units p, q and r are arranged in blocks, in alternation or randomly; 2≤(n.sub.q+n.sub.r)/(n.sub.p+n.sub.q+n.sub.r)≤9; nq is ≥0% and nr is ≥0%; j is zero or an integer varying between 1 and 4; R.sup.1 is selected from the group consisting of halogen atoms, C.sub.1-C.sub.12 alkyl groups, C.sub.7-C.sub.24 alkylaryl groups, C.sub.7-C.sub.24 aralkyl groups, C.sub.6-C.sub.24 arylene groups, C.sub.1-C.sub.12 alkoxy groups, and C.sub.6-C.sub.18 aryloxy groups.

##STR00001##

The present invention relates to a powdered material (M) containing at least one poly(arylene sulfide) (PAS) polymer, comprising recurring units p, q and r according of formula (I) wherein n.sub.p, n.sub.q and n.sub.r are respectively the mole % of each recurring units p, q and r; recurring units p, q and r are arranged in blocks, in alternation or randomly; 2≤(n.sub.q+n.sub.r)/(n.sub.p+n.sub.q+n.sub.r)≤9; nq is ≥0% and nr is ≥0%; j is zero or an integer varying between 1 and 4; R.sup.1 is selected from the group consisting of halogen atoms, C.sub.1-C.sub.12 alkyl groups, C.sub.7-C.sub.24 alkylaryl groups, C.sub.7-C.sub.24 aralkyl groups, C.sub.6-C.sub.24 arylene groups, C.sub.1-C.sub.12 alkoxy groups, and C.sub.6-C.sub.18 aryloxy groups.

##STR00001##

The invention pertains to a polymer composition possessing improved resistance towards degradation and discolouring phenomena induced by UV radiation, said composition comprising at least one aromatic sulfone polymer; at least one organic UV absorber and at least one basic compound selected from the group consisting of (i) basic oxides and hydroxides of divalent metals and (ii) salts of a weak acid, and to methods for its manufacture and to shaped articles obtained therefrom.

The invention pertains to a polymer composition possessing improved resistance towards degradation and discolouring phenomena induced by UV radiation, said composition comprising at least one aromatic sulfone polymer; at least one organic UV absorber and at least one basic compound selected from the group consisting of (i) basic oxides and hydroxides of divalent metals and (ii) salts of a weak acid, and to methods for its manufacture and to shaped articles obtained therefrom.

The present invention relates to an amorphous polymer (P) comprising segments (S1) containing a sulfone group, segments (S2) containing a ketone group and segments (S3) containing a polyarylene group. Moreover, the present invention relates to a process for the preparation of said amorphous polymer (P), a composition comprising the amorphous polymer (P) and an article comprising the amorphous polymer (P).

The present invention relates to an aromatic polysulfone composition including an aromatic polysulfone (P1) and an aromatic polysulfone (P2) different from the aromatic polysulfone (P1), in which the (P1) contains an amino group-containing aromatic polysulfone which has an amino group at a polymer chain terminal and of which a weight-average absolute molecular weight (Mw) is less than 20,000 g/mol, the (P2) substantially consists of a repeating unit represented by General Formula (A) and a glass transition temperature (Tg) of the (P2) is higher than or equal to 222° C., and the weight-average absolute molecular weight (Mw) of the aromatic polysulfone composition is larger than the weight-average absolute molecular weight (Mw) of the amino group-containing aromatic polysulfone.

A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R.sup.1, R.sup.2, and R.sup.3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X.sup.1, X.sup.2, and X.sup.3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R.sup.4 represents a hydrocarbon group having 1 to 20 carbon atoms and R.sup.5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R.sup.4 and R.sup.5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R.sup.4 and R.sup.5 bond; n is 0 or 1; A.sup.− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R.sup.7)CO—.

##STR00001##

A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R.sup.1, R.sup.2, and R.sup.3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X.sup.1, X.sup.2, and X.sup.3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R.sup.4 represents a hydrocarbon group having 1 to 20 carbon atoms and R.sup.5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R.sup.4 and R.sup.5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R.sup.4 and R.sup.5 bond; n is 0 or 1; A.sup.− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R.sup.7)CO—.

##STR00001##

The present invention provides a continuous polymerization apparatus capable of simply and efficiently separating a polymer and solid matter from a reaction mixture while having an apparatus configuration conducive to washing and maintenance, and a continuous production method for a polymer. A continuous polymerization apparatus (100) includes a plurality of reaction vessels (1a to 1c), wherein the plurality of reaction vessels are configured such that reaction mixtures (9a to 9c) successively move through each reaction vessel; in the plurality of reaction vessels, gas phase parts formed above the reaction mixture communicate with one another; and the continuous polymerization apparatus includes a washing part (5), the washing part configured to separate a solid included in the reaction mixture by sedimentation and to perform countercurrent washing.