A non-leaching mediator may include a polymer having a polymeric backbone, and a plurality of phenothiazine groups bonded to the polymeric backbone. The plurality of phenothiazine groups may include at least one of a phenothiazine group having the general formula (IV): ##STR00001##
and salts thereof, where n is about 9 and R represents the polymeric backbone to which the phenothiazine group is bonded, and a phenothiazine group having the general formula (V): ##STR00002##
and salts thereof, where n is about 9 and R represents the polymeric backbone to which the phenothiazine group is bonded.

A non-leaching mediator may include a polymer having a polymeric backbone, and a plurality of phenothiazine groups bonded to the polymeric backbone. The plurality of phenothiazine groups may include at least one of a phenothiazine group having the general formula (IV): ##STR00001##
and salts thereof, where n is about 9 and R represents the polymeric backbone to which the phenothiazine group is bonded, and a phenothiazine group having the general formula (V): ##STR00002##
and salts thereof, where n is about 9 and R represents the polymeric backbone to which the phenothiazine group is bonded.

A method for manufacturing a thermoplastic resin composition enabling easy control of the weight average molecular weight of a thermoplastic resin used in a soluble three-dimensional modeling support material, the support material having sufficient strength even when used in the manufacture of a three-dimensional object by an FDM system 3D printer, being less colored with excellent appearance quality, and having a high dissolution speed in neutral water and quickly removable from a precursor of the three-dimensional object without using a strong alkaline aqueous solution; and the thermoplastic resin having dicarboxylic acid monomer units derived from a dicarboxylic acid component and having a proportion of an aromatic dicarboxylic acid monomer unit derived from a sulfonic acid group and/or sulfonate group-containing aromatic dicarboxylic acid component in the dicarboxylic acid monomer units of 10 mol % or more; the method including mixing an organic salt compound represented by formula (I):

(R.sup.1SO.sub.3.sup.).sub.nX.sup.n+(I).

A method for manufacturing a thermoplastic resin composition enabling easy control of the weight average molecular weight of a thermoplastic resin used in a soluble three-dimensional modeling support material, the support material having sufficient strength even when used in the manufacture of a three-dimensional object by an FDM system 3D printer, being less colored with excellent appearance quality, and having a high dissolution speed in neutral water and quickly removable from a precursor of the three-dimensional object without using a strong alkaline aqueous solution; and the thermoplastic resin having dicarboxylic acid monomer units derived from a dicarboxylic acid component and having a proportion of an aromatic dicarboxylic acid monomer unit derived from a sulfonic acid group and/or sulfonate group-containing aromatic dicarboxylic acid component in the dicarboxylic acid monomer units of 10 mol % or more; the method including mixing an organic salt compound represented by formula (I):

(R.sup.1SO.sub.3.sup.).sub.nX.sup.n+(I).

The present invention provides novel nanostructures comprising solution of PPSU.sub.20. Methods of preparing the novel PPSU nanostructures, and applications of such nanostructures are also provided.

The present invention provides novel nanostructures comprising solution of PPSU.sub.20. Methods of preparing the novel PPSU nanostructures, and applications of such nanostructures are also provided.

A non-leaching mediator may include a polymer having a polymeric backbone, and a plurality of phenothiazine groups bonded to the polymeric backbone. The plurality of phenothiazine groups may include at least one of a phenothiazine group having the general formula (IV):

##STR00001##

and salts thereof, where n is about 9 and R represents the polymeric backbone to which the phenothiazine group is bonded, and a phenothiazine group having the general formula (V):

##STR00002##

and salts thereof, where n is about 9 and R represents the polymeric backbone to which the phenothiazine group is bonded.

A non-leaching mediator may include a polymer having a polymeric backbone, and a plurality of phenothiazine groups bonded to the polymeric backbone. The plurality of phenothiazine groups may include at least one of a phenothiazine group having the general formula (IV):

##STR00001##

and salts thereof, where n is about 9 and R represents the polymeric backbone to which the phenothiazine group is bonded, and a phenothiazine group having the general formula (V):

##STR00002##

and salts thereof, where n is about 9 and R represents the polymeric backbone to which the phenothiazine group is bonded.

Condensation of fluoro-substituted and silyl-substituted monomers provides polymers suitable for use, e.g., as engineering polymers. A monomer composition is condensed in the presence of a bifluoride or poly(hydrogen fluoride) fluoride salt. The monomer composition contains a compound of formula F-X-F and a compound of formula (R.sup.1).sub.3SiZSi(R.sup.1).sub.3, and forms an alternating X-Z polymer chain and a silyl fluoride byproduct. X has the formula -A(-R.sup.2-A)n-; each A is SO.sub.2, C(O), or Het; R.sup.2 is an organic moiety; n is 0 or 1; Het is an aromatic nitrogen heterocycle; Z has the formula -L-R.sup.3-L-; each L is O, S, or N(R.sup.4); and each R.sup.3 is an organic moiety, and R.sup.4 comprises H or an organic moiety.

Condensation of fluoro-substituted and silyl-substituted monomers provides polymers suitable for use, e.g., as engineering polymers. A monomer composition is condensed in the presence of a bifluoride or poly(hydrogen fluoride) fluoride salt. The monomer composition contains a compound of formula F-X-F and a compound of formula (R.sup.1).sub.3SiZSi(R.sup.1).sub.3, and forms an alternating X-Z polymer chain and a silyl fluoride byproduct. X has the formula -A(-R.sup.2-A)n-; each A is SO.sub.2, C(O), or Het; R.sup.2 is an organic moiety; n is 0 or 1; Het is an aromatic nitrogen heterocycle; Z has the formula -L-R.sup.3-L-; each L is O, S, or N(R.sup.4); and each R.sup.3 is an organic moiety, and R.sup.4 comprises H or an organic moiety.