Patent classifications
C08G77/42
SILICOUS FILM FORMING COMPOSITION COMPRISING BLOCK COPOLYMER AND METHOD FOR PRODUCING SILICEOUS FILM USING SAME
According to the present invention, a siliceous film forming composition, which is capable of filling trenches having narrow widths and high aspect ratios and forming a thick film, can be provided. A siliceous film forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, and (b) a solvent.
RADIATION-CURABLE ORGANOPOLYSILOXANE COMPOSITION AND A RELEASE SHEET
A radiation-curable organopolysiloxane composition comprising the components (A), (B) and (C): (A) organopolysiloxane represented by the formula (1), wherein at least one of R.sup.1 is a (meth)acryloyl group-containing organic group, a is an integer of 2 or more, a, b, c and d satisfy an equation, 2≤a+b+c+d≤1,000, and a ratio of the total number of the hydroxyl group and the hydroxyl group-containing organic group to the total number of the (meth)acryloyl group-containing organic group, the hydroxyl group and the hydroxyl group-containing organic group is 0.4 or less; (B) compound having two or more acrylic groups in one molecule in an amount of 0.1 to 50 parts by mass, relative to 100 parts by mass of component (A); and (C) radical polymerization initiator in an amount of 0.1 to 15 parts by mass, relative to 100 parts by mass of component (A).
RADIATION-CURABLE ORGANOPOLYSILOXANE COMPOSITION AND A RELEASE SHEET
A radiation-curable organopolysiloxane composition comprising the components (A), (B) and (C): (A) organopolysiloxane represented by the formula (1), wherein at least one of R.sup.1 is a (meth)acryloyl group-containing organic group, a is an integer of 2 or more, a, b, c and d satisfy an equation, 2≤a+b+c+d≤1,000, and a ratio of the total number of the hydroxyl group and the hydroxyl group-containing organic group to the total number of the (meth)acryloyl group-containing organic group, the hydroxyl group and the hydroxyl group-containing organic group is 0.4 or less; (B) compound having two or more acrylic groups in one molecule in an amount of 0.1 to 50 parts by mass, relative to 100 parts by mass of component (A); and (C) radical polymerization initiator in an amount of 0.1 to 15 parts by mass, relative to 100 parts by mass of component (A).
COMPOSITION COMPRISING AT LEAST ONE SILICONE ACRYLIC COPOLYMER AND AT LEAST ONE CATIONIC ACRYLIC COPOLYMER
The present invention relates to a composition comprising at least one silicone acrylic copolymer and at least one particular block copolymer. The present invention also relates to a process for treating keratin fibers using a composition comprising at least one silicone acrylic copolymer and at least one particular block copolymer.
COPOLYMERS OF POLY(ARYL ETHER SULFONES) AND POLYDIMETHYLSILOXANE
The invention pertains to a relates to a copolymer (P1) of poly(aryl ether sulfones) (PAES) and polydimethylsiloxane (PDMS) and to the process for preparing the copolymer (P1) by melt-hydrosilylation.
Thermoset epoxy resin, its preparing composition and making process thereof
A thermoset epoxy resin, its preparing composition and making process are disclosed. In particular, the thermoset epoxy resin is glycidyl ether of diphenolic bis-carbamate and formed by curing a one component epoxy composition and has a general structure as shown in formula (1).
Hot melt adhesive composition containing a polyolefin-polydiorganosiloxane copolymer and methods for the preparation and use thereof
A hot melt adhesive composition includes a polyolefin-polydiorganosiloxane block copolymer, a polydiorganosiloxane, and a polyorganosilicate resin. The hot melt adhesive composition is useful in electronic device assembly processes.
Polyolefin Composition Comprising Polydioorganosiloxane Block Copolymer Having C16-C70 Alkyl Block Suitable for Release Coating and Pressure Sensitive Adhesive Article
A pressure sensitive adhesive article is described comprising a pressure sensitive adhesive in contact with the release layer. The release layer comprises a thermoplastic polymer and a block copolymer additive having the general structure: A[LB]n wherein A is a polyorganosiloxane block, L is a covalent bond or a divalent linking group B is independently a C16-C70 alkyl group, and n is at least 1. In other embodiments, compositions are described comprising a thermoplastic polymer the described block copolymer additive; as well as methods of making a release composition.
SILICONE HYBRID RESIN COMPOSITION AND SEMICONDUCTOR DEVICE
A silicone hybrid resin composition contains: (A) 100 parts by mass of a curable organic resin composition containing (A1) one or more curable organic resins selected from an epoxy resin, an acrylic resin, a polyimide resin, a maleimide resin, a polyurethane resin, a phenolic resin, a melamine resin, and silicone-modified resins thereof; and (B) 1 to 300 parts by mass of a curable silicone resin composition having a viscosity at 25° C. of 0.01 to 1,000 Pa.Math.s as measured by a method described in JIS K 7117-1:1999, where the component (B) is a dispersion in the component (A), and the component (A) is a curable organic resin composition that cures by a reaction mechanism that is different from a reaction mechanism of the component (B). The silicone hybrid resin composition can lower a storage modulus and is excellent in adhesiveness to a substrate while maintaining the Tg of an organic resin.
Polyolefin-polydiorganosiloxane block copolymer and hydrosilylation reaction method for the synthesis thereof
A polyolefin-polydiorganosiloxane block copolymer may be prepared by hydrosilylation reaction.