C08G77/48

CROSSLINKABLE COMPOSITION AND CROSSLINKED PRODUCT

A crosslinkable composition containing: a liquid monocyclic olefin ring-opened polymer (A) having a reactive group at a polymer chain end thereof and a weight-average molecular weight (Mw) of 1,000 to 50,000; and a crosslinkable compound (B) having, in the molecule, two or more functional groups reactive with the reactive group at the polymer chain end of the monocyclic olefin ring-opened polymer (A).

Temperature-resistant silicone resins

Methods and formulations for modified silicone resins of Formula (I) are presented: ##STR00001##
The R.sup.1, R.sup.2, and R.sup.3 are each independently selected from a group consisting of H, alkyl, alkenyl, alkynyl, and aryl; n ranges from 1 to 10; m ranges from 1 to 200; and p ranges from 2 to 1,000. The elastomeric materials prepared from modified silicone resins display robust mechanical properties following prolonged exposure to high temperatures (e.g., 316 C. or higher).

Temperature-resistant silicone resins

Methods and formulations for modified silicone resins of Formula (I) are presented: ##STR00001##
The R.sup.1, R.sup.2, and R.sup.3 are each independently selected from a group consisting of H, alkyl, alkenyl, alkynyl, and aryl; n ranges from 1 to 10; m ranges from 1 to 200; and p ranges from 2 to 1,000. The elastomeric materials prepared from modified silicone resins display robust mechanical properties following prolonged exposure to high temperatures (e.g., 316 C. or higher).

Photoresist compositions, intermediate products, and methods of manufacturing patterned devices and semiconductor devices

A photoresist composition includes a photoresist polymer including a repeating unit to which a silicon-containing leaving group is combined, a photo-fluorine generator including a sulfonium fluoride, and a solvent.

Photoresist compositions, intermediate products, and methods of manufacturing patterned devices and semiconductor devices

A photoresist composition includes a photoresist polymer including a repeating unit to which a silicon-containing leaving group is combined, a photo-fluorine generator including a sulfonium fluoride, and a solvent.

Stable star-structured functional polyolefins

Stable star-structured functional polyolefins and methods of making them, the functional polyolefins comprising a polyolefin bound at any position along its chain length to at least one nucleophile-containing silane of the following formula: ##STR00001##
wherein Y is a di- or trivalent linker group selected from heteroatoms, C1 to C10 alkylenes, and other groups disclosed herein; Nu is a nucleophilic atom or unsaturation group; R5 is selected from hydrogen, and C1 to C10 alkyls, and other groups as disclosed herein; X is a divalent group selected from linear and branched alkylenes and heteroatom-alkylenes, and other groups as disclosed herein; and PO is a polyolefin having a weight average molecular weight of at least 400 g/mole; with the proviso that at least one of R1, R2, and R3 is selected from the same or different functional polyolefin moieties. Star-structured functional polyolefins are useful as filler dispersive additives in tire formulations and processing aids.

NOVEL ARYLENE GROUP-CONTAINING ORGANOPOLYSILOXANE AND CURABLE ORGANOPOLYSILOXANE COMPOSITION USING SAME

Provided is a curable organopolysiloxane composition from which highly heat-resistant cured products can be obtained, the curable organopolysiloxane composition comprising: (A) 100 parts by mass of a novel organopolysiloxane represented by formula (1)

##STR00001##

(R.sup.1 is an alkyl group or an alkoxy substituted alkyl group having 1 to 6 carbon atoms, R.sup.2 is a group selected from an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, and a group in which a portion of the hydrogen atoms of those groups is substituted with a halogen atom, Ar is an arylene group having 6 carbon atoms or more, a is 1 to 1,000, b is 1 to 5,000, and n is 1 to 3, the total of n in an unsubstituted or substituted alkoxysilyl group on both ends of the molecular chain being 3 or more); and (B) 0.01 to 10 parts by mass of a curing catalyst. Also provided are electrical and electronic components, a vehicle oil seal, a building sealant, etc. which use the cured product of the composition.

Sol-gel derived compositions

Disclosed are sol gel derived materials obtained from at least one first precursor and at least one second precursor, as well as sol gel derived compositions containing a plurality of alkylsiloxy substituents obtained from such sol-gel derived materials.

Sol-gel derived compositions

Disclosed are sol gel derived materials obtained from at least one first precursor and at least one second precursor, as well as sol gel derived compositions containing a plurality of alkylsiloxy substituents obtained from such sol-gel derived materials.

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD

Provided is a photosensitive resin composition comprising: (A) a silicone resin having an epoxy group and/or a phenolic hydroxyl group; (B) a photoacid generator represented by formula (B); and (C) a carboxylic acid quaternary ammonium compound.

##STR00001##