C08G77/80

POROELASTIC MATERIALS, BIOSENSORS COMPRISING POROELASTIC MATERIALS, AND METHODS OF MAKING AND USING POROELASTIC MATERIALS AND BIOSENSORS
20220363860 · 2022-11-17 ·

Poroelastic materials, methods of making such materials, biosensors comprising such materials, and methods of making and using such biosensors. According to one aspect, a poroelastic material is formed by a process that includes depositing a prepolymer composition on a substrate, annealing the prepolymer composition in a pressurized steam environment at a temperature and for a duration sufficient to form a porous medium having a solid matrix formed of a polymer derived from the prepolymer composition, infiltrating the porous medium with a liquid that includes electrically conductive nanomaterials such that the electrically conductive nanomaterials are located within pores of the porous medium, and evaporating the liquid such that the electrically conductive nanomaterials remain in and/or connected through the pores of the porous medium.

CURABLE LIQUID SILICONE COMPOSITION, CURED PRODUCT OF CURABLE LIQUID SILICONE COMPOSITION, OPTICAL FILLER INCLUDING CURABLE LIQUID SILICONE COMPOSITION, AND DISPLAY DEVICE INCLUDING LAYER COMPRISING CURED PRODUCT OF CURABLE LIQUID SILICONE COMPOSITION
20230101321 · 2023-03-30 ·

A photocurable liquid silicone composition, having a low viscosity that facilitates injection into a small gap, having a refractive index (pre-cure) that is high not only in a visible region but also in an infrared region, and that is particularly useful as a material for a device using an infrared LED light source, is provided. The composition comprises: (A): (A1) an organosilane or organopolysiloxane having 1 to 5 silicon atoms, having an alkenyl group, and having at least one monovalent functional group selected from aromatic groups and aralkyl groups, and/or (A2) an organopolysiloxane having 2 to 5 silicon atoms, having an alkenyl group, and not having a monovalent functional group selected from aromatic groups and aralkyl groups; (C) a compound having at least two silicon-bonded hydrogen atoms; and (D) a hydrosilylation reaction catalyst. Pre-cure, the refractive index of the entire liquid composition is ≥1.47, and the viscosity is ≤500 mPa.Math.s.

METHOD FOR PRODUCING CYCLIC POLYSILOXANE
20230095953 · 2023-03-30 · ·

A method for producing a cyclic polysiloxane that includes a step for reacting a raw material cyclic siloxane and a dihalosilane in association with ring-opening of the cyclic siloxane in the presence of at least one catalyst selected from Lewis base compounds having a carbonamide bond represented by —C(═O)N<, phosphorus compounds having a P═O bond, quaternary ammonium salts, and quaternary phosphonium salts to obtain a linear polysiloxane with both ends of the molecular chain blocked by halogen atoms and a step for obtaining a cyclic polysiloxane by reacting the linear polysiloxane with both ends of the molecular chain blocked by halogen atoms with water makes it possible to provide a method for producing a cyclic polysiloxane that obtains a cyclic polysiloxane at high yield and high purity by simple steps and under moderate conditions.

Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development

A resist underlayer film for a resist pattern formation by developing a resist with organic solvent after exposure of resist. Method for manufacturing a semiconductor includes: applying onto a substrate a resist underlayer film forming composition including hydrolyzable silanes, hydrolysis products of hydrolyzable silanes, hydrolysis-condensation products of hydrolyzable silanes, or a combination thereof. Hydrolyzable silanes being silane of Formulas (1), (2) and (3). Silane of Formulas (1), (2) and (3) in total silanes in a ratio % by mole of 45-90:6-20:0-35; baking the applied resist underlayer film forming composition to form a resist underlayer film; applying a composition to form a resist film; exposing the resist film to light; developing the resist film after exposure, with organic solvent to obtain patterned resist film; and etching the resist underlayer film by using the patterned resist film and processing the substrate using the patterned resist underlayer film; wherein
Si(R.sup.1).sub.4  Formula (1)
R.sup.2[Si(R.sup.3).sub.3]  Formula (2)
R.sup.4[Si(R.sup.5).sub.3].sub.b  Formula (3).

Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode

The present invention provides a bio-electrode composition including a silicone bonded to a sulfonamide salt, wherein the sulfonamide salt is shown by the following general formula (1): ##STR00001##
wherein R.sup.1 represents a linear, branched, or cyclic alkylene group having 1 to 20 carbon atoms optionally having an aromatic group, an ether group, or an ester group, or an arylene group having 6 to 10 carbon atoms; Rf represents a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms and containing at least one fluorine atom; M.sup.+ is an ion selected from a lithium ion, a sodium ion, a potassium ion, and a silver ion. This can form a living body contact layer for a bio-electrode that is excellent in electric conductivity and biocompatibility, light-weight, manufacturable at low cost, and free from large lowering of the electric conductivity even though it is wetted with water or dried.

Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process

A thermosetting silicon-containing compound contains one or more of structural units shown by the following general formulae (Sx-1), (Sx-2), and (Sx-3): ##STR00001##
where R.sup.1 represents a monovalent organic group containing both a phenyl group optionally having a substituent and a non-aromatic ring having 3 to 10 carbon atoms; and R.sup.2, R.sup.3 each represent the R.sup.1 or a monovalent organic group having 1 to 30 carbon atoms. Thus, the present invention provides a thermosetting silicon-containing compound usable in a silicon-containing resist underlayer film material capable of achieving contradictory properties of having both alkaline developer resistance and improved solubility in an alkaline stripping liquid containing no hydrogen peroxide.

HIGH PURITY POLYSILOCARB MATERIALS, APPLICATIONS AND PROCESSES

Organosilicon chemistry, polymer derived ceramic materials, and methods. Such materials and methods for making polysilocarb (SiOC) and Silicon Carbide (SiC) materials having 3-nines, 4-nines, 6-nines and greater purity. Processes and articles utilizing such high purity SiOC and SiC.

High Purity SiOC and SiC, Methods Compositions and Applications

Organosilicon chemistry, polymer derived ceramic materials, and methods. Such materials and methods for making polysilocarb (SiOC) and Silicon Carbide (SiC) materials having 3-nines, 4-nines, 6-nines and greater purity. Processes and articles utilizing such high purity SiOC and SiC.

RAPID HYDROSILYLATION CURE COMPOSITION

A composition contains a blend of linear and resinous alkenyl functionalized polyorganosiloxanes, a blend of linear and resinous silyl hydride functionalized polyorganosiloxanes, and a hydrosilylation catalyst where the linear silyl hydride functionalized polyorganosiloxanes has a ratio of D/D.sup.H that is greater than 2.0 and less than 14, the molar and the ratio of silyl hydride hydrogens to the sum of terminal alkenyl functionality on the alkenyl functionalized polyorganosiloxane is 1.2-2.2.

EPOXY-SILOXANE COPOLYMER COMPOSITIONS AND METHODS OF MAKING AND USING THE SAME
20230085868 · 2023-03-23 · ·

A composition of the present disclosure includes an aqueous dispersion of epoxy resin particles. The epoxy resin particles include at least two 1,2-epoxide groups. The composition further includes one or more anti-adhesive agents, one or more anti-microbial agents, or a combination of one or more anti-adhesive agents and one or more anti-microbial agents.