The present invention relates to a porous film including polyethylene and pore-forming particles, wherein the porous film has a structure including lamella and fibril, and the average size of pores located inside the porous film is larger than the average size of pores located on the surface of the porous film; a separator including the same; and an electrochemical cell.

The present invention relates to a porous film including polyethylene and pore-forming particles, wherein the porous film has a structure including lamella and fibril, and the average size of pores located inside the porous film is larger than the average size of pores located on the surface of the porous film; a separator including the same; and an electrochemical cell.

A method of forming a CMP pad includes providing a solution of a block copolymer (BCP), where the BCP includes a first segment and a second segment connected to the first segment, the second segment being different from the first segment in composition. The method further includes processing the BCP to form a polymer network having a first phase and a second phase embedded in the first phase, where the first phase includes the first segment and the second phase includes the second segment, and subsequently removing the second phase from the polymer network, thereby forming a polymer film that includes a network of pores embedded in the first phase. Thereafter, the method proceeds to combining the CMP top pad and a CMP sub-pad to form a CMP pad, where the CMP top pad is configured to engage with a workpiece during a CMP process.

This polyolefin microporous membrane has a TD thermal shrinkage at 120 C. of 8% or less, and the TD thermal shrinkage at 130 C. thereof is 3 to 5 times greater than the TD thermal shrinkage at 120 C. and at least 12% greater than the TD thermal shrinkage at 120 C.

In an embodiment, a porous material comprises a base polymer having a continuous pore structure. In another embodiment, a method of making the porous material comprises reacting a base polymer with a degradable polymer with a crosslinker in the presence of a solvent and/or reacting a base polymer and a degradable polymer with a crosslinker in the presence of the solvent; removing the solvent to form a phase separated material; and removing the degradable polymer to form the porous material.

In an embodiment, a porous material comprises a base polymer having a continuous pore structure. In another embodiment, a method of making the porous material comprises reacting a base polymer with a degradable polymer with a crosslinker in the presence of a solvent and/or reacting a base polymer and a degradable polymer with a crosslinker in the presence of the solvent; removing the solvent to form a phase separated material; and removing the degradable polymer to form the porous material.

To provide: a purification method which uses a polyimide and/or polyamide imide porous membrane that exhibits excellent removal performance for impurities such as metals, and wherein a liquid that is a silylating agent liquid, a film forming material or a diffusing agent composition is an object to be purified; a purification method for purifying a silicon compound-containing liquid that contains a silicon compound which is capable of producing a silanol group by hydrolysis; a method for producing a silylating agent liquid, a film forming material or a diffusing agent composition, which uses the purification method; a filter medium which is composed of the above-described porous membrane; and a filter device which comprises the above-described porous membrane. A purification method for purifying a liquid, which comprises a step in which some or all of the liquid is caused to permeate through a polyimide and/or polyamide imide porous membrane having communicating pores from one side to the other side by means of differential pressure, and wherein the liquid is a silylating agent liquid, a film forming material or a diffusing agent composition that is used for diffusing a dopant into a semiconductor substrate.

To provide: a purification method which uses a polyimide and/or polyamide imide porous membrane that exhibits excellent removal performance for impurities such as metals, and wherein a liquid that is a silylating agent liquid, a film forming material or a diffusing agent composition is an object to be purified; a purification method for purifying a silicon compound-containing liquid that contains a silicon compound which is capable of producing a silanol group by hydrolysis; a method for producing a silylating agent liquid, a film forming material or a diffusing agent composition, which uses the purification method; a filter medium which is composed of the above-described porous membrane; and a filter device which comprises the above-described porous membrane. A purification method for purifying a liquid, which comprises a step in which some or all of the liquid is caused to permeate through a polyimide and/or polyamide imide porous membrane having communicating pores from one side to the other side by means of differential pressure, and wherein the liquid is a silylating agent liquid, a film forming material or a diffusing agent composition that is used for diffusing a dopant into a semiconductor substrate.

Vibration damping and sound absorbing foam formed of foam and fine particles present inside the foam so as to form bell-like structures in the foam is produced by performing the following steps [I] to [III] in the stated order. [I] Producing fine particles each having a surface coated with a coating material capable of being dissolved in at least one liquid selected from water and a solvent. [II] Mixing the coated fine particles into a material for foam, and producing foam from the mixture. [III] Immersing the foam in at least one liquid selected from water and a solvent to remove the coating of each of the fine particles in the foam by dissolution in the liquid.

Disclosed herein are compositions comprising an epoxy-functionalized sacrificial polymer, wherein the sacrificial polymer decomposes into one or more gaseous decomposition products at a temperature of 180 C. or less for a period of time of 24 hrs or less. Also disclosed are compositions comprising a copolymer derived from an epoxy resin; an epoxy-functionalized sacrificial polymer; and optionally a crosslinker. The epoxy-functionalized sacrificial polymer can be derived from a polycarbonate. Methods of preparing the copolymers described herein are also disclosed. Porous films derived from the copolymers described herein, wherein a majority of the sacrificial polymer in the composition has been degraded to form pores in the porous film are also disclosed.