Patent classifications
C08J9/26
POLYIMIDE PRECURSOR SOLUTION, MOLDED ARTICLE, AND METHOD FOR PRODUCING MOLDED ARTICLE
A polyimide precursor solution includes an aqueous solution that contains water; a resin particle that does not dissolve in the aqueous solution; an inorganic particle; and a polyimide precursor.
POLYIMIDE PRECURSOR SOLUTION, METHOD FOR PRODUCING POROUS POLYIMIDE FILM, AND POROUS POLYIMIDE FILM
A polyimide precursor solution includes an aqueous solution that contains water; a resin particle that does not dissolve in the aqueous solution; inorganic particles that have a volume average particle diameter within a range of 0.001 m to 0.2 m; and a polyimide precursor.
POLYIMIDE PRECURSOR SOLUTION, METHOD FOR PRODUCING POROUS POLYIMIDE FILM, AND POROUS POLYIMIDE FILM
A polyimide precursor solution includes an aqueous solution that contains water; a resin particle that does not dissolve in the aqueous solution; inorganic particles that have a volume average particle diameter within a range of 0.001 m to 0.2 m; and a polyimide precursor.
POLYMER COMPOSITES FOR FUSED FILAMENT FABRICATION AND METHODS OF MAKING THE SAME
Disclosed are compositions of a fused filament fabrication (FFF) composite filament having embedded functional materials in a thermoplastic matrix. Methods of making the composite filaments are also disclosed. In one example, a FFF composite filament incorporates a MOF, in an amount greater than 10% by mass, dispersed in a matrix polymer. One example of a method of synthesizing FFF composite filaments involves mixing a suspension that has a MOF with a matrix polymer solution to yield a polymer-MOF mixture. The mixture is cast and dried into a solid composite material, which is formed a FFF composite filament having the MOF in an amount greater than 10% by mass.
METHOD FOR PRODUCING POLYSACCHARIDE MONOLITH STRUCTURE
Provided is a manufacturing method for monolithic structure that is a porous body formed of polysaccharide being a naturally-occurring polymer, has continuous pores with an average pore diameter suitable for biomolecule separation, and allows formation into arbitrary shape. The polysaccharide monolithic structure is manufactured by a method including a first step of obtaining a polysaccharide solution by dissolving polysaccharide into a mixed solvent of a first component and a second component at temperature lower than a boiling point of the mixed solvent, and a second step of obtaining polysaccharide monolithic structure by cooling the polysaccharide solution, wherein the first component is a solvent selected from lactate, and the second component is a solvent selected from water, lower alcohol, and a combination thereof. The monolithic structure obtained is a porous body having continuous pores with an average pore diameter of 0.01 to 20.0 micrometers, and a thickness of 100 micrometers or more.
POROUS/NANOPOROUS PHT
In an embodiment, a polymeric material includes a plurality of hemiaminal units bonded together by a first linkage and a second linkage, wherein the first linkage is thermally stable and resistant to bases and the second linkage is thermally degradable and degradable by a base. In another embodiment, a method of forming nanoporous materials includes forming a polymer network with a chemically removable portion. The chemically removable portion may be polycarbonate polymer that is removable on application of heat or exposure to a base, or a polyhexahydrotriazine (PHT) or polyhemiaminal (PHA) polymer that is removable on exposure to an acid. Removing any portion of the polymer results in formation of nanoscopic pores as polymer chains are decomposed, leaving pores in the polymer matrix.
POROUS/NANOPOROUS PHT
In an embodiment, a polymeric material includes a plurality of hemiaminal units bonded together by a first linkage and a second linkage, wherein the first linkage is thermally stable and resistant to bases and the second linkage is thermally degradable and degradable by a base. In another embodiment, a method of forming nanoporous materials includes forming a polymer network with a chemically removable portion. The chemically removable portion may be polycarbonate polymer that is removable on application of heat or exposure to a base, or a polyhexahydrotriazine (PHT) or polyhemiaminal (PHA) polymer that is removable on exposure to an acid. Removing any portion of the polymer results in formation of nanoscopic pores as polymer chains are decomposed, leaving pores in the polymer matrix.
METHOD FOR PRODUCING COAGULATE
A method for producing a coagulate includes: incorporating, into an aqueous urethane resin composition containing an aqueous urethane resin having an acid value of 0.01 mg KOH/g or more, a thickening agent having an oxyethylene group content of 210.sup.2 mol/g or less in an amount in the range of from 0.01 to 30 parts by mass, relative to 100 parts by mass of the aqueous urethane resin, to thicken the composition; and then coagulating the thickened composition using a coagulant containing a metal salt). A porous structure can be formed from an aqueous urethane resin composition without subjecting the composition to heating or foaming step, and therefore a coagulate having a porous structure can be stably obtained with ease.
MICROPOROUS MEMBRANE, LITHIUM ION SECONDARY BATTERY AND METHOD OF PRODUCING THE MICROPOROUS MEMBRANE
A microporous membrane has average membrane thickness of 15 m or less, and relative impedance A after a heat compression treatment under a pressure of 4.0 MPa at 80 C. for 10 minutes of 140% or less, the relative impedance A being obtained by the equation below: Relative impedance A=(impedance measured at 80 C. after the heat compression treatment)/(impedance measured at room temperature prior to the heat compression treatment)100.
MICROPOROUS MEMBRANE, LITHIUM ION SECONDARY BATTERY AND METHOD OF PRODUCING THE MICROPOROUS MEMBRANE
A microporous membrane has average membrane thickness of 15 m or less, and relative impedance A after a heat compression treatment under a pressure of 4.0 MPa at 80 C. for 10 minutes of 140% or less, the relative impedance A being obtained by the equation below: Relative impedance A=(impedance measured at 80 C. after the heat compression treatment)/(impedance measured at room temperature prior to the heat compression treatment)100.