Patent classifications
C08J2483/16
Gas barrier laminate, method for producing same, member for electronic devices, and electronic device
The present invention provides: a gas barrier laminate comprising a base, a primer layer, and a gas barrier layer, the primer layer and the gas barrier layer being sequentially stacked on at least one side of the base, the primer layer having a modulus of elasticity at 90 C. of 1.6 GPa or more, and a coefficient of static friction between a surface of one side of the gas barrier laminate and a surface of the other side of the gas barrier laminate being 0.35 to 0.8; a method for producing the gas barrier laminate; an electronic device member comprising the gas barrier laminate; and an electronic device.
Method for preparing a barrier film
The present application relates to a method for preparing a barrier film. The present application can provide a method for preparing a barrier film having excellent barrier characteristics and optical performances. The barrier film produced by the method of the present application can be effectively used not only for packaging materials of as foods or medicines, and the like, but also for various applications, such as members for FPDs (flat panel displays) such as LCDs (Liquid Crystal Displays) or solar cells, substrates for electronic papers or OLEDs (Organic Light Emitting Diodes), or sealing films.
Laminates of Polysilazane And Carbon Fiber Reinforced Polymer
Disclosed are laminates comprising a carbon fiber reinforced polymer sheet and a layer of polysilazane and methods for producing such laminates.
Resin composition, prepreg for printed circuit and metal-coated laminate
Provided is a resin composition, a prepreg for a printed circuit and a metal-coated laminate. The resin composition includes: a silicone aryne resin, a polyphenylene ether resin with unsaturated bonds, and a butadiene polymer. The resin composition is used such that the prepared metal-coated laminate can have at least one of the following characteristics: a low dielectric loss factor, high heat resistance, and a low coefficient of thermal expansion.
Elongated gas barrier laminate and method for producing same
The present invention is a long gas barrier laminate including a base, a functional layer, a smoothing layer, and a gas barrier layer, the functional layer being stacked on one side of the base, the smoothing layer and the gas barrier layer being sequentially stacked on the other side of the base, and a coefficient of static friction between a surface of the functional layer that is situated opposite to the base and a surface of the gas barrier layer that is situated opposite to the base being 0.35 to 0.80; and a method for producing the long gas barrier laminate.
LAMINATE FILM, ELECTRONIC DEVICE MEMBER, AND ELECTRONIC DEVICE
The present invention provides a laminate film comprising at least a base and a gas barrier layer, elongation strain () generated in a surface of the gas barrier layer, which is calculated by a following formula (1), is 0.8% or less; an electronic device member including the laminate film; and an electronic device equipped with the electronic device member. In formula (1), T is a distance [m] from a surface farthest from the gas barrier layer to the gas barrier layer in a thickness direction of the laminate film, and is a distance, from the surface of the laminate film, of a hypothetical plane () in the laminate film in which stress does not occur. According to the present invention, there are provided a laminate film excellent in gas barrier properties and bending properties, an electronic device member including this laminate film, and an electronic device equipped with this electronic device member.
=(T)/{(310.sup.3)+}100(1)
Barrier film
Provided is a barrier film comprising a base layer, and an inorganic layer including Si, N, and O, and including a first region and a second region, which have different elemental contents (atomic %) of Si, N, and O from each other as measured by XPS, wherein the film has a water vapor transmission rate of 5.0?10.sup.?4 g/m.sup.2.Math.day or less as measured under conditions of a temperature of 38? C. and 100% relative humidity after being stored at 85? C. and 85% relative humidity conditions for 250 hours, or wherein the inorganic layer has a compactness expressed through an etching rate of 0.17 nm/s in the thickness direction for an Ar ion etching condition to etch Ta.sub.2O.sub.5 at a rate of 0.09 nm/s. The barrier film has excellent barrier properties and optical properties and can be used for electronic products that are sensitive to moisture and the like.
GAS BARRIER FILM AND METHOD OF PRODUCING GAS BARRIER FILM
A gas barrier film includes, in order, a film substrate, an organic layer, and a silica layer, in which the silica layer includes a silica polymer having at least a covalent bond between a silicon atom and an oxygen atom, and a concentration of carbon atoms of the organic layer is 50% or more. A method of producing a gas barrier film includes forming an organic layer having a concentration of carbon atoms of 50% or more on a film substrate, applying a coating liquid including a silicon compound to the organic layer to form a layer including the silicon compound, and irradiating the layer including the silicon compound with vacuum ultraviolet rays to form a silica layer including a silica polymer having at least a covalent bond between a silicon atom and an oxygen atom.
METHOD FOR PREPARING A BARRIER FILM
The present application relates to a method for preparing a barrier film. The present application can provide a method for preparing a barrier film having excellent barrier characteristics and optical performances. The barrier film produced by the method of the present application can be effectively used not only for packaging materials of as foods or medicines, and the like, but also for various applications, such as members for FPDs (flat panel displays) such as LCDs (Liquid Crystal Displays) or solar cells, substrates for electronic papers or OLEDs (Organic Light Emitting Diodes), or sealing films.
GAS BARRIER FILM, ELECTRONIC DEVICE MEMBER, AND ELECTRONIC DEVICE
The present invention is: a gas barrier film comprising a base film and a gas barrier layer formed by modifying a layer containing a polysilazane-based compound and formed on the base film, wherein the gas barrier film has a water vapor transmission rate of 0.100 g/(m.sup.2.Math.day) or less, and an amount of hydrogen gas released from the gas barrier layer under an argon gas atmosphere at 60 C. and a relative humidity of 90% is 5.5 g or less per cm.sup.2 of the gas barrier film; an electronic device member comprising the gas barrier film; and an electronic device comprising this electronic device member. The present invention provides a gas barrier film having a gas barrier layer which has excellent gas barrier properties and has less outgases generation, an electronic device member comprising the gas barrier film, and an electronic device comprising the electronic device member.