The present invention is: a gas barrier laminate comprising a base material and a gas barrier unit, wherein the gas barrier unit comprises a gas barrier layer (1) disposed on the base material side, and a gas barrier layer (2) disposed on a surface side of the gas barrier layer (1) opposite to the base material side, and a thickness of the gas barrier unit is 170 nm to 10 m; an electronic device member comprising the gas barrier laminate; and an electronic device comprising the electronic device member. The present invention provides: a gas barrier laminate having excellent gas barrier properties and excellent colorlessness and transparency, an electronic device member comprising this gas barrier laminate, and an electronic device comprising this electronic device member.

The present invention provides a plastic substrate, including: a polyimide film; a hard coating layer formed on one side of the polyimide film; and a transparent electrode layer formed on the other side of the polyimide film. The plastic substrate has excellent light transmittance high hardness characteristics, superior ITO processability and flexibility. Further, the plastic substrate can function as both a window film and an electrode film when it is applied to a touch screen panel. Thus, the present invention provides a touch screen panel which can be slimmed by reducing the number of laminated films including the plastic substrate.

The present invention is aiming to provide a gas barrier film having excellent gas barrier properties and also having superior transparency and the like, and an efficient method for producing such a gas barrier film. The present invention provides a gas barrier film having a gas barrier layer on a base material, and a method for producing such a gas barrier film, in which the gas barrier layer includes, from the surface side toward the base material side, a first region and a second region having different refractive indices, the value of the refractive index in the first region is adjusted to a value within the range of 1.50 to 1.68, and the value of the refractive index in the second region is adjusted to a value within the range of 1.40 to below 1.50.

Provided is a member in which the strength of a second layer located on the outermost surface of the exterior is improved in order to sufficiently exhibit and maintain the functions, to thereby improve impact resistance and scratch resistance. The member is a member including a base material, a first layer, a second layer, and a third layer in the stated order, wherein the first layer is an inorganic porous layer in which a plurality of inorganic particles are joined to each other, and the first layer and the second layer have a total thickness of 0.3 m or more and 2 m or less, wherein the third layer contains a resin and has a thickness of 0.4 m or more and 2,000 m or less, and wherein the second layer contains the inorganic particles and the resin.

The present invention is a long gas barrier laminate including a base, a functional layer, a smoothing layer, and a gas barrier layer, the functional layer being stacked on one side of the base, the smoothing layer and the gas barrier layer being sequentially stacked on the other side of the base, and a coefficient of static friction between a surface of the functional layer that is situated opposite to the base and a surface of the gas barrier layer that is situated opposite to the base being 0.35 to 0.80; and a method for producing the long gas barrier laminate.

To provide a gas barrier film having a high gas barrier property and a high modulus of surface elasticity and having excellent hygrothermal durability, a gas barrier film having less pinholes in the entire surface and having a high gas barrier property, and manufacturing methods of these. A first gas barrier film includes: a gas barrier layer containing silicon and oxygen, and a region in a thickness direction of the gas barrier layer, the region containing silicon, oxygen, and nitrogen, and having an element ratio of nitrogen of 5 at % or greater, and a thickness d.sub.M of the region being 30 nm or greater. A second gas barrier film includes a gas barrier layer containing silicon and oxygen, where, in a case where the gas barrier film having a predetermined size is sectioned into a predetermined number, a proportion of the number of sections having a water vapor transmission rate in a predetermined condition of less than 1.010.sup.3 g/m.sup.2/day is not less than a predetermined proportion.

The invention is a formed article including a gas barrier layer, the gas barrier layer including a surface layer part that is formed of a material that includes at least a carbon atom, an oxygen atom, and a silicon atom, the surface layer part having a carbon atom content rate of more than 0 and not more than 70%, an oxygen atom content rate of 10 to 70%, a nitrogen atom content rate of 0 to 35%, and a silicon atom content rate of 20 to 55%, based on a total content rate of carbon atoms, oxygen atoms, nitrogen atoms, and silicon atoms; a method for producing the formed article; an electronic device member including the formed article; and an electronic device comprising the electronic device member. The formed article of the invention exhibits an excellent gas barrier capability, excellent transparency, and excellent bending resistance. The method for producing a formed article of the invention can efficiently, safely, and conveniently produce the formed article of the invention. The electronic device member of the invention may suitably be used for electronic devices such as displays and solar cells.

The present invention relates to a gas barrier film and a manufacturing method therefor, the gas barrier film comprising: a base; and a barrier layer formed on one surface of the base, wherein the barrier layer has a nitrogen (N) atomic percent of about 1% to about 6%. The gas barrier film, according to the present invention, has an excellent gas barrier property, scratch resistant property, flexibility, transparency and crack prevention effect, and the method for manufacturing the same can be performed by non-vacuum wet coating, and thus a manufacturing time is short, and process performance is excellent.

Provided a formed article comprising a layer that includes a polysilazane compound and a clay mineral, and having a water vapor transmission rate at a temperature of 40 C. and a relative humidity of 90% of 6.0 g/m.sup.2/day or less. Also provided are a method for producing the formed article, an electronic device member including the formed article, and an electronic device including the electronic device member. The formed article exhibiting an excellent gas barrier capability, excellent transparency, and excellent bending resistance, a method for producing the formed article, and an electronic device member, or the like, comprising the formed article are provided.

The present invention provides a dense silicic film and a producing method thereof. This method comprises coating a composition for coating film, which comprises a polymer having a silazane bond on a substrate, on a substrate, irradiating with light having a maximal peak in the range of 160-179 nm wavelength, and then irradiating with light having 10-70 nm wavelength longer maximal peak wavelength than the light used in the previous irradiation.