A chloroprene copolymer latex containing a chloroprene copolymer having a structural unit derived from chloroprene and a structural unit derived from 2,3-dichloro-1,3-butadiene, in which a toluene insoluble content in the chloroprene copolymer is 50 to 95% by mass, and a modulus at 500% elongation of a film, which is obtained on a base material by dipping the base material in the chloroprene copolymer latex and then performing vulcanization at 100° C. for 30 minutes, according to JIS K 6251 is 4.0 MPa or less.

A chloroprene copolymer latex containing a chloroprene copolymer having a structural unit derived from chloroprene and a structural unit derived from 2,3-dichloro-1,3-butadiene, in which a toluene insoluble content in the chloroprene copolymer is 50 to 95% by mass, and a modulus at 500% elongation of a film, which is obtained on a base material by dipping the base material in the chloroprene copolymer latex and then performing vulcanization at 100° C. for 30 minutes, according to JIS K 6251 is 4.0 MPa or less.

Provided is a method for producing purified chloroprene-based-polymer latex which enables efficiently removing a residual volatile organic substance from chloroprene-based-polymer latex while suppressing foaming and the deposition of aggregates. The method for producing purified chloroprene-based-polymer latex of the present invention has at least the following steps (I) to (III):

Step (I): a step of introducing chloroprene-based-polymer latex into a container beforehand,
Step (II): a step of removing a residual volatile organic substance in the chloroprene-based-polymer latex which satisfies specific requirements (1) to (4), and
Step (III): a step of collecting the latex from the container after performing the step (II) at least once, to thereby obtain purified chloroprene-based-polymer latex.

Provided is a method for producing purified chloroprene-based-polymer latex which enables efficiently removing a residual volatile organic substance from chloroprene-based-polymer latex while suppressing foaming and the deposition of aggregates. The method for producing purified chloroprene-based-polymer latex of the present invention has at least the following steps (I) to (III):

Step (I): a step of introducing chloroprene-based-polymer latex into a container beforehand,
Step (II): a step of removing a residual volatile organic substance in the chloroprene-based-polymer latex which satisfies specific requirements (1) to (4), and
Step (III): a step of collecting the latex from the container after performing the step (II) at least once, to thereby obtain purified chloroprene-based-polymer latex.

One embodiment of the present invention relates to a chloroprene copolymer latex, a method for producing a chloroprene copolymer latex, a chloroprene copolymer latex composition, and a molded article or dipped product of a chloroprene copolymer rubber. The chloroprene copolymer latex is a latex of a chloroprene copolymer including monomer units derived from 2-chloro-1,3-butadiene (chloroprene) and monomer units derived from 2-methyl-1,3-butadiene, wherein the tetrahydrofuran insoluble content in the chloroprene copolymer is 20% by mass or less, and the proportion of the monomer units derived from 2-methyl-1,3-butadiene is 10 to 27 mol % in the chloroprene copolymer.

One embodiment of the present invention relates to a chloroprene copolymer latex, a method for producing a chloroprene copolymer latex, a chloroprene copolymer latex composition, and a molded article or dipped product of a chloroprene copolymer rubber. The chloroprene copolymer latex is a latex of a chloroprene copolymer including monomer units derived from 2-chloro-1,3-butadiene (chloroprene) and monomer units derived from 2-methyl-1,3-butadiene, wherein the tetrahydrofuran insoluble content in the chloroprene copolymer is 20% by mass or less, and the proportion of the monomer units derived from 2-methyl-1,3-butadiene is 10 to 27 mol % in the chloroprene copolymer.

One embodiment of the present invention relates to a chloroprene copolymer latex, a method for producing a chloroprene copolymer latex, a chloroprene copolymer latex composition, and a molded article or dipped product of a chloroprene copolymer rubber. The chloroprene copolymer latex is a latex of a chloroprene copolymer including monomer units derived from 2-chloro-1,3-butadiene (chloroprene) and monomer units derived from 2-methyl-1,3-butadiene, wherein the tetrahydrofuran insoluble content in the chloroprene copolymer is 20% by mass or less, and the proportion of the monomer units derived from 2-methyl-1,3-butadiene is 10 to 27 mol % in the chloroprene copolymer.

A glove that is X-ray detectable prepared from a latex formulation comprises a base polymer, an accelerator, a vulcanizing agent, a surfactant, a pH adjuster, an antifoaming agent and a thickener characterized in that the latex formulation further includes radiocontrast filler, wherein the radiocontrast filler comprises a radiocontrast agent, a surfactant, a thickener and a solvent, wherein the radiocontrast filler is used in an amount of at least 10 phr of the latex formulation and wherein the radiocontrast filler has total solid content of 45%.

A glove that is X-ray detectable prepared from a latex formulation comprises a base polymer, an accelerator, a vulcanizing agent, a surfactant, a pH adjuster, an antifoaming agent and a thickener characterized in that the latex formulation further includes radiocontrast filler, wherein the radiocontrast filler comprises a radiocontrast agent, a surfactant, a thickener and a solvent, wherein the radiocontrast filler is used in an amount of at least 10 phr of the latex formulation and wherein the radiocontrast filler has total solid content of 45%.

Disclosed is a dipping composite material for enhancing the cut resistance of chemical-resistant gloves, wherein an additive is added to a latex, and the additive is a metal oxide and/or silica and/or glass fiber and/or basalt fiber and/or aramid fiber. The present invention improves the formula of a dipping layer such that the dipping layer has the cut resistance, which can significantly improve the cut resistant level of gloves.