An object of the present invention is to provide a polyorganosiloxane-containing graft copolymer powder capable of providing a resin composition and a molded article which are excellent in balance between colorability and mechanical properties such as impact resistance. The polyorganosiloxane-containing graft copolymer powder according to the present invention is a graft copolymer powder obtained by graft-polymerizing a mixture (B) of a vinyl monomer (b1) having an epoxy group and another vinyl monomer (b2) to a rubber (A) containing a polyorganosiloxane, wherein the content of the polyorganosiloxane (A1) contained in the rubber (A) is 12 to 50% by mass, the mass average particle diameter of the polyorganosiloxane-containing graft copolymer powder is 300 to 2000 nm, and the epoxy equivalent of the polyorganosiloxane-containing graft copolymer powder is 2500 to 7800 g/eq.

A composition for encapsulation of organic light emitting diodes and an organic light emitting diode display apparatus, the composition including photocurable monomers and having a CLD of 50 or more, as calculated by Equation 1:

[00001]$\begin{array}{cc}\mathrm{CLD}=.Math.\frac{M_x\left(N_x-1\right)}{M_{\mathrm{total}}}& \left[\mathrm{Equation}1\right]\end{array}$

wherein, in Equation 1, M.sub.total is a total sum of a number of moles of the photocurable monomers in the composition, M.sub.x is a number of moles of an x.sup.th photocurable monomer in the composition, N.sub.x is a number of photocurable functional groups per mole of the x.sup.th photocurable monomer in the composition, and x is an integer of 1 or more.

A novel graft polymer can include a block copolymer backbone (A) as a graft base having polymeric sidechains (B) grafted thereon. The polymeric sidechains (B) are obtainable by polymerization of at least one vinyl ester monomer (B1) and optionally N-vinylpyrrolidone as optional further monomer (B2). For example, the block copolymer backbone (A) is a triblock copolymer of polyethylene oxide (PEG) and polypropylene oxide (PPG). Also included is a process for obtaining such a graft polymer, the process is preferably carried out by free-radical polymerization.

A novel graft polymer can include a block copolymer backbone (A) as a graft base having polymeric sidechains (B) grafted thereon. The polymeric sidechains (B) are obtainable by polymerization of at least one vinyl ester monomer (B1) and optionally N-vinylpyrrolidone as optional further monomer (B2). For example, the block copolymer backbone (A) is a triblock copolymer of polyethylene oxide (PEG) and polypropylene oxide (PPG). Also included is a process for obtaining such a graft polymer, the process is preferably carried out by free-radical polymerization.

There is provided a resin composition exhibiting excellent dielectric properties, high adhesion to a low-roughness surface, heat resistance, and excellent water resistance. This resin composition includes (a) a polymer having a polyphenylene ether backbone and a butadiene backbone in one molecule and having at least one selected from the group consisting of a vinyl group, a styryl group, an allyl group, an ethynyl group and a (meth)acryloyl group and at least any one of (b) a polymer including a styrene butadiene backbone and (c) a polymer including a cycloolefin backbone, wherein the content is the component (a) of 15 to 60 parts by weight and the total content of the component (b) and the component (c) is 40 to 85 parts by weight, based on 100 parts by weight of the total content of the component (a), the component (b), and the component (c).

A thermoplastic polycarbonate composition comprising: 10 to 30 wt % of a brominated polycarbonate; 10 to 80 wt % of a homopolycarbonate; optionally, 1 to 60 wt % of an aromatic poly(ester-carbonate) comprising carbonate units derived from bisphenol A, resorcinol, or a combination thereof, and ester units derived from a bisphenol, preferably bisphenol A, or resorcinol, and terephthalic acid, isoterephthalic acid, or a combination thereof, wherein a molar ratio of carbonate units to ester units ranges from 1:99 to 99:1; 5 to 15 wt % of a core-shell impact modifier; 1 to 10 wt % of an α,β-unsaturated glycidyl ester copolymer impact modifier; 0.01 to 1 wt % of a hydrostabilizer, preferably an epoxy hydrostabilizer; optionally, 0.1 to 10 wt % of an additive composition; wherein the wt % of each component is based on the total weight of the composition, which totals 100 wt %.

The present invention provides a radome substrate and a preparation method thereof. The radome substrate includes: 5 to 10 parts of polyphenylene ether resin, 70 to 85 parts of ceramic masterbatch, 10 to 15 parts of hollow microbead masterbatch, 1 to 3 parts of a compatibilizer, and 0.1 to 0.3 parts of a lubricant. The radome substrate prepared according to the method provided in the present invention has a high dielectric constant and stress cracking resistance performance.

The present invention provides a radome substrate and a preparation method thereof. The radome substrate includes: 5 to 10 parts of polyphenylene ether resin, 70 to 85 parts of ceramic masterbatch, 10 to 15 parts of hollow microbead masterbatch, 1 to 3 parts of a compatibilizer, and 0.1 to 0.3 parts of a lubricant. The radome substrate prepared according to the method provided in the present invention has a high dielectric constant and stress cracking resistance performance.

The present invention provides a radome substrate and a preparation method thereof. The radome substrate includes: 5 to 10 parts of polyphenylene ether resin, 70 to 85 parts of ceramic masterbatch, 10 to 15 parts of hollow microbead masterbatch, 1 to 3 parts of a compatibilizer, and 0.1 to 0.3 parts of a lubricant. The radome substrate prepared according to the method provided in the present invention has a high dielectric constant and stress cracking resistance performance.

Radically polymerizable dental material, which contains at least one ABA or AB block copolymer, preferably at least one monofunctional, radically polymerizable monomer (a) and preferably at least one radically polymerizable urethane di(meth)acrylate telechel (b).