A resist underlayer film forming composition capable of forming a flat film that exhibits high etching resistance, a good dry etching rate ratio and a good optical constant, while having good coverage even with respect to a so-called multileveled substrate and having a small difference in the film thickness after embedding. Also, a method for producing a polymer that is suitable for the resist underlayer film forming composition; a resist underlayer film which uses the resist underlayer film forming composition; and a method for producing a semiconductor device. This resist underlayer film forming composition contains: a reaction product of an aromatic compound (A) that has from 6 to 120 carbon atoms, and a compound that is represented by formula (1); and a solvent.

A resist underlayer film forming composition capable of forming a flat film that exhibits high etching resistance, a good dry etching rate ratio and a good optical constant, while having good coverage even with respect to a so-called multileveled substrate and having a small difference in the film thickness after embedding. Also, a method for producing a polymer that is suitable for the resist underlayer film forming composition; a resist underlayer film which uses the resist underlayer film forming composition; and a method for producing a semiconductor device. This resist underlayer film forming composition contains: a reaction product of an aromatic compound (A) that has from 6 to 120 carbon atoms, and a compound that is represented by formula (1); and a solvent.

A tackifier comprising a resin with repeating units of formula (I) wherein R.sup.1 is a linear or branched alkylen group with 1 to 10 carbon atoms and R.sup.2 is a linear or branched, saturated or unsaturated aliphatic hydrocarbon group with up to 20 carbon atoms and a non-aromatic compound which consists to at least 50% by weight of one or more linear or branched, saturated or unsaturated aliphatic hydrocarbon groups with at least 4 carbon atoms. ##STR00001##

A tackifier comprising a resin with repeating units of formula (I) wherein R.sup.1 is a linear or branched alkylen group with 1 to 10 carbon atoms and R.sup.2 is a linear or branched, saturated or unsaturated aliphatic hydrocarbon group with up to 20 carbon atoms and a non-aromatic compound which consists to at least 50% by weight of one or more linear or branched, saturated or unsaturated aliphatic hydrocarbon groups with at least 4 carbon atoms. ##STR00001##

The present invention relates to a porous membrane suitable for use in high pressure filtration method.

The present invention relates to a porous membrane suitable for use in high pressure filtration method.

The present invention relates to a porous membrane suitable for use in high pressure filtration method.

The present invention relates to a porous membrane suitable for use in high pressure filtration method.

This invention relates to compositions and a process for stabilizing or solubilize a phenolic resin containing a mixture of linear phenolic resins and calixarenes. The process comprises contacting the phenolic resin with an epoxide, to at least partially alkoxylate the phenolic hydroxyl groups of the calixarenes. This process forms a stabilized or solubilized phenolic resin with an increased solubility in a hydrocarbon solvent.

Disclosed is a salt represented by formula (I): ##STR00001##
wherein, in formula (I), Q.sup.1 and Q.sup.2 each independently represent a fluorine atom or the like, R.sup.1 and R.sup.2 each independently represent a hydrogen atom or the like, Z represents an integer of 0 to 6, X.sup.1 represents *—CO—O— or the like, where * represents a bonding site to C(R.sup.1)(R.sup.2) or C(Q.sup.1)(Q.sup.2), L.sup.1 represents a single bond or a saturated hydrocarbon group, and —CH.sub.2— included in the saturated hydrocarbon group may be replaced by —O—, —S—, —SO.sub.2— or —CO—, A.sup.1 represents a divalent alicyclic hydrocarbon group which may have a substituent, R.sup.a represents a cyclic hydrocarbon group which may have a substituent, and Z.sup.+ represents an organic cation.