C08L75/02

Method for producing polyurethane elastic fiber
11618979 · 2023-04-04 · ·

A method for producing a polyurethane elastic fiber according to the present invention contains the steps of: [1] producing a polyurethane urea polymer (A) having a number average molecular weight ranging from 12,000 to 50,000, and represented by general formula (1); [2] preparing a spinning dope by adding the polyurethane urea polymer (A) to a polyurethane urea polymer (B); and [3] spinning a polyurethane elastic fiber using the spinning dope. ##STR00001##
In the formula, R.sup.1 and R.sup.2 are an alkyl group or a hydroxyalkyl group, R.sup.3 is an alkylene group, a polyethyleneoxy group or a polypropyleneoxy group, R.sup.4 is a diisocyanate residue, X is a urethane bond or a urea bond, R.sup.5 and R.sup.6 are a diisocyanate residue, P is a diol residue, Q is a diamine residue, UT is a urethane bond, UA is a urea bond, each of k, 1, m and n is 0 or a positive number.

HOLLOW MICROBALLOONS FOR CMP POLISHING PAD
20230151179 · 2023-05-18 · ·

The hollow microballoons for CMP polishing pad of the invention are formed of at least one resin selected from the group consisting of a melamine resin, a urea resin and an amide resin and have an average particle size of 1 to 100 μm. According to the invention, there can be provided hollow microballoons for CMP polishing pad, which, when used in CMP polishing pad, exhibit excellent polishing characteristics, and can stably produce CMP polishing pad even in production of CMP polishing pad.

HOLLOW MICROBALLOONS FOR CMP POLISHING PAD
20230151179 · 2023-05-18 · ·

The hollow microballoons for CMP polishing pad of the invention are formed of at least one resin selected from the group consisting of a melamine resin, a urea resin and an amide resin and have an average particle size of 1 to 100 μm. According to the invention, there can be provided hollow microballoons for CMP polishing pad, which, when used in CMP polishing pad, exhibit excellent polishing characteristics, and can stably produce CMP polishing pad even in production of CMP polishing pad.

CONTROLLED RELEASE COMPOSITION CONTAINING DCOIT
20170362446 · 2017-12-21 ·

A composition containing 4,5-dichloro-2-n-octylisothiazolin-3-one, an activated carbon having a surface area of at least 700 m.sup.2/g and a cured isocyanate.

CONTROLLED RELEASE COMPOSITION CONTAINING DCOIT
20170362446 · 2017-12-21 ·

A composition containing 4,5-dichloro-2-n-octylisothiazolin-3-one, an activated carbon having a surface area of at least 700 m.sup.2/g and a cured isocyanate.

FIRE-PROTECTION COMPOSITION AND USE OF THE SAME

A fire-protection composition is described that contains a polyurea-based binder. By virtue of the inventive composition, coatings having the layer thickness necessary for the respective fire-resistance duration can be applied simply and quickly, wherein the layer thickness can be reduced to a minimum and nevertheless a good fire-protection effect can be achieved. The inventive composition is suitable in particular for fire protection, especially as a coating of cables and cable runs, in order to increase the fire resistance duration.

POLYUREA COMPOSITION WITH A LOW CONTENT IN MONOMERIC DIISOCYANATES

A polyurea composition containing monomeric diisocyanates in an amount of max. 0.5 wt.% and consisting of a first component containing a primary, aromatic diamine and a second component containing an isocyante-group-containing polyether urethane polymer containing monomeric diisocyantes in an amount of max. 0.5 wt.% and an aliphatic polyisocyanate with an NCO content of 8 to 25 wt.%.

POLYUREA COMPOSITION WITH A LOW CONTENT IN MONOMERIC DIISOCYANATES

A polyurea composition containing monomeric diisocyanates in an amount of max. 0.5 wt.% and consisting of a first component containing a primary, aromatic diamine and a second component containing an isocyante-group-containing polyether urethane polymer containing monomeric diisocyantes in an amount of max. 0.5 wt.% and an aliphatic polyisocyanate with an NCO content of 8 to 25 wt.%.

Uses of condensation resins

The present invention relates to new uses of condensation resins made from urea, formaldehyde, and CH-acidic aldehydes.

Uses of condensation resins

The present invention relates to new uses of condensation resins made from urea, formaldehyde, and CH-acidic aldehydes.