The invention provides a method for polishing or planarizing a substrate of at least one of semiconductor, optical and magnetic substrates. The method includes attaching a polymer-polymer composite polishing pad having a polishing layer to a polishing device. A hydrophilic polymeric matrix forms the polishing layer. Cationic fluoropolymer particles having nitrogen-containing end groups are embedded in the polymeric matrix. A slurry containing anionic particles is applied to the polymer-polymer composite polishing pad and rubbed against the substrate to polish or planarize the substrate with the fluoropolymer particles interacting with the anionic particles to increase polishing removal rate.

The embodiments relate to a process for preparing a polythiol composition, which comprises reacting a halogen compound or an alcohol compound with thiourea to prepare a thiouronium salt solution; and adding a basic solution to the thiouronium salt solution to hydrolyze it. The hydrolysis reaction is terminated when the area of peak A in the graph measured by gel permeation chromatography of the reactant in the hydrolysis step under certain conditions is 0.5% to 8% based on the total peak area. A tetrafunctional polythiol composition having high purity can be obtained. Thus, an optical lens having excellent color, transparency, and refractive index can be obtained.

The embodiments relate to a process for preparing a polythiol composition, which comprises reacting a halogen compound or an alcohol compound with thiourea to prepare a thiouronium salt solution; and adding a basic solution to the thiouronium salt solution to hydrolyze it. The hydrolysis reaction is terminated when the area of peak A in the graph measured by gel permeation chromatography of the reactant in the hydrolysis step under certain conditions is 0.5% to 8% based on the total peak area. A tetrafunctional polythiol composition having high purity can be obtained. Thus, an optical lens having excellent color, transparency, and refractive index can be obtained.

The present invention relates to a moisture-crosslinkable sealant composition comprising: at least one polyurethane P comprising at least two NCO end functions; at least one polyimine A obtained via a process comprising a step of reaction between at least: a) a (poly)urethane-aldehyde comprising at least 2 aldehyde functions; b) a primary diamine; c) optionally in the presence of a primary monoamine or a monoaldehyde if the —CHO/NH.sub.2 molar ratio is other than 1.

Disclosed herein is a composite material comprising a substrate coated with a block copolymer brush, where the block copolymer brush comprises a first block of a hydrophobic polymer conjugated to a nitric oxide source, where the first block of the hydrophobic polymer is covalently bonded to a surface of the substrate or a first block of a cationic polymer covalently bonded to a surface of the substrate and a second block of a hydrophilic polymer, extending from the first block to form an outer surface of the block copolymer brush.

Disclosed herein is a composite material comprising a substrate coated with a block copolymer brush, where the block copolymer brush comprises a first block of a hydrophobic polymer conjugated to a nitric oxide source, where the first block of the hydrophobic polymer is covalently bonded to a surface of the substrate or a first block of a cationic polymer covalently bonded to a surface of the substrate and a second block of a hydrophilic polymer, extending from the first block to form an outer surface of the block copolymer brush.

A water repellent composition includes a polyurethane resin compound, a non-fluorine water repellent compound, a surfactant, and a liquid medium. The polyurethane resin compound includes at least one kind selected from the group consisting of a first polyurethane resin compound, a second polyurethane resin compound, and a third polyurethane resin compound:

A water repellent composition includes a polyurethane resin compound, a non-fluorine water repellent compound, a surfactant, and a liquid medium. The polyurethane resin compound includes at least one kind selected from the group consisting of a first polyurethane resin compound, a second polyurethane resin compound, and a third polyurethane resin compound:

A shoe member consisting of a material comprising a thermoplastic elastomer, wherein the material has a glass transition temperature Tg of no more than 10° C., a loss tangent tan δ of no less than 0.4 in a test of dynamic viscoelasticity, and a Δ tan δ, which is the amount of change of tan δ, of no less than 0.15 when strain is changed from 5% to 100%.

A shoe member consisting of a material comprising a thermoplastic elastomer, wherein the material has a glass transition temperature Tg of no more than 10° C., a loss tangent tan δ of no less than 0.4 in a test of dynamic viscoelasticity, and a Δ tan δ, which is the amount of change of tan δ, of no less than 0.15 when strain is changed from 5% to 100%.