C08L83/16

Resin composition, method for producing resin composition, film formation method, and cured product

A resin composition including a silicon-containing resin component and a solvent, the silicon-containing resin component includes (I) mentioned below, the solvent including at least one of a terpene compound having at least one of a hydroxy group and an acetoxy group, and a cyclic skeleton-containing acetate compound (excluding the terpene compound): (I) a polysilane-polysiloxane resin having a polysilane structure and a polysiloxane structure.

Resin composition, method for producing resin composition, film formation method, and cured product

A resin composition including a silicon-containing resin component and a solvent, the silicon-containing resin component includes (I) mentioned below, the solvent including at least one of a terpene compound having at least one of a hydroxy group and an acetoxy group, and a cyclic skeleton-containing acetate compound (excluding the terpene compound): (I) a polysilane-polysiloxane resin having a polysilane structure and a polysiloxane structure.

Wireless Temperature Sensors and Methods
20220011173 · 2022-01-13 ·

Devices, including wireless temperature sensors, are provided. The devices may include a patch including a conductive material, a substrate, and a ground plane. The devices may be used in the systems and methods provided herein to measure a temperature. The substrates of the devices may include a dielectric material or a metal.

METHOD FOR PRODUCING AMORPHOUS SILICON SACRIFICE FILM AND AMORPHOUS SILICON FORMING COMPOSITION
20220009782 · 2022-01-13 ·

The present invention provides a method for producing a novel amorphous silicon sacrifice film and an amorphous silicon forming composition capable of filling trenches having a high aspect ratio to form an amorphous silicon sacrifice film that is excellent in affinity with a substrate. A method for producing an amorphous silicon sacrifice film, comprising (i) polymerizing a cyclic polysilane comprising 5 or more silicon or a composition comprising the cyclic polysilane by light irradiation and/or heating to form a polymer having a polysilane skeleton, (ii) applying an amorphous silicon forming composition comprising said polymer having a polysilane skeleton, polysilazane and a solvent above a substrate to form a coating film, and (iii) heating the coating film in a non-oxidizing atmosphere.

METHOD FOR PRODUCING AMORPHOUS SILICON SACRIFICE FILM AND AMORPHOUS SILICON FORMING COMPOSITION
20220009782 · 2022-01-13 ·

The present invention provides a method for producing a novel amorphous silicon sacrifice film and an amorphous silicon forming composition capable of filling trenches having a high aspect ratio to form an amorphous silicon sacrifice film that is excellent in affinity with a substrate. A method for producing an amorphous silicon sacrifice film, comprising (i) polymerizing a cyclic polysilane comprising 5 or more silicon or a composition comprising the cyclic polysilane by light irradiation and/or heating to form a polymer having a polysilane skeleton, (ii) applying an amorphous silicon forming composition comprising said polymer having a polysilane skeleton, polysilazane and a solvent above a substrate to form a coating film, and (iii) heating the coating film in a non-oxidizing atmosphere.

POLYSILAZANE, SILICEOUS FILM-FORMING COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICEOUS FILM USING THE SAME
20230312978 · 2023-10-05 ·

To provide a polysilazane and a siliceous film-forming composition which can suppress film thickness variation and voids even in the ozone containing atmosphere. [Means for Solution] A polysilazane comprising N—Si bonds, wherein the ratio (NA.sup.3/NA.sup.2) of the number of N atoms having 3 N—Si bonds (NA.sup.3) to the number of N atoms having 2 N—Si bonds (NA.sup.2) is 1.8 to 6.0.

Method for applying high performance silicon-based coating compositions
11773290 · 2023-10-03 · ·

Provided herein is a method for coating a surface. The method comprises providing a towelette moistened with a mixture of constituents to form a non-aqueous silicon-based composition comprising 7% to 80% (w/w of the total composition) polysilazane, 1% to 10% (w/w of the total composition) polysilane, 0.2% to 1% (w/w of the total composition) polysiloxane, and 20% to 70% (w/w of the total composition) at least one organic solvent; wherein polysilazane is present in a 10:1 to 110:1 weight ratio to polysiloxane; and wherein the polysilane is of a formula (R.sub.1R.sub.2Si).sub.n, wherein n is greater than 1, and wherein R.sub.1 and R.sub.2 are the same or different and are chosen from alkyl, alkenyl, cycloalkyl, alkylamino, aryl, aralkyl, or alkylsilyl. The mixture from the towelette to form a coating on a surface and the coating is cured ambiently without additional heat. Also provided are towelettes containing the mixture.

Method for applying high performance silicon-based coating compositions
11773290 · 2023-10-03 · ·

Provided herein is a method for coating a surface. The method comprises providing a towelette moistened with a mixture of constituents to form a non-aqueous silicon-based composition comprising 7% to 80% (w/w of the total composition) polysilazane, 1% to 10% (w/w of the total composition) polysilane, 0.2% to 1% (w/w of the total composition) polysiloxane, and 20% to 70% (w/w of the total composition) at least one organic solvent; wherein polysilazane is present in a 10:1 to 110:1 weight ratio to polysiloxane; and wherein the polysilane is of a formula (R.sub.1R.sub.2Si).sub.n, wherein n is greater than 1, and wherein R.sub.1 and R.sub.2 are the same or different and are chosen from alkyl, alkenyl, cycloalkyl, alkylamino, aryl, aralkyl, or alkylsilyl. The mixture from the towelette to form a coating on a surface and the coating is cured ambiently without additional heat. Also provided are towelettes containing the mixture.

Method for applying high performance silicon-based coating compositions
11773290 · 2023-10-03 · ·

Provided herein is a method for coating a surface. The method comprises providing a towelette moistened with a mixture of constituents to form a non-aqueous silicon-based composition comprising 7% to 80% (w/w of the total composition) polysilazane, 1% to 10% (w/w of the total composition) polysilane, 0.2% to 1% (w/w of the total composition) polysiloxane, and 20% to 70% (w/w of the total composition) at least one organic solvent; wherein polysilazane is present in a 10:1 to 110:1 weight ratio to polysiloxane; and wherein the polysilane is of a formula (R.sub.1R.sub.2Si).sub.n, wherein n is greater than 1, and wherein R.sub.1 and R.sub.2 are the same or different and are chosen from alkyl, alkenyl, cycloalkyl, alkylamino, aryl, aralkyl, or alkylsilyl. The mixture from the towelette to form a coating on a surface and the coating is cured ambiently without additional heat. Also provided are towelettes containing the mixture.

POLYMER-BASED PORTION, ADHESIVE, FOLDABLE APPARATUS, AND METHODS OF MAKING

Polymer-based portions comprise an index of refraction ranging from about 1.49 to about 1.55. In some embodiments, the polymer-based portion comprises the product of curing 45-75 wt % of a difunctional urethane-acrylate oligomer with 25-55 wt % of a difunctional cross-linking agent and optionally a reactive diluent. In some embodiments, the polymer-based portion comprises the product of curing 75-100 wt % of a reactive diluent and optionally one or more a difunctional urethane-acrylate oligomer and/or a difunctional cross-linking agent. Adhesives comprise an index of refraction ranging from about 1.49 to about 1.55. In some embodiments, the adhesive comprises the product of heating 10-35 wt % of a silane-hydride-terminated siloxane and 65-90 wt % of a vinyl-terminated siloxane. In some embodiments, the adhesive comprises the product of irradiating a thiol-containing siloxane and a photo-initiator with at least one wavelength of light that the photo-initiator is sensitive to. Foldable apparatus can comprise the polymer-based portion and/or adhesive.