Patent classifications
C08L87/005
ANTISTATIC AGENT
Provided is an antistatic agent (Z) containing: a block polymer (A) having a block of a hydrophobic polymer (a) and a block of a hydrophilic polymer (b) as structure units; and a sulfonate (S), the sulfonate (S) being a salt of an alkylbenzenesulfonic acid anion which has a C6-C18 alkyl group, the sulfonate (S) including at least two alkylbenzenesulfonates different in the number of carbon atoms of the alkyl group in the anion, the sulfonate (S) satisfying the following formula:
0.40≤W(n)/[W(n−1)+W(n)+W(n+1)]≤0.90
wherein n is the number of carbon atoms of the alkyl group in the anion of an alkylbenzenesulfonate accounting for the highest proportion by weight in the sulfonate (S); W(n) is a weight of said alkylbenzenesulfonate; and W(n−1) and W(n+1) are respectively a weight of an alkylbenzenesulfonate containing an anion having an alkyl group with (n−1) carbon atoms and a weight of an alkylbenzenesulfonate containing an anion having an alkyl group with (n+1) carbon atoms.
ANTISTATIC AGENT
Provided is an antistatic agent (Z) containing: a block polymer (A) having a block of a hydrophobic polymer (a) and a block of a hydrophilic polymer (b) as structure units; and a sulfonate (S), the sulfonate (S) being a salt of an alkylbenzenesulfonic acid anion which has a C6-C18 alkyl group, the sulfonate (S) including at least two alkylbenzenesulfonates different in the number of carbon atoms of the alkyl group in the anion, the sulfonate (S) satisfying the following formula:
0.40≤W(n)/[W(n−1)+W(n)+W(n+1)]≤0.90
wherein n is the number of carbon atoms of the alkyl group in the anion of an alkylbenzenesulfonate accounting for the highest proportion by weight in the sulfonate (S); W(n) is a weight of said alkylbenzenesulfonate; and W(n−1) and W(n+1) are respectively a weight of an alkylbenzenesulfonate containing an anion having an alkyl group with (n−1) carbon atoms and a weight of an alkylbenzenesulfonate containing an anion having an alkyl group with (n+1) carbon atoms.
Nanocomposite material made of a polymer-matrix comprising PEO- containing polymers and salts of luminescent polyanionic metal clusters
The present invention concerns a solid nanocomposite material consisting of a polymer-matrix in which are dispersed alkali metal, hydronium or ammonium salts of polyanionic components, wherein the polymer-matrix comprises at least a linear or branched polymer or copolymer containing one or several poly(ethylene oxide) (PEO) chains, said polymer or copolymer being optionally crosslinked and each PEO chain having at least 4 ethylene oxide monomer units. The present invention relates also to a photonic, e.g. optoelectronic, device comprising such a nanocomposite material. Such material and device can be used as phosphorescence emitter, for crop growth lighting or for generating singlet oxygen.
Nanocomposite material made of a polymer-matrix comprising PEO- containing polymers and salts of luminescent polyanionic metal clusters
The present invention concerns a solid nanocomposite material consisting of a polymer-matrix in which are dispersed alkali metal, hydronium or ammonium salts of polyanionic components, wherein the polymer-matrix comprises at least a linear or branched polymer or copolymer containing one or several poly(ethylene oxide) (PEO) chains, said polymer or copolymer being optionally crosslinked and each PEO chain having at least 4 ethylene oxide monomer units. The present invention relates also to a photonic, e.g. optoelectronic, device comprising such a nanocomposite material. Such material and device can be used as phosphorescence emitter, for crop growth lighting or for generating singlet oxygen.
SENSITIVE CONJUGATED POLYMER STRUCTURE COLOR AND SENSOR USING SAME
The present disclosure relates to a responsive polymer film, a method of preparing the responsive polymer film, and a sensor using the polymer film.
SENSITIVE CONJUGATED POLYMER STRUCTURE COLOR AND SENSOR USING SAME
The present disclosure relates to a responsive polymer film, a method of preparing the responsive polymer film, and a sensor using the polymer film.
Degradable, Printable Poly(Propylene Fumarate)-Based ABA Triblock Elastomers
In various embodiments, the present invention is directed to ABA triblock copolymers having crosslinkable poly(propylene fumarate A blocks and a more flexible poly(lactone) B block formed by sequential ring-opening polymerization and ring-opening copolymerization. These ABA triblock polymers made using ring-opening polymerization of one or more lactone monomers using a bifunctional initiator to form a poly(lactone) B block having terminal hydroxyl groups and the ring-opening copolymerization of maleic anhydride and propylene oxide followed by isomerization of the maleate double bond using an organic base to form the poly(propylene fumarate)(PPF) A blocks. When crosslinked photochemically using, for example, a continuous liquid interface production digital light processing (DLP) Carbon M2 printer, these ABA type triblock copolymers form durable elastomers with tunable degradation and elastic properties. In various embodiments, these polymers are shown to undergo slow, hydrolytic degradation in vitro with minimal loss of mechanical performance during degradation.
Antistatic agent for thermoplastic resin
An antistatic agent for thermoplastic resins (Z) containing a block polymer (A) having a block of a hydrophobic polymer (a) and a block of a hydrophilic polymer (b) as structure units, and a C6-C18 branched alkylbenzenesulfonate (S); an antistatic resin composition (Y) containing the antistatic agent (Z) and a thermoplastic resin (E); and a molded article of the antistatic resin composition (Y).
Antistatic agent
Provided is an antistatic agent (Z) containing: a block polymer (A) having a block of a hydrophobic polymer (a) and a block of a hydrophilic polymer (b) as structure units; and a sulfonate (S), the sulfonate (S) being a salt of an alkylbenzenesulfonic acid anion which has a C6-C18 alkyl group, the sulfonate (S) including at least two alkylbenzenesulfonates different in the number of carbon atoms of the alkyl group in the anion, the sulfonate (S) satisfying the following formula:
0.40≤W(n)/[W(n−1)+W(n)+W(n+1)]≤0.90
wherein n is the number of carbon atoms of the alkyl group in the anion of an alkylbenzenesulfonate accounting for the highest proportion by weight in the sulfonate (S); W(n) is a weight of said alkylbenzenesulfonate; and W(n−1) and W(n+1) are respectively a weight of an alkylbenzenesulfonate containing an anion having an alkyl group with (n−1) carbon atoms and a weight of an alkylbenzenesulfonate containing an anion having an alkyl group with (n+1) carbon atoms.
Antistatic agent
Provided is an antistatic agent (Z) containing: a block polymer (A) having a block of a hydrophobic polymer (a) and a block of a hydrophilic polymer (b) as structure units; and a sulfonate (S), the sulfonate (S) being a salt of an alkylbenzenesulfonic acid anion which has a C6-C18 alkyl group, the sulfonate (S) including at least two alkylbenzenesulfonates different in the number of carbon atoms of the alkyl group in the anion, the sulfonate (S) satisfying the following formula:
0.40≤W(n)/[W(n−1)+W(n)+W(n+1)]≤0.90
wherein n is the number of carbon atoms of the alkyl group in the anion of an alkylbenzenesulfonate accounting for the highest proportion by weight in the sulfonate (S); W(n) is a weight of said alkylbenzenesulfonate; and W(n−1) and W(n+1) are respectively a weight of an alkylbenzenesulfonate containing an anion having an alkyl group with (n−1) carbon atoms and a weight of an alkylbenzenesulfonate containing an anion having an alkyl group with (n+1) carbon atoms.